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    • 7. 发明专利
    • Electronic device
    • 电子设备
    • JP2010266465A
    • 2010-11-25
    • JP2010182073
    • 2010-08-17
    • Formfactor Incフォームファクター, インコーポレイテッド
    • MATHIEU GAETAN LELDRIDGE BENJAMIN NGRUBE GARY W
    • G01R1/073G01B7/34G01N27/00G01R1/067G01R3/00H01L21/48H01L21/60H01L21/66H01L23/48H01R12/16H01R33/76H05K3/32H05K3/40
    • G01R3/00G01R1/06727G01R1/06761H01L2924/0002H01L2924/01005H01L2924/14H05K3/326H05K3/4092H01L2924/00
    • PROBLEM TO BE SOLVED: To miniaturize an electric connection mechanism between electronic components. SOLUTION: This invention is directed to a method of forming an interconnection, including a spring contact element, by lithographic techniques. In one embodiment, the method includes applying a masking material over a first portion of a substrate, the masking material having an opening which will define a first portion of a spring structure, depositing a structure material (e.g., conductive material) in the opening, overfilling the opening with the structure material, removing a portion of the structure material, and removing a first portion of the masking material. In this embodiment, at least a portion of the first portion of the spring structure is freed of masking material. In one aspect of the invention, the method includes planarizing the masking material layer and structure material to remove a portion of the structure material. In another aspect, the formed spring structure includes one of a post portion 13, a beam portion 14, and a tip portion 16. COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:为了使电子部件之间的电连接机构小型化。 解决方案:本发明涉及通过光刻技术形成包括弹簧接触元件的互连的方法。 在一个实施例中,该方法包括在衬底的第一部分上施加掩模材料,掩模材料具有将限定弹簧结构的第一部分的开口,在开口中沉积结构材料(例如导电材料) 用结构材料过度填充开口,去除结构材料的一部分,以及去除掩模材料的第一部分。 在该实施例中,弹簧结构的第一部分的至少一部分没有掩蔽材料。 在本发明的一个方面中,该方法包括平坦化掩模材料层和结构材料以去除结构材料的一部分。 另一方面,所形成的弹簧结构包括柱部分13,梁部分14和末端部分16中的一个。版权所有:(C)2011,JPO&INPIT