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    • 3. 发明申请
    • Method for Preparing Anisotropic Silica Aggregates
    • 各向异性二氧化硅聚集体的制备方法
    • US20070219305A1
    • 2007-09-20
    • US10563792
    • 2004-07-07
    • Lionel VentelonJulien HernandezFrancoise Lafuma
    • Lionel VentelonJulien HernandezFrancoise Lafuma
    • B60C1/00
    • B82Y30/00C01B33/12C01B33/16C01P2004/32C01P2004/50C01P2004/64C01P2006/12C09C1/3036C09C1/3072C09K3/1409
    • The invention concerns a method for preparing anisotropic silica aggregates comprising the following steps: a) contacting at least one polymer with non-aggregated silica particles and/or highly dispersed in an aqueous medium, with a ratio R, polymer weight to silica particle surface, ranging between 0.03 and 2 mg/m; 2; and whereof the electrostatic value of the silica particle surface is not less than the value of the charge of the silica particle surface measured in an aqueous phase without added salts at a pH not less than 7; b) consolidating the aggregates obtained at step a) either by heat treatment, or by precipitation of a mineral compound. The invention also concerns a silica aggregate comprising a chaining of elementary particles whereof the number of particles ranges between 5 and 15, whereof 80% of elementary particles are in contact with not more than 2 particles and whereof the greatest distance measurable between 2 points of the aggregate is not more than 5 times the average size of one elementary particle.
    • 本发明涉及一种制备各向异性二氧化硅聚集体的方法,包括以下步骤:a)使至少一种聚合物与非聚集的二氧化硅颗粒接触和/或高度分散在水性介质中,R与聚合物重量与二氧化硅颗粒表面的比率, 范围在0.03至2mg / m; 2; 并且二氧化硅颗粒表面的静电值不小于在不低于7的pH下在没有添加盐的情况下在水相中测量的二氧化硅颗粒表面的电荷的值; b)通过热处理或通过沉淀矿物化合物来固化在步骤a)获得的聚集体。 本发明还涉及一种二氧化硅聚集体,其包含基本粒子的连接,其中粒子数目在5至15之间,其中80%的基本粒子与不超过2个粒子接触,并且其中2个点之间的最大距离可以测量 聚集体不超过一个基本粒子的平均尺寸的5倍。
    • 4. 发明授权
    • Method for preparing anisotropic silica aggregates
    • 制备各向异性二氧化硅聚集体的方法
    • US07884153B2
    • 2011-02-08
    • US10563792
    • 2004-07-07
    • Lionel VentelonJulien HernandezFrançoise LafumaChristophe ChassenieuxChristelle Perreur
    • Lionel VentelonJulien HernandezFrançoise LafumaChristophe ChassenieuxChristelle Perreur
    • C08K3/36C01B33/18
    • B82Y30/00C01B33/12C01B33/16C01P2004/32C01P2004/50C01P2004/64C01P2006/12C09C1/3036C09C1/3072C09K3/1409
    • The invention concerns a method for preparing anisotropic silica aggregates comprising the following steps: a) contacting at least one polymer with non-aggregated silica particles and/or highly dispersed in an aqueous medium, with a ratio R, polymer weight to silica particle surface, ranging between 0.03 and 2 mg/m; 2; and whereof the electrostatic value of the silica particle surface is not less than the value of the charge of the silica particle surface measured in an aqueous phase without added salts at a pH not less than 7; b) consolidating the aggregates obtained at step a) either by heat treatment, or by precipitation of a mineral compound. The invention also concerns a silica aggregate comprising a chaining of elementary particles whereof the number of particles ranges between 5 and 15, whereof 80% of elementary particles are in contact with not more than 2 particles and whereof the greatest distance measurable between 2 points of the aggregate is not more than 5 times the average size of one elementary particle.
    • 本发明涉及一种制备各向异性二氧化硅聚集体的方法,包括以下步骤:a)使至少一种聚合物与非聚集的二氧化硅颗粒接触和/或高度分散在水性介质中,R与聚合物重量与二氧化硅颗粒表面的比率, 范围在0.03至2mg / m; 2; 并且二氧化硅颗粒表面的静电值不小于在不低于7的pH下在没有添加盐的情况下在水相中测量的二氧化硅颗粒表面的电荷的值; b)通过热处理或通过沉淀矿物化合物来固化在步骤a)获得的聚集体。 本发明还涉及一种二氧化硅聚集体,其包含基本粒子的连接,其中粒子数目在5至15之间,其中80%的基本粒子与不超过2个粒子接触,并且其中2个点之间的最大距离可以测量 聚集体不超过一个基本粒子的平均尺寸的5倍。
    • 6. 发明申请
    • MIRROR
    • 镜子
    • US20110267713A1
    • 2011-11-03
    • US13058116
    • 2009-08-10
    • Lionel VentelonOlivier BouesnardBruno Cosijns
    • Lionel VentelonOlivier BouesnardBruno Cosijns
    • G02B5/08B05D3/12B05D1/36B05D5/06B05D1/30
    • G02B5/0808F24S23/82Y02E10/40
    • Mirrors according to the present invention comprise a glass substrate (1) having a front surface (10) and a rear surface (11), said rear surface (11) carrying, in order, a silver coating layer (2) and at least one base paint layer (3); they are characterised in that the glass substrate (1), the silver coating layer (2) and the at least one base paint layer (3) have each an edge portion having a rear facing surface (51, 52, 53) arranged at an acute angle (α1, α2, α3) to the front surface of the mirror and in that they comprise an additional paint layer (4) covering substantially the whole surface of the at least one base paint layer (3) and the rear facing surfaces (51, 52, 53) of the glass substrate (1), silver coating layer (2) and at least one base paint layer (3).
    • 根据本发明的反射镜包括具有前表面(10)和后表面(11)的玻璃基板(1),所述后表面(11)依次承载银涂层(2)和至少一个 基漆层(3); 它们的特征在于,玻璃基板(1),银涂层(2)和至少一个基底漆层(3)各自具有一个边缘部分,该边缘部分具有布置在其上的后表面(51,52,53) 锐角(α1,α2,α3)到镜子的前表面,并且它们包括覆盖至少一个基底漆层(3)和后表面(3)的基本上整个表面的附加漆层(4) 51,52,53),银涂层(2)和至少一个基底漆层(3)。