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1. 发明授权

US07804579B2 Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product 有权
标题翻译：控制系统，光刻投影装置，控制支撑结构的方法以及计算机程序产品
公开(公告)号：US07804579B2
公开(公告)日：2010-09-28
申请号：US11812817
申请日：2007-06-21
申请人： Erik Roelof Loopstra , Engelbertus Antonlus Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst
发明人： Erik Roelof Loopstra , Engelbertus Antonlus Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst
IPC分类号： G03B27/42 , G03B27/58 , G03B27/32 , G01B11/00 , G01B11/14
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70858 , G03F9/7096
摘要： A control system is provided for controlling a support structure in a lithographic apparatus. The control system includes a first measurement system arranged to measure the position of a substrate supported by the support structure, the position being measured in a first coordinate system. The control system further includes a second measurement system for measuring the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. The control system further comprises a controller configured to control the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure in a manner dependent upon the position error signal.
摘要翻译：提供了一种用于控制光刻设备中的支撑结构的控制系统。控制系统包括第一测量系统，其布置成测量由支撑结构支撑的基板的位置，该位置在第一坐标系中被测量。所述控制系统还包括用于在第二坐标系中测量所述支撑结构的位置的第二测量系统，所述第一测量系统在所述第二坐标系中具有推测位置。所述控制系统还包括控制器，所述控制器被配置为基于所述第二测量系统的测量来控制所述支撑结构的位置，以将所述基板的测量位置转换成所述支撑结构在所述第二坐标系中的转换位置，基于转换位置的支撑结构，接收表示第二坐标系中的第一测量系统的推测位置和实际位置之间的差异的位置误差信号，并且以取决于位置的方式定位支撑结构误差信号。

2. 发明授权

US09134632B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09134632B2
公开(公告)日：2015-09-15
申请号：US13301712
申请日：2011-11-21
申请人： Marc Wilhelmus Maria Van Der Wijst , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
发明人： Marc Wilhelmus Maria Van Der Wijst , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , F16F15/022 , F16F15/08 , G03F7/708 , G03F7/709
摘要： Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).
摘要翻译：公开了平版印刷设备和设备制造方法，其中提供了用于减少振动在投影系统的第一元件和投影系统的第二元件之间传播的程度的装置。所公开的方法包括使用多个弹性构件串联作为隔振系统的一部分，用于分开支撑第一和第二投影系统框架的多个隔离框架以及用于第一和第二投影系统框架之间的相互作用的修改的连接位置以及隔离框架。

3. 发明授权

US07436484B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07436484B2
公开(公告)日：2008-10-14
申请号：US11022936
申请日：2004-12-28
申请人： Marc Wilhelmus Maria Van Der Wijst , Dominicus Jacobus Petrus Adrianus Franken , Erik Roelof Loopstra , Marius Ravensbergen
发明人： Marc Wilhelmus Maria Van Der Wijst , Dominicus Jacobus Petrus Adrianus Franken , Erik Roelof Loopstra , Marius Ravensbergen
IPC分类号： G03B27/68 , G03B27/42
CPC分类号： G03F7/70266 , G03F7/70825
摘要： A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.
摘要翻译：公开了一种光刻设备，其具有可变形透镜元件，图案化的辐射束通过该可变形透镜元件布置成在到达基板之前通过，并且具有被配置为透射基本上平行于投影系统的光轴的力的组合的可变形透镜致动器，以及围绕可变形透镜元件上的多个子区域处于基本垂直于光轴的轴的局部扭矩。

4. 发明授权

US07554105B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07554105B2
公开(公告)日：2009-06-30
申请号：US11263012
申请日：2005-11-01
申请人： Dominicus Jacobus Petrus A. Franken , Erik Roelof Loopstra , Pertrus Rutgerus Bartray , Marc Wilhelmus Maria Van Der Wijst , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Juliana Dries
发明人： Dominicus Jacobus Petrus A. Franken , Erik Roelof Loopstra , Pertrus Rutgerus Bartray , Marc Wilhelmus Maria Van Der Wijst , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Juliana Dries
IPC分类号： G21K5/10
CPC分类号： G03F7/70833 , G03F7/709
摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
摘要翻译：光刻设备包括安装在参考框架上的投影系统，投影系统又安装在支撑设备的基座上。基座中的振动和位移误差通过两组隔离安装件在基座和参考框架之间以及参考框架和投影系统的投影框架之间进行过滤，因此减小了投影系统的干扰。

5. 发明申请

US20080316460A1 Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product 有权
标题翻译：控制系统，光刻投影装置，控制支撑结构的方法以及计算机程序产品
公开(公告)号：US20080316460A1
公开(公告)日：2008-12-25
申请号：US11812817
申请日：2007-06-21
申请人： Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst
发明人： Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst
IPC分类号： G03B27/58 , G05B1/06
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70858 , G03F9/7096
摘要： A control system is provided for controlling a support structure in a lithographic apparatus. The control system includes a first measurement system arranged to measure the position of a substrate supported by the support structure, the position being measured in a first coordinate system. The control system further includes a second measurement system for measuring the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. The control system further comprises a controller configured to control the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure in a manner dependent upon the position error signal.
摘要翻译：提供了一种用于控制光刻设备中的支撑结构的控制系统。控制系统包括第一测量系统，其布置成测量由支撑结构支撑的基板的位置，该位置在第一坐标系中被测量。所述控制系统还包括用于在第二坐标系中测量所述支撑结构的位置的第二测量系统，所述第一测量系统在所述第二坐标系中具有推测位置。所述控制系统还包括控制器，所述控制器被配置为基于所述第二测量系统的测量来控制所述支撑结构的位置，以将所述基板的测量位置转换成所述支撑结构在所述第二坐标系中的转换位置，基于转换位置的支撑结构，接收表示第二坐标系中的第一测量系统的推测位置和实际位置之间的差异的位置误差信号，并且以取决于位置的方式定位支撑结构误差信号。

6. 发明申请

US20090122284A1 LITHOGRAPHIC APPARATUS HAVING AN ACTIVE DAMPING SUBASSEMBLY 失效
标题翻译：具有主动阻尼分层的平面设备
公开(公告)号：US20090122284A1
公开(公告)日：2009-05-14
申请号：US12249399
申请日：2008-10-10
申请人： Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
发明人： Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
IPC分类号： G03B27/42 , F16F7/10
CPC分类号： G03F7/709 , G03F7/70883
摘要： A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.
摘要翻译：光刻设备包括将图案化的辐射束投影到衬底上的投影系统和用于抑制至少部分投影系统的振动的阻尼系统，所述阻尼系统包括界面阻尼块和主动阻尼子系统，以阻尼界面阻尼块的至少一部分的振动，连接到投影系统的界面阻尼质量以及连接到界面阻尼块的主动阻尼子系统，主动阻尼子系统包括测量接口阻尼块的位置量的传感器以及致动器，其基于由传感器提供的信号对接口阻尼质量施加力。阻尼系统还包括连接到界面阻尼块的接口阻尼装置，并且被配置为在接口阻尼块的本征频率处阻尼接口阻尼块的运动。

7. 发明申请

US20120154774A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20120154774A1
公开(公告)日：2012-06-21
申请号：US13301712
申请日：2011-11-21
申请人： Marc Wilhelmus Maria VAN DER WIJST , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
发明人： Marc Wilhelmus Maria VAN DER WIJST , Hans Butler , Yim Bun Patrick Kwan , Erik Roelof Loopstra , Bernhard Geuppert , Marco Hendrikus Hermanus Oude Nijhuis , Rodolfo Guglielmi Rabe , Dick Antonius Hendrikus Laro
IPC分类号： G03B27/42
CPC分类号： G03F7/70141 , F16F15/022 , F16F15/08 , G03F7/708 , G03F7/709
摘要： Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).
摘要翻译：公开了平版印刷设备和设备制造方法，其中提供了用于减少振动在投影系统的第一元件和投影系统的第二元件之间传播的程度的装置。所公开的方法包括使用多个弹性构件串联作为隔振系统的一部分，用于分开支撑第一和第二投影系统框架的多个隔离框架以及用于第一和第二投影系统框架之间的相互作用的修改的连接位置以及隔离框架。

8. 发明授权

US08203694B2 Lithographic apparatus, projection assembly and active damping 有权
标题翻译：平版印刷设备，投影组件和主动阻尼
公开(公告)号：US08203694B2
公开(公告)日：2012-06-19
申请号：US12244879
申请日：2008-10-03
申请人： Marc Wilhelmus Maria Van Der Wijst , Erik Roelof Loopstra , Cornelius Adrianus Lambertus De Hoon
发明人： Marc Wilhelmus Maria Van Der Wijst , Erik Roelof Loopstra , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , F16F7/1005
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The lithographic apparatus further includes a substrate table constructed to hold a substrate; and a projection system configured to project the patterned beam onto a target portion of the substrate. An active damping system is provided to dampen a vibration of at least part of the projection system. The active damping system includes a combination of a sensor to measure a position quantity of the projection system and an actuator to exert a force on the projection system in dependency of a signal provided by the sensor. The active damping system is connected to a damping mass, the damping mass being connected to the projection system.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。所述光刻设备还包括构造成保持基板的基板台; 以及投影系统，被配置为将图案化的光束投影到基板的目标部分上。提供主动阻尼系统以抑制至少部分投影系统的振动。主动阻尼系统包括测量投影系统的位置量的传感器和根据由传感器提供的信号在投影系统上施加力的致动器的组合。主动阻尼系统连接到阻尼块，阻尼块连接到投影系统。

9. 发明授权

US08174671B2 Lithographic projection apparatus and method for controlling a support structure 有权
标题翻译：光刻投影装置和控制支撑结构的方法
公开(公告)号：US08174671B2
公开(公告)日：2012-05-08
申请号：US12142271
申请日：2008-06-19
申请人： Erik Roelof Loopstra , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst
发明人： Erik Roelof Loopstra , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst
IPC分类号： G03B27/42 , G03B27/58 , G03B27/32 , G01B11/14 , G01B11/00
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70858 , G03F9/7096
摘要： A control system controls a support structure of a lithographic apparatus. A first measurement system measures the position of a substrate supported by the support structure, in a first coordinate system. A second measurement system measures the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. A controller controls the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure dependent upon the position error signal.
摘要翻译：控制系统控制光刻设备的支撑结构。第一测量系统在第一坐标系中测量由支撑结构支撑的基板的位置。第二测量系统测量支撑结构在第二坐标系中的位置，第一测量系统在第二坐标系中具有推测位置。控制器基于第二测量系统的测量来控制支撑结构的位置，将基板的测量位置转换成第二坐标系中的支撑结构的转换位置，以基于转换位置定位支撑结构以接收表示第二坐标系中的第一测量系统的推测位置与实际位置之间的差异的位置误差信号，并且根据位置误差信号定位支撑结构。

10. 发明授权

US08164737B2 Lithographic apparatus having an active damping subassembly 失效
标题翻译：具有主动阻尼子组件的平版印刷设备
公开(公告)号：US08164737B2
公开(公告)日：2012-04-24
申请号：US12249399
申请日：2008-10-10
申请人： Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
发明人： Hans Butler , Erik Roelof Loopstra , Marc Wilhelmus Maria Van Der Wijst , Joost De Pee , Cornelius Adrianus Lambertus De Hoon , Stijn Boschker
IPC分类号： F16F5/00 , F16F7/10 , G03B27/32 , G03B27/42
CPC分类号： G03F7/709 , G03F7/70883
摘要： A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.
摘要翻译：光刻设备包括将图案化的辐射束投影到衬底上的投影系统和用于抑制至少部分投影系统的振动的阻尼系统，所述阻尼系统包括界面阻尼块和主动阻尼子系统，以阻尼界面阻尼块的至少一部分的振动，连接到投影系统的界面阻尼质量以及连接到界面阻尼块的主动阻尼子系统，主动阻尼子系统包括测量接口阻尼块的位置量的传感器以及致动器，其基于由传感器提供的信号对接口阻尼质量施加力。阻尼系统还包括连接到界面阻尼块的接口阻尼装置，并且被配置为在接口阻尼块的本征频率处阻尼接口阻尼块的运动。

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