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1. 发明申请

US20100097591A1 Exposure apparatuses and methods 审中-公开
标题翻译：曝光装置和方法
公开(公告)号：US20100097591A1
公开(公告)日：2010-04-22
申请号：US12588389
申请日：2009-10-14
申请人： Eul Tae Kim , Sang Don Jang , Hi Kuk Lee , Sang Hyun Park , Dong Seok Baek
发明人： Eul Tae Kim , Sang Don Jang , Hi Kuk Lee , Sang Hyun Park , Dong Seok Baek
IPC分类号： G03B27/42 , G01B11/00
CPC分类号： G03F7/70791 , G03F7/70725
摘要： An exposure apparatus may include: a stage configured to move a substrate; an optical unit configured to generate and project a plurality of laser beams; and a control unit configured to measure straightness of the stage by controlling the projection of the laser beams to an exposed surface of the substrate while moving the stage. A method to measure straightness of a stage in an exposure apparatus may include: placing a substrate on the stage; moving the stage and substrate; generating a plurality of laser beams; projecting the laser beams to the substrate on the stage; and measuring the straightness of the stage by projecting the laser beams to an exposed surface of the substrate.
摘要翻译：曝光装置可以包括：被配置为移动衬底的台; 配置成产生并投影多个激光束的光学单元; 以及控制单元，被配置为通过在移动所述平台的同时控制所述激光束到所述基板的暴露表面的投影来测量所述平台的平直度。测量曝光装置中的平台度的方法可以包括：将基板放置在平台上; 移动舞台和衬底; 产生多个激光束; 将激光束投射到载物台上的基板上; 并且通过将激光束投射到基板的暴露表面来测量平台的平直度。

2. 发明申请

US20110149297A1 Maskless exposure apparatus and multi-head alignment method thereof 审中-公开
标题翻译：无掩模曝光装置及其多头对准方法
公开(公告)号：US20110149297A1
公开(公告)日：2011-06-23
申请号：US12926881
申请日：2010-12-15
申请人： Sang Hyun Park , Hi Kuk Lee , Sang Don Jang , Oui Serg Kim , Dong Seok Baek
发明人： Sang Hyun Park , Hi Kuk Lee , Sang Don Jang , Oui Serg Kim , Dong Seok Baek
IPC分类号： G01B11/02
CPC分类号： G01B11/002 , G03F7/70258 , G03F7/70275 , G03F7/7085
摘要： Example embodiments are directed to a mask-less exposure apparatus configured to expose a pattern on a substrate using a light modulation device and a multi-head alignment method thereof. According to example embodiments, a beam measurement device measures positions and focuses of at least three beams from among a plurality of beams emitted from multiple heads, the measurement enabling alignment of a position and an angle of a lens barrel deviated from a reference position according to an error in position and focus of the measured at least three beams.
摘要翻译：示例性实施例涉及一种无掩模曝光装置，其被配置为使用光调制装置及其多头对准方法来曝光基板上的图案。根据示例性实施例，光束测量装置测量来自多个头发射的多个光束中的至少三个光束的位置和焦点，根据本发明，光束测量装置可以对距离基准位置的位置偏移和镜片角度进行对准测量的至少三个光束的位置和焦点误差。

3. 发明授权

US08804098B2 Maskless exposure apparatus having measurement optical unit to measure depths of focus of a plurality of beams and control method thereof 有权
标题翻译：具有测量光学单元以测量多个光束的焦深的无掩模曝光装置及其控制方法
公开(公告)号：US08804098B2
公开(公告)日：2014-08-12
申请号：US12926920
申请日：2010-12-17
申请人： Dong Seok Baek , Sang Don Jang , Ho Seok Choi , Hi Kuk Lee , Oui Serg Kim
发明人： Dong Seok Baek , Sang Don Jang , Ho Seok Choi , Hi Kuk Lee , Oui Serg Kim
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03B27/72 , G03F7/70291 , G03F7/70508 , G03F7/7085
摘要： Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical unit, and a control method thereof. The maskless exposure apparatus includes the measurement optical unit including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical unit.
摘要翻译：示例性实施例涉及一种无掩模曝光装置，其使用使用测量光学单元获取的多个光束的强度信息，中心位置信息，聚焦信息和/或形状信息的至少一个信息来生成和/或校正曝光数据，及其控制方法。无掩模曝光装置包括：测量光学单元，包括光传感器和图像传感器;以及控制单元，被配置为使用由测量光学单元获取的信息来生成和/或校正曝光数据。

4. 发明申请

US20110157569A1 Maskless exposure apparatus and control method thereof 有权
标题翻译：无掩模曝光装置及其控制方法
公开(公告)号：US20110157569A1
公开(公告)日：2011-06-30
申请号：US12926920
申请日：2010-12-17
申请人： Dong Seok Baek , Sang Don Jang , Ho Seok Choi , Hi Kuk Lee , Oui Serg Kim
发明人： Dong Seok Baek , Sang Don Jang , Ho Seok Choi , Hi Kuk Lee , Oui Serg Kim
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03B27/72 , G03F7/70291 , G03F7/70508 , G03F7/7085
摘要： Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical system, and a control method thereof. The maskless exposure apparatus includes the measurement optical system including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical system.
摘要翻译：示例性实施例涉及一种无掩模曝光装置，其使用使用测量光学系统获取的多个光束的强度信息，中心位置信息，聚焦信息和/或形状信息的至少一个信息来生成和/或校正曝光数据，及其控制方法。无掩模曝光装置包括测量光学系统，包括光传感器和图像传感器，以及控制单元，其被配置为使用由测量光学系统获取的信息来生成和/或校正曝光数据。

5. 发明申请

US20110286818A1 SUBSTRATE PROCESSING APPARATUS AND METHOD 审中-公开
标题翻译：基板加工装置和方法
公开(公告)号：US20110286818A1
公开(公告)日：2011-11-24
申请号：US13110435
申请日：2011-05-18
申请人： Ul Tae Kim , Sang Hyun Park , Hi Kuk Lee , Sang Don Jang
发明人： Ul Tae Kim , Sang Hyun Park , Hi Kuk Lee , Sang Don Jang
IPC分类号： B65G49/05
CPC分类号： H01L21/6734 , H01L21/67742 , H01L21/67748 , H01L21/68742
摘要： According to an example embodiment a substrate processing apparatus includes a supporting unit, a lifting unit on at least a side of the supporting unit, a tray supported by the lifting unit, and a transfer unit configured to transfer a substrate to the tray such that the substrate is positioned on the tray. The lifting unit moves the tray up and down to load or unload the substrate located on the tray on or from the supporting unit.
摘要翻译：根据示例性实施例，基板处理装置包括支撑单元，在支撑单元的至少一侧上的提升单元，由提升单元支撑的托盘以及被配置为将基板传送到托盘的转移单元，衬底位于托盘上。提升单元上下移动托盘，以将位于托盘上的基板装载或卸载到支撑单元上或从支撑单元卸载。

6. 发明申请

US20100208222A1 Exposure apparatus and method to measure beam position and assign address using the same 审中-公开
标题翻译：测量光束位置的曝光设备和方法，并使用该位置分配地址
公开(公告)号：US20100208222A1
公开(公告)日：2010-08-19
申请号：US12656093
申请日：2010-01-15
申请人： Ul Tae Kim , Hi Kuk Lee , Sang Don Jang , Sang Hyun Park , Ho Seok Choi
发明人： Ul Tae Kim , Hi Kuk Lee , Sang Don Jang , Sang Hyun Park , Ho Seok Choi
IPC分类号： G03B27/42 , G01B11/14
CPC分类号： G03B27/42 , G03F7/70291 , G03F7/7085
摘要： An exposure apparatus and a method to measure a beam position and assigning an address using the same are disclosed. The exposure apparatus includes a Digital Micromirror Device (DMD) having a plurality of micromirrors, each micromirror to modulate light projected from a light source and project a modulated DMD beam onto an exposed surface, a measurement mask to measure positions of the DMD beams projected onto the exposed surface, a sensor to detect light intensities of the DMD beams measured by the measurement mask, and a controller to determine the positions of the DMD beams according to the detected light intensities.
摘要翻译：公开了一种曝光装置和测量光束位置的方法以及使用该装置分配地址。曝光装置包括具有多个微镜的数字微镜装置（DMD），每个微反射镜调制从光源投影的光并将调制的DMD光束投射到曝光的表面上;测量掩模，用于测量投射到暴露表面，用于检测由测量掩模测量的DMD光束的光强度的传感器，以及控制器，用于根据检测到的光强度确定DMD光束的位置。

7. 发明申请

US20120019793A1 EXPOSURE APPARATUS INCLUDING THE EXPOSURE HEAD AND CONTROL METHOD THEREOF 有权
标题翻译：曝光装置，包括曝光头及其控制方法
公开(公告)号：US20120019793A1
公开(公告)日：2012-01-26
申请号：US13185983
申请日：2011-07-19
申请人： Sang Hyun Park , Sang Don Jang , Hi Kuk Lee
发明人： Sang Hyun Park , Sang Don Jang , Hi Kuk Lee
IPC分类号： G03B27/42
CPC分类号： G03F7/70291 , G03F7/70275
摘要： According to example embodiments, a method of operating an exposure apparatus including a stage having a plurality of beam measurement devices, and an exposure head unit having a first set of exposure heads and a second set of exposure heads includes measuring a position of a first exposure head of the first set of exposure heads by moving the stage to coincide a first beam measurement device of the plurality of beam measurement devices with the first exposure head, setting the measured position of the first exposure head as a reference position, and measuring positions of the second set of exposure heads with respect to the reference position.
摘要翻译：根据示例性实施例，一种操作包括具有多个光束测量装置的平台的曝光装置的方法和具有第一组曝光头和第二组曝光头的曝光头单元包括测量第一曝光的位置通过移动舞台使第一组曝光头的头部与多个光束测量装置的第一光束测量装置与第一曝光头重合，将第一曝光头的测量位置设置为基准位置，并且测量位置相对于参考位置的第二组曝光头。

8. 发明授权

US08994922B2 Lens barrel support device and maskless exposure apparatus having the same 有权
标题翻译：镜筒支撑装置和具有该镜筒支持装置的无掩模曝光装置
公开(公告)号：US08994922B2
公开(公告)日：2015-03-31
申请号：US12923939
申请日：2010-10-15
申请人： Sang Hyun Park , Sang Joon Hong , Sang Don Jang , Oui Serg Kim , Dong Seok Baek
发明人： Sang Hyun Park , Sang Joon Hong , Sang Don Jang , Oui Serg Kim , Dong Seok Baek
IPC分类号： G02B7/02 , G03F7/20 , G03B27/54
CPC分类号： G02B7/023 , G03B27/54 , G03F7/70275 , G03F7/70833
摘要： Provided is a barrel support device for supporting a lens barrel. The barrel support device may include a guide frame configured to laterally support the lens barrel and tilt with the lens barrel, a rotation guide on a first end of the guide frame, the rotation guide being ring shaped and configured attach the lens barrel to the guide frame, and a ring-shaped tilting frame configured to support a second end of the guide frame and tilt the guide frame, wherein the guide frame, the rotation guide, and the tilting frame are configured to allow the lens barrel to pass therethrough.
摘要翻译：提供了一种用于支撑镜筒的镜筒支撑装置。枪管支撑装置可以包括引导框架，其构造成横向地支撑透镜镜筒并且与镜筒倾斜;在引导框架的第一端上的旋转引导件，旋转引导件是环形的并且被配置为将镜筒附接到引导件框架和环形倾斜框架，其构造成支撑引导框架的第二端并倾斜引导框架，其中引导框架，旋转引导件和倾斜框架被配置为允许镜筒通过。

9. 发明授权

US09013674B2 Exposure apparatus including the exposure head and control method thereof 有权
标题翻译：包括曝光头的曝光装置及其控制方法
公开(公告)号：US09013674B2
公开(公告)日：2015-04-21
申请号：US13185983
申请日：2011-07-19
申请人： Sang Hyun Park , Sang Don Jang , Hi Kuk Lee
发明人： Sang Hyun Park , Sang Don Jang , Hi Kuk Lee
IPC分类号： G03F7/20
CPC分类号： G03F7/70291 , G03F7/70275
摘要： According to example embodiments, a method of operating an exposure apparatus including a stage having a plurality of beam measurement devices, and an exposure head unit having a first set of exposure heads and a second set of exposure heads includes measuring a position of a first exposure head of the first set of exposure heads by moving the stage to coincide a first beam measurement device of the plurality of beam measurement devices with the first exposure head, setting the measured position of the first exposure head as a reference position, and measuring positions of the second set of exposure heads with respect to the reference position.
摘要翻译：根据示例性实施例，一种操作包括具有多个光束测量装置的平台的曝光装置的方法和具有第一组曝光头和第二组曝光头的曝光头单元包括测量第一曝光的位置通过移动舞台使第一组曝光头的头部与多个光束测量装置的第一光束测量装置与第一曝光头重合，将第一曝光头的测量位置设置为基准位置，并且测量位置相对于参考位置的第二组曝光头。

10. 发明申请

US20110181856A1 Auto-focusing device and method for maskless exposure apparatus 审中-公开
标题翻译：自动对焦装置及无掩模曝光装置的方法
公开(公告)号：US20110181856A1
公开(公告)日：2011-07-28
申请号：US12929452
申请日：2011-01-26
申请人： Sang Min Lee , Sang Don Jang , Sang Hyun Park , Dong Seok Baek
发明人： Sang Min Lee , Sang Don Jang , Sang Hyun Park , Dong Seok Baek
IPC分类号： G03B27/34
CPC分类号： G03B21/53 , G03B27/34 , G03F9/00 , G03F9/7007 , G03F9/7026
摘要： Example embodiments are directed to an auto-focusing device for use in a maskless exposure apparatus that performs a beam focus calibration and an auto-focusing method using the same. The auto-focusing device includes a projection optical unit, a focus calibration unit, and a controller. The projection optical unit includes a distance measurement sensor and a focus controller that generate a beam of light. The focus calibration unit includes a substrate having a reference mark on which the beam generated from the projection optical unit is illuminated, a measuring optical unit configured to obtain image information of the beam illuminated on the reference mark, and a stage configured to support the substrate and the measuring optical unit. The controller is configured to control the focus controller so that a beam of the beam generated from the measuring optical unit is located on the surface of an exposed member.
摘要翻译：示例性实施例涉及一种用于执行光束聚焦校准的无蒙版曝光设备和使用其的自动聚焦方法中的自动聚焦设备。自动聚焦装置包括投影光学单元，聚焦校准单元和控制器。投影光学单元包括产生光束的距离测量传感器和聚焦控制器。焦点校准单元包括：具有参考标记的基板，从投影光学单元产生的光束照射在基准标记上;测量光学单元，被配置为获得照射在参考标记上的光束的图像信息;以及台，被配置为支撑基板和测量光学单元。控制器被配置为控制聚焦控制器，使得从测量光学单元产生的光束被定位在暴露部件的表面上。

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