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    • 7. 发明申请
    • APPARATUS FOR ATOMIC LAYER DEPOSITION
    • 用于原子层沉积的装置
    • WO2011014762A1
    • 2011-02-03
    • PCT/US2010/043888
    • 2010-07-30
    • E. I. du Pont de Nemours and CompanyNUNES, GeoffreyKINARD, Richard, Dale
    • NUNES, GeoffreyKINARD, Richard, Dale
    • C23C16/54C23C16/455
    • C23C16/45551C23C16/45582C23C16/545
    • An apparatus for atomic layer deposition of a material on a moving substrate comprises a conveying arrangement for moving a substrate along a predetermined planar or curved path of travel and a coating bar having at least one precursor delivery channel. The precursor delivery channel conducts a fluid containing a material to be deposited on a substrate toward the path of travel. When in use, a substrate movable along the path of travel defines a gap between the outlet end of the precursor delivery channel and the substrate. The gap defines an impedance Z g to a flow of fluid from the precursor delivery channel. A flow restrictor is disposed within the precursor delivery channel that presents a predetermined impedance Z fc to the flow there through. The restrictor is sized such that the impedance Z fc is at least five (5) times, and more preferably at least fifteen (15) times, the impedance Z g . The impedance Z fc has a friction factor f . The restrictor in the precursor delivery channel is sized such that the impedance Z f has a friction factor f that is less than 100, and preferably less than 10.
    • 用于在移动的衬底上原子层沉积材料的装置包括用于沿着预定的平面或弯曲行进路径移动衬底的输送装置和具有至少一个前体输送通道的涂布条。 前体输送通道将包含要沉积在基底上的材料的流体传导到行进路径。 当使用时,沿着行进路径移动的基板限定了前体输送通道的出口端和基底之间的间隙。 间隙限定了来自前体输送通道的流体流动的阻抗Zg。 流量限制器设置在前体输送通道内,其向通过的流动提供预定阻抗Zfc。 限流器的尺寸使得阻抗Zfc为阻抗Zg至少五(5)倍,更优选为至少十五(15)倍。 阻抗Zfc具有摩擦系数f。 前体输送通道中的限制器的尺寸使得阻抗Zf的摩擦系数f小于100,优选小于10。