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1. 发明申请

WO2005038822A3 PLASMA SOURCE OF DIRECTED BEAMS AND APPLICATION THEREOF TO MICROLITHOGRAPHY 审中-公开
标题翻译：等离子体源的方向和应用于微观图
公开(公告)号：WO2005038822A3
公开(公告)日：2005-12-08
申请号：PCT/FR2004002656
申请日：2004-10-18
申请人： EPPRA , CHOI PETER
发明人： CHOI PETER
IPC分类号： G03F7/20 , G21K1/06 , H05G2/00
CPC分类号： G03F7/70575 , G03F7/70958 , G21K1/06
摘要： The invention relates to a method for generating radiation in a range of desired wavelengths in a direction of emission. According to said method, initial radiation is produced by a radiation source, the wavelengths thereof including said desired range, and said initial radiation is filtered in such a way as to substantially eliminate the initial radiation beams having a wavelength outside the desired range. The inventive method is characterised in that the filtering is carried out by setting up a controlled distribution of the refractive index of the beams in a control region through which the initial radiation passes, in such a way as to selectively deviate the beams of the initial radiation according to the wavelength thereof and to recover the beams having desired wavelengths. The invention also relates to an associated device.
摘要翻译：本发明涉及一种用于在发射方向上产生所需波长范围内的辐射的方法。根据所述方法，通过辐射源产生初始辐射，其包括所述期望范围的波长和所述初始辐射以基本上消除具有在期望范围之外的波长的初始辐射束的方式被滤波。本发明的方法的特征在于，通过在初始辐射通过的控制区域中设置光束的折射率的受控分布来执行滤波，以便选择性地偏离初始辐射束根据其波长，并恢复具有所需波长的光束。本发明还涉及一种相关联的装置。

2. 发明专利

DE602004006525T2 未知
公开(公告)号：DE602004006525T2
公开(公告)日：2008-02-14
申请号：DE602004006525
申请日：2004-10-18
申请人： EPPRA
发明人： CHOI PETER
IPC分类号： G21K1/06 , G03F7/20 , H05G2/00
摘要： The method involves producing an initial radiation with desired wavelength in the range of 0-100 nanometer, by a radiation source (211). The initial radiation is filtered by controlling distribution of refractive index of rays of the initial radiation in a control region (212), using a multilayer mirror, to selectively deviate the rays whose wavelengths are out of the desired range and to recover the rays with desired wavelengths. An independent claim is also included for a lithography device having an apparatus for generating a radiation in a transmission direction.

3. 发明专利

FR2832736A1 Coating of a support involves deposition from the interaction of a source of ions and a plasma, followed by exposure to a limited duration pulse of high density energy ion bombardment 未知
公开(公告)号：FR2832736A1
公开(公告)日：2003-05-30
申请号：FR0115366
申请日：2001-11-28
申请人： EPPRA
发明人： CHOI PETER
IPC分类号： C23C14/22 , C23C14/58 , C23C16/56 , C23C16/515 , C23C16/513
摘要： Coating of a support (10) incorporating a first material with a coating layer incorporating a second material includes at least one phase (A, A') of depositing a layer of a given thickness of material (11, 13) on the surface of the support utilizing the interaction between a source of ions and a plasma. Each phase of deposition of material is followed by a phase (B, B') of exposing the support and the layer of material deposited to a pulse of limited duration of chosen high density energy ion bombardment. The duration of the ion bombardment is less than a micro-second and preferably less than a hundred nanoseconds. The energy level of the bombarded ions is about 300-500 KeV.

4. 发明专利

FR2798551A1 未知
公开(公告)号：FR2798551A1
公开(公告)日：2001-03-16
申请号：FR9911469
申请日：1999-09-14
申请人： EPPRA
发明人： CHOI PETER
IPC分类号： G21K4/00 , A61B6/00 , A61B6/02 , G01N23/04 , G01T1/00 , G01T1/20 , G02B27/02 , H04N5/30 , H05G1/64
摘要： The invention concerns a radiology device comprising an X-ray source (11) for exposing a subject (S) to the radiation of said source, means (12) converting the X-rays into optical images for forming primary optical images, means (20) for transforming the primary optical images into secondary optical images, and means (40) for displaying the secondary images to a user. The invention is characterised in that the means forming secondary images comprise an optical chain including a succession, from the converter output towards the device output, an image enlarging assembly (22) directly exposed to the primary images of said converting means (12), an assembly (23) for optical intensification of the enlarged images and a photosensitive matrix sensor (25) for forming said secondary images.

5. 发明专利

DE602004006525D1 未知
公开(公告)号：DE602004006525D1
公开(公告)日：2007-06-28
申请号：DE602004006525
申请日：2004-10-18
申请人： EPPRA
发明人： CHOI PETER
IPC分类号： G21K1/06 , G03F7/20 , H05G2/00
摘要： The method involves producing an initial radiation with desired wavelength in the range of 0-100 nanometer, by a radiation source (211). The initial radiation is filtered by controlling distribution of refractive index of rays of the initial radiation in a control region (212), using a multilayer mirror, to selectively deviate the rays whose wavelengths are out of the desired range and to recover the rays with desired wavelengths. An independent claim is also included for a lithography device having an apparatus for generating a radiation in a transmission direction.

6. 发明专利

DE60207437T2 未知
公开(公告)号：DE60207437T2
公开(公告)日：2006-07-27
申请号：DE60207437
申请日：2002-11-28
申请人： EPPRA
发明人： CHOI PETER
IPC分类号： C23C14/22 , C23C14/58 , C23C16/56
摘要： Coating of a support (10) incorporating a first material with a coating layer incorporating a second material includes at least one phase (A, A') of depositing a layer of a given thickness of material (11, 13) on the surface of the support utilizing the interaction between a source of ions and a plasma. Each phase of deposition of material is followed by a phase (B, B') of exposing the support and the layer of material deposited to a pulse of limited duration of chosen high density energy ion bombardment. The duration of the ion bombardment is less than a micro-second and preferably less than a hundred nanoseconds. The energy level of the bombarded ions is about 300-500 KeV.

7. 发明专利

AT310106T 未知
公开(公告)号：AT310106T
公开(公告)日：2005-12-15
申请号：AT02801075
申请日：2002-11-28
申请人： EPPRA
发明人： CHOI PETER
IPC分类号： C23C14/22 , C23C14/58 , C23C16/56
摘要： Coating of a support (10) incorporating a first material with a coating layer incorporating a second material includes at least one phase (A, A') of depositing a layer of a given thickness of material (11, 13) on the surface of the support utilizing the interaction between a source of ions and a plasma. Each phase of deposition of material is followed by a phase (B, B') of exposing the support and the layer of material deposited to a pulse of limited duration of chosen high density energy ion bombardment. The duration of the ion bombardment is less than a micro-second and preferably less than a hundred nanoseconds. The energy level of the bombarded ions is about 300-500 KeV.

8. 发明专利

AT362636T 未知
公开(公告)号：AT362636T
公开(公告)日：2007-06-15
申请号：AT04817228
申请日：2004-10-18
申请人： EPPRA
发明人： CHOI PETER
IPC分类号： G21K1/06 , G03F7/20 , H05G2/00
摘要： The method involves producing an initial radiation with desired wavelength in the range of 0-100 nanometer, by a radiation source (211). The initial radiation is filtered by controlling distribution of refractive index of rays of the initial radiation in a control region (212), using a multilayer mirror, to selectively deviate the rays whose wavelengths are out of the desired range and to recover the rays with desired wavelengths. An independent claim is also included for a lithography device having an apparatus for generating a radiation in a transmission direction.

9. 发明专利

FR2861184A1 Radiation producing method for lithography device, involves filtering initial radiation using mirror to selectively deviate rays whose wavelengths are out of desired range and to recover rays with desired wavelengths 未知
公开(公告)号：FR2861184A1
公开(公告)日：2005-04-22
申请号：FR0312202
申请日：2003-10-17
申请人： EPPRA
发明人： CHOI PETER
IPC分类号： G03F7/20 , G21K1/06 , H05G2/00 , G02B5/20
摘要： The method involves producing an initial radiation with desired wavelength in the range of 0-100 nanometer, by a radiation source (211). The initial radiation is filtered by controlling distribution of refractive index of rays of the initial radiation in a control region (212), using a multilayer mirror, to selectively deviate the rays whose wavelengths are out of the desired range and to recover the rays with desired wavelengths. An independent claim is also included for a lithography device having an apparatus for generating a radiation in a transmission direction.

10. 发明专利

FR2798551B1 未知
公开(公告)号：FR2798551B1
公开(公告)日：2001-11-30
申请号：FR9911469
申请日：1999-09-14
申请人： EPPRA
发明人： CHOI PETER
IPC分类号： G21K4/00 , A61B6/00 , A61B6/02 , G01N23/04 , G01T1/00 , G01T1/20 , G02B27/02 , H04N5/30 , H05G1/64
摘要： A radiology device includes an X-ray source for exposing a subject to the radiation of said source, a converter for converting the X-rays into optical images so as to form primary optical images, a transformer for transforming the primary optical images into secondary optical images, and a display for displaying the secondary images to a user. The transformer includes an optical chain including, in succession, from the output of the converter to the output of the device, an image enlargement assembly exposed directly to the primary images from the converter, an assembly for optical intensification of the enlarged images, and a photosensitive matrix sensor for making the secondary images.

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