专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07505619B2 System and method for conducting adaptive fourier filtering to detect defects in dense logic areas of an inspection surface 有权
标题翻译：用于进行自适应傅立叶滤波以检测检查表面的密集逻辑区域中的缺陷的系统和方法
公开(公告)号：US07505619B2
公开(公告)日：2009-03-17
申请号：US11314779
申请日：2005-12-20
申请人： Evan R. Mapoles , Grace H. Chen , Christopher F. Bevis , David W. Shortt
发明人： Evan R. Mapoles , Grace H. Chen , Christopher F. Bevis , David W. Shortt
IPC分类号： G06K9/00
CPC分类号： G01N21/95607 , G01N21/47 , G01N21/95623 , G01N2021/8822
摘要： A dark field surface inspection tool and system are disclosed herein. The tool includes an illumination source capable of scanning a light beam onto an inspection surface. Light scattered by each inspection point is captured as image data by a photo detector array arranged at a fourier plane. The images captured are adaptively filtered to remove a portion of the bright pixels from the images to generate filtered images. The filtered images are then analyzed to detect defects in the inspection surface. Methods of the invention include using die-to-die comparison to identify bright portions of scattering patterns and generate unique image filters associated with those patterns. The associated images are then filtered to generate filtered images which are then used to detect defects. Also, data models of light scattering behavior can be used to generate filters.
摘要翻译：本文公开了一种暗场表面检查工具和系统。该工具包括能够将光束扫描到检查表面上的照明源。由每个检查点散射的光通过布置在傅立叶平面上的光检测器阵列捕获为图像数据。捕获的图像被自适应地滤波以从图像中去除一部分亮像素以产生滤波图像。然后分析滤波图像以检测检查表面中的缺陷。本发明的方法包括使用管芯到管芯的比较来识别散射图案的亮部分并且生成与这些图案相关联的独特的图像滤波器。然后将相关联的图像过滤以产生滤波图像，然后将其用于检测缺陷。此外，可以使用光散射行为的数据模型来生成滤波器。

2. 发明授权

US07106432B1 Surface inspection system and method for using photo detector array to detect defects in inspection surface 有权
标题翻译：表面检测系统及使用光电检测器阵列检测检测表面缺陷的方法
公开(公告)号：US07106432B1
公开(公告)日：2006-09-12
申请号：US10315713
申请日：2002-12-09
申请人： Evan R. Mapoles , Grace H. Chen , Christopher F. Bevis , David W. Shortt
发明人： Evan R. Mapoles , Grace H. Chen , Christopher F. Bevis , David W. Shortt
IPC分类号： G01N21/00 , G01N21/88 , G06K9/00
CPC分类号： G01N21/9501 , G01N21/95607
摘要： A dark field surface inspection tool of the invention includes an illumination source for directing a light beam onto a work piece. The tool includes a scanning element for enabling selected inspection points on the work piece to be scanned by the light beam. During scanning, the light scattered by each inspection point generates light scattering patterns associated with the surface characteristics of the scanned inspection point. The tool includes a photo detector array having photosensitive elements arranged to receive light from the light scattering pattern, thereby capturing an image of the light scattering pattern for each inspection point. Comparison circuitry is included for comparing light scattering patterns with a reference image to enable the identification of defects at the inspection point. The invention also includes a dark field surface inspection method comprising illuminating an inspection surface with a light beam, capturing images of light scattered from the inspection surface and comparing those images with suitable reference images to detect defects in the inspection surface.
摘要翻译：本发明的暗场表面检查工具包括用于将光束引导到工件上的照明源。该工具包括扫描元件，用于使工件上的选定检查点能够被光束扫描。在扫描期间，由每个检查点散射的光产生与扫描检查点的表面特性相关联的光散射图案。该工具包括光电检测器阵列，其具有布置成接收来自光散射图案的光的光敏元件，由此捕获每个检查点的光散射图案的图像。包括比较电路，用于将光散射图与参考图像进行比较，以便能够在检查点识别缺陷。本发明还包括暗场表面检查方法，其包括用光束照射检查表面，捕获从检查表面散射的光的图像，并将这些图像与合适的参考图像进行比较，以检测检查表面中的缺陷。

3. 发明授权

US07663746B2 Method and apparatus for scanning, stitching and damping measurements of a double sided metrology inspection tool 有权
标题翻译：用于双面计量检测工具的扫描，缝合和阻尼测量的方法和装置
公开(公告)号：US07663746B2
公开(公告)日：2010-02-16
申请号：US12287290
申请日：2008-10-07
申请人： Paul J. Sullivan , Geroge Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
发明人： Paul J. Sullivan , Geroge Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
IPC分类号： G01N21/84
CPC分类号： G01N21/9501 , G01R31/2656 , G01R31/2831
摘要： A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens using a damping arrangement which filters unwanted acoustic and seismic vibration, including an optics arrangement which scans a first portion of the specimen and a translation or rotation arrangement for translating or rotating the specimen to a position where the optics arrangement can scan the remaining portion(s) of the specimen. The system further includes means for stitching the scans together, thereby providing both damping of the specimen and the need for smaller and less expensive optical elements.
摘要翻译：提供了用于检查诸如半导体晶片的样本的系统。该系统使用阻挡装置提供对双面试样的扫描，该阻尼装置滤除不想要的声波和地震振动，包括扫描试样的第一部分的光学装置和用于将试样平移或旋转的平移或旋转装置，光学装置可以扫描样品的剩余部分。该系统还包括用于将扫描拼接在一起的装置，从而提供试样的阻尼和对较小和较便宜的光学元件的需要。

4. 发明授权

US06686996B2 Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool 有权
标题翻译：用于双面计量检查工具的扫描，缝合和阻尼测量的方法和装置
公开(公告)号：US06686996B2
公开(公告)日：2004-02-03
申请号：US10165344
申请日：2002-06-07
申请人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
发明人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
IPC分类号： G01N2184
CPC分类号： G01N21/9501 , G01R31/2656 , G01R31/2831
摘要： A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens using a damping arrangement which filters unwanted acoustic and seismic vibration, including an optics arrangement which scans a first portion of the specimen and a translation or rotation arrangement for translating or rotating the specimen to a position where the optics arrangement can scan the remaining portion(s) of the specimen. The system further includes means for stitching the scans together, thereby providing both damping of the specimen and the need for smaller and less expensive optical elements.
摘要翻译：提供了用于检查诸如半导体晶片的样本的系统。该系统使用阻挡装置提供对双面试样的扫描，该阻尼装置滤除不想要的声波和地震振动，包括扫描试样的第一部分的光学装置和用于将试样平移或旋转的平移或旋转装置，光学装置可以扫描样品的剩余部分。该系统还包括用于将扫描拼接在一起的装置，从而提供试样的阻尼和对较小和较便宜的光学元件的需要。

5. 发明授权

US06414752B1 Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool 有权
标题翻译：用于双面计量检查工具的扫描，缝合和阻尼测量的方法和装置
公开(公告)号：US06414752B1
公开(公告)日：2002-07-02
申请号：US09335673
申请日：1999-06-18
申请人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
发明人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
IPC分类号： G01N2188
CPC分类号： G01N21/9501 , G01R31/2656 , G01R31/2831
摘要： A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens using a damping arrangement which filters unwanted acoustic and seismic vibration, including an optics arrangement which scans a first portion of the specimen and a translation or rotation arrangement for translating or rotating the specimen to a position where the optics arrangement can scan the remaining portion(s) of the specimen. The system further includes means for stitching the scans together, thereby providing both damping of the specimen and the need for smaller and less expensive optical elements.
摘要翻译：提供了用于检查诸如半导体晶片的样本的系统。该系统使用阻挡装置提供对双面试样的扫描，该阻尼装置滤除不想要的声波和地震振动，包括扫描样品的第一部分的光学装置和用于将样品平移或旋转的平移或旋转装置，光学装置可以扫描样品的剩余部分。该系统还包括用于将扫描拼接在一起的装置，从而提供试样的阻尼和对较小和较便宜的光学元件的需要。

6. 发明授权

US07009696B2 Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool 有权
公开(公告)号：US07009696B2
公开(公告)日：2006-03-07
申请号：US10759764
申请日：2004-01-16
申请人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
发明人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
IPC分类号： G01N21/84
CPC分类号： G01N21/9501 , G01R31/2656 , G01R31/2831
摘要： A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens using a damping arrangement which filters unwanted acoustic and seismic vibration, including an optics arrangement which scans a first portion of the specimen and a translation or rotation arrangement for translating or rotating the specimen to a position where the optics arrangement can scan the remaining portion(s) of the specimen. The system further includes means for stitching the scans together, thereby providing both damping of the specimen and the need for smaller and less expensive optical elements.

7. 发明申请

US20090040514A1 Method and apparatus for scanning, stitching and damping measurements of a double sided metrology inspection tool 有权
标题翻译：用于双面计量检测工具的扫描，缝合和阻尼测量的方法和装置
公开(公告)号：US20090040514A1
公开(公告)日：2009-02-12
申请号：US12287290
申请日：2008-10-07
申请人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
发明人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01R31/2656 , G01R31/2831
摘要： A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens using a damping arrangement which filters unwanted acoustic and seismic vibration, including an optics arrangement which scans a first portion of the specimen and a translation or rotation arrangement for translating or rotating the specimen to a position where the optics arrangement can scan the remaining portion(s) of the specimen. The system further includes means for stitching the scans together, thereby providing both damping of the specimen and the need for smaller and less expensive optical elements.
摘要翻译：提供了用于检查诸如半导体晶片的样本的系统。该系统使用阻挡装置提供对双面试样的扫描，该阻尼装置滤除不想要的声波和地震振动，包括扫描样品的第一部分的光学装置和用于将样品平移或旋转的平移或旋转装置，光学装置可以扫描样品的剩余部分。该系统还包括用于将扫描拼接在一起的装置，从而提供试样的阻尼和对较小和较便宜的光学元件的需要。

8. 发明授权

US07436506B2 Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool 有权
标题翻译：用于双面计量检查工具的扫描，缝合和阻尼测量的方法和装置
公开(公告)号：US07436506B2
公开(公告)日：2008-10-14
申请号：US11366108
申请日：2006-03-01
申请人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
发明人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
IPC分类号： G01N21/84
CPC分类号： G01N21/9501 , G01R31/2656 , G01R31/2831
摘要： A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens using a damping arrangement which filters unwanted acoustic and seismic vibration, including an optics arrangement which scans a first portion of the specimen and a translation or rotation arrangement for translating or rotating the specimen to a position where the optics arrangement can scan the remaining portion(s) of the specimen. The system further includes means for stitching the scans together, thereby providing both damping of the specimen and the need for smaller and less expensive optical elements.
摘要翻译：提供了用于检查诸如半导体晶片的样本的系统。该系统使用阻挡装置提供对双面试样的扫描，该阻尼装置滤除不想要的声波和地震振动，包括扫描试样的第一部分的光学装置和用于将试样平移或旋转的平移或旋转装置，光学装置可以扫描样品的剩余部分。该系统还包括用于将扫描拼接在一起的装置，从而提供试样的阻尼和对较小和较便宜的光学元件的需要。

9. 发明授权

US07199874B2 Darkfield inspection system having a programmable light selection array 有权
标题翻译：具有可编程光选择阵列的暗场检查系统
公开(公告)号：US07199874B2
公开(公告)日：2007-04-03
申请号：US11297028
申请日：2005-12-07
申请人： Christopher F. Bevis , Paul J. Sullivan , David W. Shortt , George J. Kren
发明人： Christopher F. Bevis , Paul J. Sullivan , David W. Shortt , George J. Kren
IPC分类号： G01N21/88
CPC分类号： G01N21/4738 , G01N21/8806 , G01N2021/8822
摘要： An inspection tool embodiment includes an illumination source for directing a light beam onto a workpiece to generate scattered light that includes the ordinary scattering pattern of the workpiece as well as light scattered from defects of the workpiece. The embodiment includes a programmable light selection array that receives light scattered from the workpiece and selectively directs the light scattered from defects onto a photosensor which detects the defect signal. Processing circuitry receives the defect signal and conducts surface analysis of the workpiece that can include the characterizing of defects of the workpiece. The programmable light selection arrays can include, but are not limited to, reflector arrays and filter arrays. The invention also includes associated surface inspection methods.
摘要翻译：检查工具实施例包括用于将光束引导到工件上以产生散射光的照明源，其包括工件的普通散射图案以及从工件的缺陷散射的光。该实施例包括可编程光选择阵列，其接收从工件散射的光并选择性地将从缺陷散射的光引导到检测缺陷信号的光电传感器上。处理电路接收缺陷信号并进行可能包括工件缺陷表征的工件的表面分析。可编程光选择阵列可以包括但不限于反射器阵列和滤波器阵列。本发明还包括相关的表面检查方法。

10. 发明授权

US07061598B1 Darkfield inspection system having photodetector array 有权
标题翻译：具有光电检测器阵列的暗场检查系统
公开(公告)号：US07061598B1
公开(公告)日：2006-06-13
申请号：US10315340
申请日：2002-12-09
申请人： Christopher F. Bevis , David W. Shortt
发明人： Christopher F. Bevis , David W. Shortt
IPC分类号： G01N21/00
CPC分类号： G01N21/47 , G01N21/9501 , G01N2021/8822
摘要： A darkfield surface inspection tool of the invention includes an illumination source for illuminating a workpiece and generating a light scattering pattern. The light scattering pattern being configured such that the positions of the light beams of the scattering pattern are uniquely related to the scattering angles of the light beams as they are scattered from the workpiece. The tool also includes a photodetector array positioned at a detector surface to detect the light scattering pattern as it reaches the detector surface. The photodetector array produces an electrical signal that is received by signal processing electronics of the tool and can be used to characterize defects on the workpiece. The invention also includes darkfield surface inspection methods.
摘要翻译：本发明的暗视场表面检查工具包括用于照亮工件并产生光散射图案的照明源。光散射图案被配置为使得散射图案的光束的位置与从工件散射的光束的散射角唯一相关。该工具还包括位于检测器表面处的光电检测器阵列，以便在其到达检测器表面时检测光散射图案。光电检测器阵列产生由工具的信号处理电路接收的电信号，并且可用于表征工件上的缺陷。本发明还包括暗场表面检查方法。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式