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1. 发明申请

WO1994006943A1 PROCESS FOR CHANGING THE MICROSTRUCTURE OF METALLIC RAILS 审中-公开
标题翻译：方法为了改变金属棒材的结构结构
公开(公告)号：WO1994006943A1
公开(公告)日：1994-03-31
申请号：PCT/DE1993000907
申请日：1993-09-22
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , THYSSEN STAHL AG
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , THYSSEN STAHL AG , KÜPPER, Frank , WISSENBACH, Konrad , SCHMEDDERS, Herbert
IPC分类号： C21D09/04
CPC分类号： C21D9/04 , B23K15/0006 , C21D1/09
摘要： A process is disclosed for changing the local microstructure at the surface of the head of a metallic rail in the solid phase. The microstructure is changed by applying energy only within a limited local marginal layer located directly below the stressed running and wearing surfaces of the rail head by high-energy radiation. The amount of energy absorbed by the rail at the processing site is controlled by said high-energy radiation in such a way that the local microstructure in the marginal layer at the processing site is cooled in an adequately controlled way.

2. 发明申请

WO1994009176A1 DEVICE FOR PLASMA-SUPPORTED ELECTRON BEAM HIGH-RATE VAPOUR DEPOSIITION 审中-公开
标题翻译： DEVICE等离子辅助电子HOCHRATEBEDAMPFEN
公开(公告)号：WO1994009176A1
公开(公告)日：1994-04-28
申请号：PCT/DE1993000750
申请日：1993-08-18
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , NEUMANN, Manfred , SCHILLER, Siegfried , MORGNER, Henry
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...
IPC分类号： C23C14/32
CPC分类号： C23C14/10 , C23C14/32 , H01J37/3053 , H01J37/3266 , H01J2237/3137
摘要： It is known that improved coating properties can be obtained by plasma action in vacuum deposition, especially by vaporisation. Substantially higher coating rates can be attained in vapour deposition, but, with high plasma densities, they result in excessive scattering of the electron beam and reduce the power density. According to the invention, a plasma source, preferably a hollow cathode arc source, is arranged in the immediate vicinity of the substrate. Between the evaporator and the substrate there is a device for generating a magnetic field so that the region of high plasma density is separated from the evaporator and the electron beam by the magnetic field. The boundary field lines of this magnetic field run along an arc curving with respect to the substrate.

3. 发明申请

WO1994008076A1 HETEROEPITAXIALLY DEPOSITED DIAMOND 审中-公开
标题翻译：异质僻静DIAMOND
公开(公告)号：WO1994008076A1
公开(公告)日：1994-04-14
申请号：PCT/DE1993000936
申请日：1993-10-01
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , DAIMLER BENZ AG , KLAGES, Claus-Peter , JIANG, Xin , FÜSSER, Hans-Jürgen , HARTWEG, Martin , ZACHAI, Reinhard , RÖSLER, Manfred
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , DAIMLER BENZ AG
IPC分类号： C30B25/02
CPC分类号： C23C16/274 , C23C16/0209 , C30B25/105 , C30B29/04 , H01L21/02381 , H01L21/02527 , H01L21/0262 , H01L21/02661
摘要： The invention pertains to a process for producing heteroepitaxial diamond layers on Si substrates by means of chemical vapor deposition and common process gases, wherein (a) the Si surface is pretreated by creating a vacuum and heating the Si substrate to temperatures greater than 300 C, preferably between 600 and 1100 C; (b) a nucleation phase is carried out with a negative bias voltage applied in the range of -60 to -300 volts at a substrate temperature of 400 to 1100 C; (c) the diamond deposition is carried out under per se known conditions without applying a bias voltage.

4. 发明申请

WO1994005446A1 ROLLING DEVICE FOR PRODUCING CORRUGATED PIECES MADE OF A METALLIC MATERIAL 审中-公开
标题翻译：滚动装置，用于生产金属材料波浪WORKPIECES
公开(公告)号：WO1994005446A1
公开(公告)日：1994-03-17
申请号：PCT/EP1993002343
申请日：1993-08-30
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , LORENZ, Bernd , ECK, Christoph
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...
IPC分类号： B21H01/18
CPC分类号： B21H1/18
摘要： A rolling device for producing corrugated workpieces made of a metallic material has two flat jaws which can be synchronically moved towards each other in parallel planes, tangentially to a workpiece revolving around its longitudinal axis. The object of the invention is to provide a device for purposefully shaping non rotationally symmetrical sections in the corrugated workpieces with respect to their longitudinal axis. For that purpose, at least one rolling block (3), whose width is smaller than the total length of the workpiece (1), whose length rolling in the circumferential direction on the workpiece (1) is smaller than or equal to half the circumference of the workpiece, and whose height corresponds to a predetermined eccentricity, is provided on a flat jaw (2b). When the flat jaws are moved, the rolling block (3) displaces the material of the workpiece (1) heated up to an appropriate forging temperature of the material. The displacement of the material leads to the formation of a non rotationally symmetrical section and at the same time to a change in the length of the workpiece, or when the workpiece is laterally limited, to corrugations of the workpiece.

5. 发明申请

WO1993025725A1 PROCESS FOR DEPOSITING SMOOTH POLYCRYSTALLINE LAYERS 审中-公开
标题翻译：法分离平滑的多晶层的
公开(公告)号：WO1993025725A1
公开(公告)日：1993-12-23
申请号：PCT/DE1993000505
申请日：1993-06-08
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , WILD, Christoph , KOIDL, Peter , MÜLLER-SEBERT, Wolfgang , WALCHER, Herbert , ECKERMANN, Thomas
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...
IPC分类号： C23C16/26
CPC分类号： C23C16/27 , C23C16/02 , C23C16/279 , C23C16/52 , C30B25/02 , C30B29/04
摘要： A process for depositing smooth polycrystalline layers, especially diamond layers, comprises two steps. In a first step the crystal direction of an octahedron (8, 38) is grown with a growth parameter alpha of about 3, preferably over a layer thickness of between 400 and 600 times the mean seed distance on the substrate. In a second step, by reducing the growth parameter alpha , surfaces are generated perpendicularly to this crystal direction and enlarged until they completely cover the surface of the polycrystalline layer. Here, the growth parameter alpha is given by alpha = V100/V111 2ROOT 3, the growth rates of the crystal on {100} and {111} surfaces being given by V100 and V111. This two-step process makes it possible to produce smooth polycrystalline diamond layers in millimetre thicknesses with a roughness in the 100 nanometre range.

6. 发明申请

WO1993025604A1 SILICON BASED LACQUER, ITS USE AS A SUBSTRATE COATING AND SUBSTRATES THUS OBTAINED 审中-公开
标题翻译：硅基漆，其作为底漆和基材使用
公开(公告)号：WO1993025604A1
公开(公告)日：1993-12-23
申请号：PCT/EP1993001428
申请日：1993-06-05
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , E.I. DU PONT DE NEMOURS AND COMPANY , POPALL, Michael , SCHULZ, Jochen , OLSOWSKI, Birke , PILZ, Monika
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , E.I. DU PONT DE NEMOURS AND COMPANY
IPC分类号： C08G77/22
CPC分类号： H01G2/12 , C08G77/06 , C08G77/22 , C09D183/04 , H05K3/285 , Y10T428/31663
摘要： The present invention relates to a lacquer obtained by the process comprising the steps of: (i) precondensation of: a) 1 to 10 mol % of at least one silane of the formula SiR4; b) 20 to 94 mol % of at least one organic silane of the formula R'm(R''Y)nSiX(4-m-n); c) 5 to 30 mol % of at least one organic silane of the formula R'pSiX4-p; d) optionally 0 to 10 mol % of at least one low-volatility metal oxide; and (ii) hydrolysis condensation of the precondensate of step (i) in the presence of the stoichiometric amount of water. The present invention also relates to a process for the obtention of a coating on substrates which comprises the steps of applying the lacquer and curing same. The invention also relates to the thus-coated substrates.

7. 发明申请

WO1993019536A1 DATA COMPRESSION PROCESS DURING STORAGE AND/OR TRANSMISSIOIN OF DIGITAL AUDIO SIGNALS FOR STUDIO APPLICATIONS WITH PERCEPTIVE CODING AND VARIABLE LENGTH CODE 审中-公开
标题翻译：数字压缩过程在存储和/或传输数字音频信号的工作场所应用与识别编码和可变长度代码
公开(公告)号：WO1993019536A1
公开(公告)日：1993-09-30
申请号：PCT/DE1993000177
申请日：1993-02-25
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , BRANDENBURG, Karl-Heinz , HERRE, Jürgen , SEITZER, Dieter
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...
IPC分类号： H04B01/00
CPC分类号： H04H20/95 , H03M7/42
摘要： A data compression process is disclosed for the storage and/or transmission of digital audio signals. Known processes, such as ASPEC, allow high quality music to be transmitted in a data stream that contains less than 10 % of the information contained in the data stream used in a CD. Known compression processes do not measure up, however, to the requirements of the professional studio technology, as the subsequent processing of the audio signals that takes place in the studio leads to audible disturbances. The disclosed process is insensitive to subsequent processing, such as tandem coding, mixing or fading. To achieve this insensitivity, the transposition of the audio signal from the time domain to the frequency domain is carried out with perfect reconstruction by means of a filter bank, the psychoacoustic masking effect is utilised to an essentially less extent, and a cascade multidimensional Huffman code is used for coding variable word lengths. This process allows audio signals destined to be used in studio technology to be transmitted at a data rate of 192 kbit/sec per channel.

8. 发明申请

WO1993009472A1 LIGHT EXPOSURE DEVICE 审中-公开
标题翻译：灯光曝光装置
公开(公告)号：WO1993009472A1
公开(公告)日：1993-05-13
申请号：PCT/DE1991000860
申请日：1991-10-30
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , VOGT, Holger , KÜCK, Heinz , HESS, Günther , GEHNER, Andreas
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...
IPC分类号： G03F07/20
CPC分类号： G03F7/70283 , G03F7/70291 , G03F7/70358
摘要： A light exposure device for directly exposing photosensitive layers has a light source (2) and a pattern generator (3). The pattern generator (3) has an optical schlieren system (14) and an active, matrix-addressable surface light modulator (13). The schlieren system (14) has a schlieren objective (15) and a projection objective (16), as well as a reflecting device (17) arranged between both objectives that directs the light from the light source (2) onto the surface (19) of the surface light modulator (13). A filtering device (17, 17b) filters out diffracted light and lets through non diffracted light from the surface light modulator (13) to the projection objective (16). The structure to be exposed is secured on a movable positioning table (7). The surface light modulator is (13) addressed so that its non-addressed surface areas (19a, 19b, ...) correspond to the projection areas of the structure to be exposed.
摘要翻译：用于直接曝光感光层的曝光装置具有光源（2）和图案发生器（3）。图案发生器（3）具有光学施胶系统（14）和有源矩阵寻址表面光调制器（13）。所述分光镜系统（14）具有分光镜（15）和投影物镜（16），以及布置在两个物镜之间的反射装置（17），其将来自光源（2）的光引导到表面（19））表面光调制器（13）。过滤装置（17,17b）滤出衍射光并通过来自表面光调制器（13）到投影物镜（16）的非衍射光。要暴露的结构被固定在可动定位台（7）上。表面光调制器（13）被寻址，使得其未寻址的表面区域（19a，19b，...）对应于要暴露的结构的投影区域。

9. 发明申请

WO1993006345A1 LUBRICATING-OIL MONITORING DEVICE 审中-公开
标题翻译：润滑油监测装置
公开(公告)号：WO1993006345A1
公开(公告)日：1993-04-01
申请号：PCT/DE1992000825
申请日：1992-09-25
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , HABERGER, Karl , BUCHNER, Reinhold
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...
IPC分类号： F01M11/10
CPC分类号： F01M11/10 , F01M2011/1446 , F01M2011/1473 , F01M2011/148 , F16N2250/04 , F16N2250/08 , F16N2250/36 , F16N2260/18 , G01N33/2888
摘要： Described is a method of determining the time at which lubricating oil, in particular lubricating oil in thermal engines, should be changed. The invention is characterized in that the lube-oil pressure, temperature and viscosity are measured in situ, the measured values being fed to a processing unit which determined the current status of the oil. The measured status of the oil is compared with a pre-determined reference status and the difference between the measured status and reference status is indicated on a display and/or, if the difference between the measured status and reference status exceeds pre-determined tolerance limits, an alarm signal is generated.

10. 发明申请

WO1993005295A1 MICRO-MINIATURISED, ELECTROSTATICALLY DRIVEN DIAPHRAGM MICROPUMP 审中-公开
标题翻译：微型微电脑，静电驱动胶片微阵列
公开(公告)号：WO1993005295A1
公开(公告)日：1993-03-18
申请号：PCT/DE1992000630
申请日：1992-07-28
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ... , ZENGERLE, Roland , RICHTER, Axel
发明人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...
IPC分类号： F04B43/04
CPC分类号： F04B43/046 , F04B53/1055
摘要： The description relates to an electrostatically driven diaphragm micropump (1) with a first pump body (2; 32) as a counter-electrode body and a second pump body (3; 33) having a diaphragm region (6). Both pump bodies (2, 32; 3, 33) establish a hollow space (10) bordering the diaphragm region (6) and are electrically insulated from each other. The hollow space (10) is filled with a medium different from the fluid to be pumped. The pump bodies (2, 32; 3; 33) may consist of a semiconductor material of different types of charge. The medium in the hollow space preferably has a high dielectric constant.

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