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1. 发明授权

US07585596B1 Micro-sculpting using phase masks for projection lithography 失效
标题翻译：使用投影光刻相位掩模进行微雕刻
公开(公告)号：US07585596B1
公开(公告)日：2009-09-08
申请号：US10961928
申请日：2004-10-08
申请人： Eric G. Johnson , Mahesh Pitchumani , Jin Won Sung , Heidi J. Hockel
发明人： Eric G. Johnson , Mahesh Pitchumani , Jin Won Sung , Heidi J. Hockel
IPC分类号： G03F1/00
CPC分类号： G03F7/0005 , G03F1/34
摘要： Methods and systems of creating a photo-mask to form continuous relief micro-structures in photo-active material. This technology uses a basic amplitude mask or electron-beam to create a binary phase grating with pi-phase depth on a transparent reticle coated with photo-active material. The reticle is then used as a phase mask for the fabrication of analog micro-elements. The mask is used in an image reduction machine such as an optical stepper. The period and duty cycle of the phase gratings can be varied to create the proper analog intensity for the desired micro-profile on the photo-active material. The design, analysis, and fabrication procedure of this invention for prisms and positive micro-lenses has been demonstrated.
摘要翻译：创建光掩模以在光活性材料中形成连续浮雕微结构的方法和系统。该技术使用基本幅度掩模或电子束在涂覆有光活性材料的透明掩模上产生具有相位深度的二相相位光栅。然后将掩模版用作制造模拟微元件的相位掩模。该掩模用于诸如光学步进机的图像压缩机中。可以改变相位光栅的周期和占空比，以为光活性材料上的期望的微观轮廓产生适当的模拟强度。已经证明了本发明的棱镜和正微透镜的设计，分析和制造程序。

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