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    • 5. 发明申请
    • PROCESS FOR FABRICATING AN OPTIMALLY-ACTUATING PIEZOELECTRIC MEMBRANE
    • 制造最佳实施压电膜的工艺
    • US20110061215A1
    • 2011-03-17
    • US12881955
    • 2010-09-14
    • Emmanuel DEFAYGwenaël LE RHUN
    • Emmanuel DEFAYGwenaël LE RHUN
    • H01L41/22
    • H01L41/0973B41J2/14233B41J2/161H01L41/047H01L41/053H01L41/25H01L41/29H01L41/314H01L41/317H01L41/318H01L41/43H01L41/47Y10T29/42Y10T29/49155Y10T29/49156Y10T29/49401
    • In a process for fabricating a membrane, including, on a substrate, a thin-film multilayer including a film of piezoelectric material placed between a top electrode film and a bottom electrode film and an elastic film supporting said piezoelectric film, the process includes: determining at least one concavity/convexity curvature of said membrane along an axis parallel to the plane of the films so that at least one inflection point is defined, said point allowing a first region and a second region, corresponding to a concave part and a convex part or vice versa, to be isolated; depositing, on the surface of the substrate, a thin-film multilayer including at least one film of piezoelectric material, one bottom electrode film and one top electrode film; and structuring at least one of the electrode films to define at least said first membrane region, in which an electric field perpendicular to the plane of the films may be applied, and at least said second region, in which an electric field parallel to the plane of the films may be applied.
    • 在制造膜的方法中,包括在基板上的包括放置在顶电极膜和底电极膜之间的压电材料膜的薄膜多层膜和支撑所述压电膜的弹性膜,所述方法包括:确定 所述膜沿着平行于所述膜的平面的轴线的至少一个凹凸曲率,使得至少一个拐点被限定,所述点允许对应于凹部和凸部的第一区域和第二区域 或反之亦然,被隔离; 在基板的表面上沉积包括至少一层压电材料薄膜,一个底部电极薄膜和一个顶部电极薄膜的薄膜多层膜; 并且构造至少一个所述电极膜以至少限定所述第一膜区域,其中可以施加垂直于所述膜的平面的电场,以及至少所述第二区域,其中平行于所述平面的电场 的膜可以被应用。