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    • 4. 发明授权
    • Hermetic package for an electronic device
    • 用于电子设备的密封包装
    • US5245136A
    • 1993-09-14
    • US757747
    • 1991-09-11
    • Dudley A. ChanceDavid B. GolandHo-Ming Tong
    • Dudley A. ChanceDavid B. GolandHo-Ming Tong
    • H01L21/48H01L21/50
    • H01L21/486H01L21/4807H01L21/50Y10S428/901Y10T428/252
    • A hermetic package for an electronic device is manufactured by providing a green glass ceramic body with a green via to produce a workpiece. The workpiece is sintered at a temperature at or above 500.degree. C., while compressing the workpiece at a pressure at or above 100 pounds per square inch, so as to obtain a hermetic package. The green via comprises a mixture of copper and a glass ceramic material with a sufficient volume of glass to produce a hermetic package, yet with sufficient copper to have a suitable electrical conductivity.The hermetic package thus produced comprises a sintered glass ceramic body having an electrically conductive sintered via which is hermetically bonded to the glass ceramic body and which comprises a mixture of an electrically conductive material and a glass ceramic material. The electrically conductive material forms at most 50 volume percent of the via.The workpiece may be sintered in a sintering fixture having a frame and a compensating insert. The compensating insert and frame bound a sintering chamber for accommodating the workpiece. By providing a frame having a thermal expansion coefficient greater than that of the workpiece, and by providing a compensating insert having a thermal expansion coefficient greater than that of the frame, a close fit can be assured between the workpiece and the sintering fixture over a large range of temperatures.
    • 通过提供具有绿色通孔的绿色玻璃陶瓷体以制造工件来制造用于电子设备的气密封装。 将工件在等于或高于500℃的温度下烧结,同时在100磅/平方英寸的压力下压缩工件,以获得气密封装。 绿色通孔包括具有足够体积的玻璃的铜和玻璃陶瓷材料的混合物以产生气密封装,但是具有足够的铜以具有合适的导电性。 如此制造的密封包装包括具有导电烧结通孔的烧结玻璃陶瓷体,其通过气密地结合到玻璃陶瓷体并且包括导电材料和玻璃陶瓷材料的混合物。 导电材料形成通孔的至多50体积%。 工件可以在具有框架和补偿插入件的烧结夹具中烧结。 补偿插入物和框架结合用于容纳工件的烧结室。 通过提供具有大于工件的热膨胀系数的热膨胀系数的框架,并且通过提供具有大于框架的热膨胀系数的热膨胀系数的补偿插入件,可以在大的工件和烧结夹具之间确保紧密配合 温度范围
    • 7. 发明授权
    • LSI Chip carrier with buried repairable capacitor with low inductance
leads
    • 具有埋入可修复电容器的LSI芯片载体,低电感引线
    • US4453176A
    • 1984-06-05
    • US336485
    • 1981-12-31
    • Dudley A. ChanceGerard V. Kopcsay
    • Dudley A. ChanceGerard V. Kopcsay
    • H05K3/46H01L23/538H01L23/64H05K1/00H05K1/16H01L27/02
    • H01L23/5383H01L23/642H01L2224/16H01L2924/09701H05K1/0286H05K1/162
    • A carrier for LSI chips includes a built-in capacitor structure in the carrier. The capacitor is located beneath the chip with the plates of the capacitor parallel to the chip mounting surface or at right angles to the chip mounting surface. The capacitor is formed by assembling an array of capacitive segments together to form the first one of the plates of a capacitor with the other plate spanning a plurality of the segments of the first plate. Each of the segments of the first plate includes a set of conductive via lines which extend up to a severable link on the chip mounting surface. The severable via is cut by means of a laser beam or the like when the capacitor must be repaired by deleting a defective segment of the capacitor. Preferably, the structure includes a pair of parallel conductive charge redistribution planes above and below the capacitor plates with connections to the respective plates providing a low inductance structure achieved by providing a current distribution which results in cancellation of magnetic flux. The lower redistribution plane is preferably connected directly to the lower capacitor plate. The upper redistribution plane is preferably connected to the segments of the first capacitor plate by means of the vias which extend first to the chip mounting surface and then down to the redistribution plane which has connections to the chip mounting pads.
    • 用于LSI芯片的载体包括载体中的内置电容器结构。 电容器位于芯片下方,电容器的平板平行于芯片安装表面或与芯片安装表面成直角。 电容器通过将电容性段的阵列组装在一起形成电容器的第一板,而另一个板跨越第一板的多个段。 第一板的每个段包括一组导电通孔线,其延伸到芯片安装表面上的可分离的连接。 当电容器必须通过删除电容器的缺陷部分进行修理时,可以通过激光束等切割可分离的通孔。 优选地,该结构包括在电容器板之上和之下的一对平行的导电电荷再分配平面,其中连接到相应的板提供通过提供导致磁通消除的电流分布而实现的低电感结构。 下再分布平面优选直接连接到下电容器板。 上再分布平面优选通过首先连接到芯片安装表面然后向下延伸到具有与芯片安装焊盘连接的再分布平面的通孔连接到第一电容器板的段。