专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20050243452A1 MONOLITHIC HARD PELLICLE 失效
标题翻译：单晶硬壳
公开(公告)号：US20050243452A1
公开(公告)日：2005-11-03
申请号：US10709326
申请日：2004-04-28
申请人： Emily Gallagher , Rogert Leidy , Michael Lercel , Kenneth Racette , Andrew Watts
发明人： Emily Gallagher , Rogert Leidy , Michael Lercel , Kenneth Racette , Andrew Watts
IPC分类号： G03F1/14 , G02B5/22 , G03F7/00 , G03F7/20
CPC分类号： G03F1/64 , G03F1/62 , G03F7/70983
摘要： A monolithic optical pellicle and method of making used to protect a photomask during photolithography processing. The monolithic optical pellicle is comprised of a pellicle plate having a recessed central portion integrally formed with a perimeter frame of the pellicle plate such that it is a one-piece optical pellicle. The monolithic optical pellicle comprises a material of sufficient rigidity to minimize distortions in and maximize durability of the pellicle when used in combination with the recessed portion having a thickness that prevents sagging thereof due to applied forces on the resultant monolithic optical pellicle. This recessed central portion is the optical pellicle portion of the present monolithic optical pellicle, while the integral perimeter frame is used to attach the monolithic optical pellicle at the desired stand-off distance to a photomask. The monolithic optical pellicle preferably comprises a material that is transparent to an exposure field at about 157 nm wavelengths.
摘要翻译：一种单片光学防护薄膜和用于在光刻处理期间保护光掩模的方法。单片光学防护薄膜组件由具有与防护薄膜组件的周边框架一体形成的凹形中心部分的防护薄膜组成，使得它是一体的光学防护薄片组件。单片光学防护薄膜组件包括足够刚度的材料，以最小化防护薄膜组件的失真并最大化耐久性的材料，当与具有防止由于所得单片光学防护薄膜组件上施加的力而下垂的凹陷部分组合时。这个凹陷的中心部分是本单片光学防护薄膜的光学防护薄膜部分，而整体的周边框架用于以一个光掩模的所需的间隔距离连接单片光学薄膜。单片光学防护薄膜优选包括对于约157nm波长的曝光场透明的材料。

IPRDB

热门服务

关于我们

友情链接

联系方式