专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09632430B2 Lithographic system, lithographic method and device manufacturing method 有权
公开(公告)号：US09632430B2
公开(公告)日：2017-04-25
申请号：US13120495
申请日：2009-09-17
申请人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Scott Anderson Middlebrooks
发明人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Scott Anderson Middlebrooks
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70625 , G03F7/70525
摘要： A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.

2. 发明申请

US20110299050A1 Lithographic System, Lithographic Method And Device Manufacturing Method 有权
标题翻译：平版印刷系统，平版印刷方法和器件制造方法
公开(公告)号：US20110299050A1
公开(公告)日：2011-12-08
申请号：US13120495
申请日：2009-09-17
申请人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Scott Anderson Middlebrooks
发明人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Scott Anderson Middlebrooks
IPC分类号： G03B27/54
CPC分类号： G03F7/70625 , G03F7/70525
摘要： A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.
摘要翻译：光刻系统包括光刻设备和散射仪。在一个实施例中，光刻设备包括布置成照亮图案的照明光学系统和布置成将图案的图像投影到基板上的投影光学系统。在一个实施例中，散射仪包括测量系统，其布置成将辐射束引导到所述基板上的目标图案上，并且获得代表从目标图案散射的辐射的光瞳平面的图像。计算装置表示由一对正交基函数计算的瞳面平面，并将力矩函数与光刻特征参数相关联以构建光刻系统识别。控制装置使用系统识别来控制由光刻设备执行的后续光刻处理。

3. 发明授权

US08706442B2 Alignment system, lithographic system and method 有权
标题翻译：对准系统，光刻系统和方法
公开(公告)号：US08706442B2
公开(公告)日：2014-04-22
申请号：US13000443
申请日：2009-07-03
申请人： Everhardus Cornelis Mos , Henricus Johannes Lambertus Megens , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
发明人： Everhardus Cornelis Mos , Henricus Johannes Lambertus Megens , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
IPC分类号： G06F15/00 , G03B27/54
CPC分类号： G03F9/7003 , G03F7/705 , G03F7/70633
摘要： A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.
摘要翻译：光刻系统包括光刻设备，其包括投影系统，该投影系统将图案化的辐射束投影到基板的目标部分上;以及对准系统，该对准系统在衬底上的多个位置处测量衬底上的图案的特征的位置。控制器将测量位置与值网格上的点进行比较，并基于栅格上对应的中间点的值来外推基板上的中间位置的值，以便提供基板上的中间位置及其相对位移的指示到电网。网格基于至少一个正交基函数，基板上的测量在对应于至少一个正交基函数的根值的位置处执行。

4. 发明授权

US08248579B2 Lithographic apparatus, device manufacturing method and device for correcting overlay errors between overlapping patterns 有权
标题翻译：平版印刷设备，装置制造方法和用于校正重叠图案之间的重叠误差的装置
公开(公告)号：US08248579B2
公开(公告)日：2012-08-21
申请号：US11948801
申请日：2007-11-30
申请人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons
发明人： Everhardus Cornelis Mos , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons
IPC分类号： G03B27/68
CPC分类号： G03F7/70725 , G03F7/70258 , G03F7/70358 , G03F7/70458 , G03F7/70525 , G03F7/70633 , G03F7/70783
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region.
摘要翻译：光刻设备包括配置成调节辐射束的照明系统，图案形成装置的支撑件，用于衬底的衬底台，投影系统和控制系统。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。投影系统被配置为沿着扫描路径将图案化的辐射束作为图像投影到基板的目标部分上。扫描路径由光刻设备的曝光场的扫描方向上的轨迹限定。控制系统耦合到支撑件，基板台和投影系统，用于分别控制支撑件，基板台和投影系统的作用。控制系统被配置为通过在该区域中的图像的时间调整来校正沿着扫描路径的区域中的图像的局部失真。

5. 发明授权

US07564555B2 Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
标题翻译：用于角分辨光谱光刻特征的方法和装置
公开(公告)号：US07564555B2
公开(公告)日：2009-07-21
申请号：US11504106
申请日：2006-08-15
申请人： Arie Jeffrey Den Boef , Mircea Dusa , Everhardus Cornelis Mos , Maurits Van Der Schaar , Stefan Carolus Jacobus Antonius Keij
发明人： Arie Jeffrey Den Boef , Mircea Dusa , Everhardus Cornelis Mos , Maurits Van Der Schaar , Stefan Carolus Jacobus Antonius Keij
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： An inspection system is arranged to measure an overlay error by projecting a plurality of radiation beams, differing in wavelength and/or polarization, onto two targets. A first radiation beam is projected onto a first target and the reflected radiation A1+ is detected. The first target comprises two gratings having a bias +d with respect to each other. The first radiation beam is also projected on to a second target, which comprises two gratings having a bias −d with respect to each other, and the reflected radiation A1− is detected. A second radiation beam, having a different wavelength and/or polarization from the first radiation beam, is projected onto the first target and reflected radiation A2+ is detected and projected onto the second target and reflected radiation A2− is detected. Detected radiations A1+, A1−, A2+, and A2− is used to determine the overlay error.
摘要翻译：检查系统被布置成通过将不同波长和/或极化的多个辐射束投影到两个目标上来测量覆盖误差。将第一辐射束投射到第一靶上并检测反射辐射A1 +。第一个目标包括两个相对于彼此具有偏压+ d的光栅。第一辐射束也被投射到第二靶上，第二靶被包括相对于彼此具有偏压-d的两个光栅，并且检测到反射辐射A1-。具有与第一辐射束不同的波长和/或极化的第二辐射束被投影到第一目标上，并且检测反射辐射A2 +并将其投影到第二目标上，并检测反射辐射A2-。检测到的辐射A1 +，A1-，A2 +和A2-用于确定覆盖误差。

6. 发明申请

US20090066921A1 METHOD FOR PRODUCING A MARKER ON A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 失效
标题翻译：在基板上生产标记的方法，平版印刷设备和器件制造方法
公开(公告)号：US20090066921A1
公开(公告)日：2009-03-12
申请号：US12269390
申请日：2008-11-12
申请人： Maurits Van Der Schaar , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Rene Monshouwer
发明人： Maurits Van Der Schaar , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Rene Monshouwer
IPC分类号： G03B27/52
CPC分类号： G03F7/105 , G03F7/168 , G03F9/708 , G03F9/7084
摘要： A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.
摘要翻译：在衬底上产生标记的方法包括将图案化的光束投影到设置在光刻设备中的衬底的抗蚀剂层上以产生潜在标记; 并且在光刻设备中的标记位置处局部加热衬底，以将潜在标记转变成可检测标记。

7. 发明申请

US20080218767A1 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods 失效
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法，用于该方法的基板
公开(公告)号：US20080218767A1
公开(公告)日：2008-09-11
申请号：US11714904
申请日：2007-03-07
申请人： Everhardus Cornelis Mos , Arie Jeffrey Den Boef , Maurits Van Der Schaar
发明人： Everhardus Cornelis Mos , Arie Jeffrey Den Boef , Maurits Van Der Schaar
IPC分类号： G01B11/24
CPC分类号： G03F7/70633
摘要： An overlay marker for use with a scatterometer includes two overlying two-dimensional gratings. The two gratings have the same pitch but the upper grating has a lower duty ratio. Cross-talk between X and Y overlay measurements can therefore be avoided. The gratings may be directly overlying or off set so as to be interleaved in one or two directions.
摘要翻译：与散射仪一起使用的叠加标记包括两个上覆的二维光栅。两个光栅具有相同的间距，但是上部光栅具有较低的占空比。因此可以避免X和Y重叠测量之间的串扰。光栅可以直接覆盖或偏离设置，以便沿一个或两个方向交错。

8. 发明授权

US08111398B2 Method of measurement, an inspection apparatus and a lithographic apparatus 有权
标题翻译：测量方法，检查装置和光刻设备
公开(公告)号：US08111398B2
公开(公告)日：2012-02-07
申请号：US12770153
申请日：2010-04-29
申请人： Maurits Van der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos
发明人： Maurits Van der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos
IPC分类号： G01B11/00 , G03C5/00
CPC分类号： G03F7/70633 , H01L22/12
摘要： According to an example, a first layer of a substrate comprises a plurality of gratings having a periodicity P. A second layer of the substrate comprises a plurality of gratings, overlapping with the first set of gratings, and having a periodicity of NP, where N is an integer greater than 2. A first set of gratings has a bias of +d and the second set of gratings has a bias of −d. A beam of radiation is projected onto the gratings and the angle resolved spectrum of the reflected radiation detected. The overlay error is then calculated using the angle resolved spectrum of the reflected radiation.
摘要翻译：根据示例，衬底的第一层包括具有周期P的多个光栅。衬底的第二层包括与第一组光栅重叠并且具有NP的周期性的多个光栅，其中N 是大于2的整数。第一组光栅具有+ d的偏置，第二组光栅具有-d的偏置。将辐射束投射到光栅上，并检测到反射辐射的角度分辨光谱。然后使用反射辐射的角度分辨光谱计算覆盖误差。

9. 发明授权

US07619737B2 Method of measurement, an inspection apparatus and a lithographic apparatus 有权
标题翻译：测量方法，检查装置和光刻设备
公开(公告)号：US07619737B2
公开(公告)日：2009-11-17
申请号：US11656004
申请日：2007-01-22
申请人： Everhardus Cornelis Mos , Maurits Van Der Schaar
发明人： Everhardus Cornelis Mos , Maurits Van Der Schaar
IPC分类号： G01B11/00
CPC分类号： H01L21/0274 , G01N21/4738 , G03F7/70633 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： Radiation is projected onto a plurality of targets on a substrate. By assuming that the overlay error derivable from asymmetry varies smoothly across the substrate, the number of targets measured can be reduced. This may result in a smaller area of the scribe lane being used by targets for each layer of the substrate.
摘要翻译：辐射被投影到基板上的多个靶上。通过假设由不对称性导出的重叠误差在衬底上平滑地变化，可以减少所测量的目标数量。这可能导致划线的较小区域被基板每层的目标使用。

10. 发明授权

US07599064B2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method, substrate for use in the methods 失效
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法，用于该方法的基板
公开(公告)号：US07599064B2
公开(公告)日：2009-10-06
申请号：US11714904
申请日：2007-03-07
申请人： Everhardus Cornelis Mos , Arie Jeffrey Den Boef , Maurits Van Der Schaar
发明人： Everhardus Cornelis Mos , Arie Jeffrey Den Boef , Maurits Van Der Schaar
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： An overlay marker for use with a scatterometer includes two overlying two-dimensional gratings. The two gratings have the same pitch but the upper grating has a lower duty ratio. Cross-talk between X and Y overlay measurements can therefore be avoided. The gratings may be directly overlying or off set so as to be interleaved in one or two directions.
摘要翻译：与散射仪一起使用的叠加标记包括两个上覆的二维光栅。两个光栅具有相同的间距，但是上部光栅具有较低的占空比。因此可以避免X和Y重叠测量之间的串扰。光栅可以直接覆盖或偏离设置，以便沿一个或两个方向交错。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式