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    • 1. 发明申请
    • IMAGE EDITING FOR PREPARING A TEXTURE ANALYSIS
    • 图像处理准备TEXTURNALYSE
    • WO0063681A3
    • 2001-03-29
    • PCT/DE0001228
    • 2000-04-19
    • FRAUNHOFER GES FORSCHUNGLANG PETERSPINNLER KLAUSSCHRAMM ULLRICHBAUER NORBERT
    • LANG PETERSPINNLER KLAUSSCHRAMM ULLRICHBAUER NORBERT
    • G01B11/24G01B11/30G01N21/88G01N21/95G06T7/00
    • G01B11/30G01B11/24G01N21/8851G01N21/9515
    • The invention relates to a method for preparing an automatic, contactless and non-destructive testing of surfaces (1, 2, 3, 4; 1*, 3*) of an object to be tested, whereby said surfaces are not perpendicularly aligned with regard to an optical axis (100). The inventive method uses at least one sensor array (A, B; A, B1; Ai) in order to extract, from at least one first relative position of the sensor array and of the object (20) to be tested, an item of photometric information (Figure 5a) concerning a first surface (3) located on the object (20) to be tested and of a corresponding item of geometric information (Figure 5b) also concerning said surface (3). The method consists of the following steps: (a) recording image data of at least one section of the object (20) using at least one first optical sensor array (A, B; B1, A), whereby at least one of the regions (3) of the test object comprises at least one unaligned surface whose span extends in a manner which is not substantially perpendicular to an optical axis (100) of the sensor array, and; (b) executing a local filtering of image data within the one surface of at least one region (3) in an essentially uniform raster (21) by forming a multitude of raster areas (30, 31, 33) in the surface or in the image data of the surface which are smaller than the surface.
    • 本发明涉及一种方法,用于制备一个自动的,非接触式和非破坏性检测对准不垂直于光轴(100)面(1,2,3,4; 1 *,3 *)的对象的要被通过至少一个传感器装置检查( 一,B; A,B1;一个ⅰ)(以获得的测光信息5a)的第一表面(3)和一个相应的几何信息于此(图5b)的所述表面(3)到(待检查物体20)由至少 传感器装置和对象的第一相对位置,以进行测试(20)。 其中所述区域中的至少一个(3)通过至少一个第一光传感器布置在测试对象的至少一个不是,(a)所述对象(20)的截面的记录图像数据zumindst的(B1,A,A,B):该方法包括几个步骤 导向表面具有,其程度不延伸基本上垂直于所述传感器装置的光轴(100)对准; 和(b)通过在表面上形成更小的网格区域的表面相对的多个(30,31,33)中的基本均匀的网格(21)的所述至少一个区域(3)的所述一个表面内执行所述图像数据的局部过滤 和表面的图像数据。
    • 7. 发明专利
    • DE19600958A1
    • 1997-01-23
    • DE19600958
    • 1996-01-12
    • FRAUNHOFER GES FORSCHUNG
    • WAGNER THOMASFRISCHHOLZ ROBERTBAUER NORBERT
    • G08B13/196H04N5/232G06K9/62G06T7/20G07C9/00H04N7/18
    • A process is disclosed for observing or monitoring an area in space. Images of the area (1) to be observed/monitored are taken by means of at least one camera (2), the converted image information is sent to a control computer (3), the control computer (3) checks the images for changes in the observed area (1), the main direction and/or speed of optically perceptible changes (movements) in the observed area are analysed by analysis of the optical flow, the analysis result is converted into control instructions sent to a controller (4) that mechanically moves the camera, and if required the position and/or size of the image section that may be taken by the camera is modified. Also disclosed is an interactive surveillance system with a control computer (3) connected to or integrated into a camera (2) or into one among several cameras. The control computer (3) receives and processes the data recorded by the camera(s) and sends control signals to a zoom lens (5). A mechanical controller (4) reacts to impulses from the control computer (3) and modifies the recording section of the area (1) to be observed or the size of the image section (5). A device reacts to signals from the control computer (3) and opens a normally closed passage.
    • 9. 发明专利
    • AT173538T
    • 1998-12-15
    • AT94906879
    • 1994-02-16
    • FRAUNHOFER GES FORSCHUNG
    • BOEBEL FRIEDRICHBAUER NORBERT
    • G01B11/06G01J5/00
    • The invention describes a procedure and an arrangement for measurement of temperature and thickness of layer during a deposition or coating process. As coating or depositing processes known technologies of semi-conductor manufacturing arrangements, plasma devices, ion devices, and other dry-etching arrangements may be used. The invention can also be applied to the manufacture of optical coatings. As a consequence of interference of the thermal radiation of the substrate at the growing layer, the emissivity epsilon changes continuously during coating or depositing, therefore, a pyrometric measurement of temperature may not be applied. This basic problem is solved by the invention, which uses a reflectometer, which determines the reflectivity R of the wafer. According to the law of conservation of energy epsilon =1-R so that with said reflectometer the actual emissivity of the whole (multi-layer) system may be determined. The measurement of temperature then is effected by means of a determination equation. Concurrently the thickness is determined by a comparison of the reflectometer-curve and a theoretical dependency of thickness of layer.