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1. 发明申请

US20100258510A1 METHODS AND APPARATUS FOR TREATING EFFLUENT 审中-公开
标题翻译：处理液体的方法和装置
公开(公告)号：US20100258510A1
公开(公告)日：2010-10-14
申请号：US12755737
申请日：2010-04-07
申请人： FRANK F. HOOSHDARAN , TETSUYA ISHIKATA , JAY J. JUNG , PHIL CHANDLER , DANIEL O. CLARK
发明人： FRANK F. HOOSHDARAN , TETSUYA ISHIKATA , JAY J. JUNG , PHIL CHANDLER , DANIEL O. CLARK
IPC分类号： B01D35/00
CPC分类号： B01D53/68 , B01D2251/102 , B01D2251/202 , B01D2257/204 , B01D2257/206 , B01D2257/2066 , B01D2257/708 , B01D2258/0216 , Y02W10/37
摘要： Methods and apparatus for treating effluents in process systems are provided In some embodiments, a system for treating effluent includes a process chamber having a processing volume; an exhaust conduit coupled to the process chamber to remove an effluent from the processing volume; and a reactive species generator coupled to the exhaust conduit to inject a reactive species into the exhaust conduit to treat the effluent, wherein the reactive species generator generates a reactive species comprising at least one of singlet hydrogen, hydrogen ions or hydrogen radicals. In some embodiments, a method for treating effluent includes flowing an effluent from a processing volume of a process system through an exhaust conduit fluidly coupled to the processing volume; treating the effluent in the exhaust conduit with a reactive species comprising at least one of singlet hydrogen, hydrogen ions, or hydrogen radicals; and flowing the treated effluent to an abatement system.
摘要翻译：在一些实施方案中，用于处理流出物的系统包括具有处理量的处理室; 排出管道，其耦合到所述处理室以从所述处理容积中除去流出物; 以及反应物质发生器，其耦合到所述排气管道以将反应物质注入所述排气管道中以处理所述流出物，其中所述反应物种发生器产生包含单一氢，氢离子或氢自由基中的至少一种的活性物质。在一些实施方案中，用于处理流出物的方法包括将来自处理系统的处理体积的流出物流经流体耦合到处理体积的排气导管; 用包含单一氢，氢离子或氢自由基中的至少一种的活性物质处理排气管道中的流出物; 并将经处理的流出物流入减排系统。

2. 发明申请

US20110144791A1 ENERGY SAVINGS AND GLOBAL GAS EMISSIONS MONITORING 有权
标题翻译：能源节约和全球气体排放监测
公开(公告)号：US20110144791A1
公开(公告)日：2011-06-16
申请号：US12945869
申请日：2010-11-14
申请人： YOUSSEF A. LOLDJ , MAXIME CAYER , JAY J. JUNG , SHAUN CRAWFORD , DANA TRIBULA , DANIEL O. CLARK
发明人： YOUSSEF A. LOLDJ , MAXIME CAYER , JAY J. JUNG , SHAUN CRAWFORD , DANA TRIBULA , DANIEL O. CLARK
IPC分类号： G06F19/00
CPC分类号： G05B19/042 , G05B19/045 , G05B2219/23316 , G05B2219/2612
摘要： Methods and apparatus for enhanced control, monitoring and recording of incoming chemical and power use, and emissions of electronic device manufacturing systems are provided. In some embodiments, integrated sub-fab system systems may monitor the energy usage of the sub-fab equipment. The tool can enter many different depths of energy savings modes such as idle (shallow energy savings where production equipment can recover to normal production with no quality or throughput impact in seconds), sleep (deeper energy savings where production equipment can recover in minutes), or hibernate (where production equipment may require hours to recover not to have impact on quality, or throughput) for the system. In some embodiments, the system may monitor and display all gas emissions in a sub-fab as well as the Semi S23 method reporting of CO2 equivalent emission. The system may monitor effluent process gases and energy use from the process tool and sub-fab equipment.
摘要翻译：提供了用于增强控制，监控和记录进入的化学和电力使用以及电子设备制造系统的排放的方法和装置。在一些实施例中，集成子晶圆厂系统系统可以监视子晶圆厂设备的能量使用。该工具可以进入许多不同深度的节能模式，例如空闲（生产设备可以恢复到正常生产，质量或吞吐量影响在几秒钟内）的轻微节能，睡眠（生产设备可以在几分钟内恢复更深的节能），或休眠（生产设备可能需要几个小时才能恢复，不影响质量或吞吐量）。在一些实施例中，系统可以监测和显示子晶圆中的所有气体排放以及报告二氧化碳当量排放的半S23方法。该系统可以从过程工具和辅助设备设备监测废气处理气体和能源使用。

3. 发明申请

US20120204965A1 METHOD AND APPARATUS FOR CONTROLLING A PROCESSING SYSTEM 有权
标题翻译：用于控制加工系统的方法和装置
公开(公告)号：US20120204965A1
公开(公告)日：2012-08-16
申请号：US13359899
申请日：2012-01-27
申请人： YOUSSEF LOLDJ , JAY J. JUNG , MEHRAN MOALEM , PAUL E. FISHER , JOSHUA PUTZ , ANDREAS NEUBER
发明人： YOUSSEF LOLDJ , JAY J. JUNG , MEHRAN MOALEM , PAUL E. FISHER , JOSHUA PUTZ , ANDREAS NEUBER
IPC分类号： F17D3/00
CPC分类号： F04D27/004 , F04D19/04 , F17D3/00 , H01L21/67017 , H01L21/6719 , H01L21/67253 , Y10T137/0396
摘要： Methods and apparatus for controlling a processing system are provided herein. In some embodiments, a method of controlling a processing system may include operating a vacuum pump coupled to a process chamber at a first baseline pump idle speed selected to maintain the process chamber at a pressure equal to a first baseline pump idle pressure; monitoring the pressure in the process chamber while operating the vacuum pump at the first baseline pump idle speed; and determining whether the first baseline pump idle pressure can be maintained in the process chamber when the vacuum pump is operating at the first baseline pump idle speed.
摘要翻译：本文提供了用于控制处理系统的方法和装置。在一些实施例中，一种控制处理系统的方法可以包括以选择为将处理室维持在等于第一基准泵空闲压力的压力的第一基准泵空转速度下操作联接到处理室的真空泵; 在第一基准泵怠速下操作真空泵时监测处理室中的压力; 以及当所述真空泵以所述第一基准泵怠速运转时，确定所述处理室中是否能够维持所述第一基准泵怠速压力。

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