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1. 发明授权

US07271917B2 Lithographic apparatus, position quantity detection system and method 有权
标题翻译：光刻设备，位置量检测系统及方法
公开(公告)号：US07271917B2
公开(公告)日：2007-09-18
申请号：US11120193
申请日：2005-05-03
申请人： Edwin Teunis Van Donkelaar , Evert Hendrink Jan Draaijer , Leon Martin Levasier , Nicolas Alban Lallemant , Gerardus Martinus Antonius De Rooij
发明人： Edwin Teunis Van Donkelaar , Evert Hendrink Jan Draaijer , Leon Martin Levasier , Nicolas Alban Lallemant , Gerardus Martinus Antonius De Rooij
IPC分类号： G01B11/02
CPC分类号： G03F7/70858 , G03F7/70775
摘要： A lithographic apparatus includes a position quantity determination system to determine a position quantity of a movable part which is in operation at least partly surrounded by an area comprising a fluid. The position quantity determination system includes an interferometer system, a global sensor to determine a global value of a physical quantity of the fluid in the area, and a local sensor to determine a local value of the physical quantity of the fluid in the part of the area. The position quantity determination system is configured to determine the position quantity from an output of the interferometer, the global value of the physical quantity and the local value of the physical quantity. The physical quantity may include a pressure, a temperature, etc. The local physical quantity determination system may include a sensor, such as a high-speed sensor, a computational fluid dynamics model or a linear approximation model.
摘要翻译：光刻设备包括位置量确定系统，用于确定至少部分地被包括流体的区域包围的可操作部件的位置量。位置量确定系统包括干涉仪系统，用于确定该区域中的流体的物理量的总体值的全局传感器，以及局部传感器，用于确定该部分中的流体的物理量的局部值区。位置量确定系统被配置为从干涉仪的输出，物理量的总体值和物理量的局部值确定位置量。物理量可以包括压力，温度等。局部物理量确定系统可以包括传感器，例如高速传感器，计算流体动力学模型或线性近似模型。

2. 发明授权

US07774287B2 System and method for moving a component through a setpoint profile, lithographic apparatus and device manufacturing method 有权
标题翻译：通过设定点曲线移动组件的系统和方法，光刻设备和设备制造方法
公开(公告)号：US07774287B2
公开(公告)日：2010-08-10
申请号：US11374416
申请日：2006-03-14
申请人： Marcel François Heertjes , Yin-Tim Tso , Edwin Teunis Van Donkelaar
发明人： Marcel François Heertjes , Yin-Tim Tso , Edwin Teunis Van Donkelaar
IPC分类号： G06F15/00 , G06F17/00
CPC分类号： G05B19/371 , G05B2219/41451
摘要： A system to move a component in accordance with a setpoint profile including a plurality of target states of the component, each of the plurality of target states to be substantially attained at one of a corresponding sequence of target times, is presented. The system includes a displacement device to move the component according to the setpoint profile; a storage device containing a library of feedforward data; a signal generating part configured to identify a plurality of time segments of the setpoint profile that correspond to entries in the library of feedforward data, and access the entries in order to construct a feedforward signal; and a feedforward control system to control the operation of the displacement device by reference to the feedforward signal constructed by the signal generating part.
摘要翻译：呈现了根据包括组件的多个目标状态的设定曲线移动组件的系统，其中多个目标状态中的每一个基本上在相应的目标时间序列之一上实现。该系统包括一个移动装置，用于根据设定点轮廓移动该部件; 一个包含前馈数据库的存储设备; 信号产生部件，被配置为识别与所述前馈数据库中的条目相对应的所述设定点简档的多个时间段，并且访问所述条目以构造前馈信号; 以及前馈控制系统，通过参照由信号产生部构成的前馈信号来控制位移装置的动作。

3. 发明授权

US07289858B2 Lithographic motion control system and method 有权
标题翻译：光刻运动控制系统及方法
公开(公告)号：US07289858B2
公开(公告)日：2007-10-30
申请号：US10852688
申请日：2004-05-25
申请人： Edwin Teunis Van Donkelaar , Petrus Marinus Christianus Maria Van Den Biggelaar
发明人： Edwin Teunis Van Donkelaar , Petrus Marinus Christianus Maria Van Den Biggelaar
IPC分类号： G05B13/02
CPC分类号： G05B13/042 , G05B21/02
摘要： A lithographic apparatus comprising a control system, such as a motion control system, is presented. The control system includes an actuator for moving a moveable part, a feed-forward path from a setpoint input of the control system to the actuator, a feed-back loop, a feed-forward transfer function of the feed-forward path having a feed-forward transfer function part which is an inverse of a part of the actuator transfer function having a stable inverse, the actuator transfer function including a part having a stable inverse and a remainder potentially having an unstable inverse. The setpoint path includes a setpoint delay function, and the feed-forward transfer function further includes a second feed-forward transfer function part. A difference in delay between the setpoint delay function and the second feed-forward transfer function part is equal to a delay of the potentially unstable remainder of the actuator transfer function.
摘要翻译：提出了包括诸如运动控制系统的控制系统的光刻设备。控制系统包括用于移动可移动部件的致动器，从控制系统的设定点输入到致动器的前馈路径，反馈回路，前馈路径的前馈传递函数具有进给前向传递函数部分是具有稳定反向的致动器传递函数的一部分的倒数，致动器传递函数包括具有稳定的反相的部分和可能具有不稳定的反相的余数。设定点路径包括设定点延迟功能，前馈传送功能还包括第二前馈传送功能部件。设定点延迟功能与第二前馈传递函数部分之间的延迟差异等于致动器传递函数的潜在不稳定剩余部分的延迟。

4. 发明授权

US07148950B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07148950B2
公开(公告)日：2006-12-12
申请号：US10880605
申请日：2004-07-01
申请人： Evert Hendrik Jan Draaijer , Martinus Agnes Willem Cuijpers , Menno Fien , Marcus Joseph Elisabeth Godfried Breukers , Martijn Houkes , Edwin Teunis Van Donkelaar
发明人： Evert Hendrik Jan Draaijer , Martinus Agnes Willem Cuijpers , Menno Fien , Marcus Joseph Elisabeth Godfried Breukers , Martijn Houkes , Edwin Teunis Van Donkelaar
IPC分类号： G03B27/42
CPC分类号： G03F7/70733
摘要： A lithographic apparatus that includes an exposure system and a measurement system, is presented. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.
摘要翻译：提出了一种包括曝光系统和测量系统的光刻设备。曝光系统将图案化的光束投影到第一基板的目标部分上，而测量系统将测量光束投射到第二基板的目标部分上。装置的可移动部分的运动在装置的另一可移动部分的位置产生干扰，例如，由于空气的位移。可以通过计算作为一个或两个可移动部件的状态的函数的补偿信号来补偿该误差。

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