专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07874831B2 Template having a silicon nitride, silicon carbide or silicon oxynitride film 有权
标题翻译：具有氮化硅，碳化硅或氮氧化硅膜的模板
公开(公告)号：US07874831B2
公开(公告)日：2011-01-25
申请号：US12605848
申请日：2009-10-26
申请人： Douglas J. Resnick , Mario Johannes Meissl , Kosta S. Selinidis , Frank Y. Xu
发明人： Douglas J. Resnick , Mario Johannes Meissl , Kosta S. Selinidis , Frank Y. Xu
IPC分类号： B29C59/00 , B29C33/56
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.
摘要翻译：压印光刻模板，其特别包括具有与其相关联的第一厚度的主体; 具有与其相关联的第二厚度的图案化层，包括具有与其相关联的第三厚度的多个特征。

2. 发明申请

US20100040718A1 Template Having a Silicon Nitride, Silicon Carbide or Silicon Oxynitride Film 有权
标题翻译：具有氮化硅，碳化硅或氮氧化硅膜的模板
公开(公告)号：US20100040718A1
公开(公告)日：2010-02-18
申请号：US12605848
申请日：2009-10-26
申请人： Douglas J. Resnick , Mario J. Meissl , Kosta S. Selinidis , Frank Y. Xu
发明人： Douglas J. Resnick , Mario J. Meissl , Kosta S. Selinidis , Frank Y. Xu
IPC分类号： G03F1/06
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.
摘要翻译：压印光刻模板，其特别包括具有与其相关联的第一厚度的主体; 具有与其相关联的第二厚度的图案化层，包括具有与其相关联的第三厚度的多个特征。

3. 发明申请

US20090004319A1 Template Having a Silicon Nitride, Silicon Carbide or Silicon Oxynitride Film 审中-公开
标题翻译：具有氮化硅，碳化硅或氮氧化硅膜的模板
公开(公告)号：US20090004319A1
公开(公告)日：2009-01-01
申请号：US12130259
申请日：2008-05-30
申请人： Douglas J. Resnick , Mario J. Meissl , Kosta S. Selinidis , Frank Y. Xu
发明人： Douglas J. Resnick , Mario J. Meissl , Kosta S. Selinidis , Frank Y. Xu
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith, wherein said second thickness is defined by: c1×d
摘要翻译：压印光刻模板，其特别包括具有与其相关联的第一厚度的主体; 具有与其相关联的第二厚度的图形层，包括具有与其相关联的第三厚度的多个特征，其中所述第二厚度由以下定义：c1xd

4. 发明申请

US20100104852A1 Fabrication of High-Throughput Nano-Imprint Lithography Templates 审中-公开
标题翻译：高通量纳米压印光刻模板的制作
公开(公告)号：US20100104852A1
公开(公告)日：2010-04-29
申请号：US12604094
申请日：2009-10-22
申请人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
发明人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
IPC分类号： B32B3/26 , B05D3/10 , B01D3/00 , C23C16/00 , B05D3/06
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017 , Y10T428/249978 , Y10T428/268
摘要： An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (pporous/pfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
摘要翻译：压印光刻模板包括限定平均孔径至少约0.4nm的多个孔的多孔材料。多孔材料包括硅和氧，并且杨氏模量（E）与多孔材料相对于熔融二氧化硅的相对密度（磷/二氧化硅）的比例为至少约10:1。多孔材料的折射率在约1.4和1.5之间。多孔材料可以形成压印光刻模板的中间层或盖层。模板可以包括在多孔层和盖层之间的孔密封层，或者在盖层的顶部上的孔密封层。

5. 发明授权

US09778562B2 Porous template and imprinting stack for nano-imprint lithography 有权
公开(公告)号：US09778562B2
公开(公告)日：2017-10-03
申请号：US12275998
申请日：2008-11-21
申请人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
IPC分类号： G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.

6. 发明申请

US20090140458A1 POROUS TEMPLATE AND IMPRINTING STACK FOR NANO-IMPRINT LITHOGRAPHY 有权
标题翻译：用于纳米印刷的多孔模板和印刷堆叠
公开(公告)号：US20090140458A1
公开(公告)日：2009-06-04
申请号：US12275998
申请日：2008-11-21
申请人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
IPC分类号： B28B11/08 , B32B3/26 , B05D3/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
摘要翻译：压印光刻模板或压印叠层包括限定平均孔径至少约0.4nm的多个孔的多孔材料。多孔材料的孔隙率至少约为10％。多孔模板，多孔印迹叠层或两者可用于压印光刻工艺，以便于将模板和压印叠层之间的气体扩散到模板，压印叠层或两者中，使得压印叠层之间的可聚合材料并且模板在压印堆栈和模板之间快速形成基本上连续的层。

7. 发明申请

US20140212534A1 Fabrication of High-Throughput Nano-Imprint Lithography Templates 审中-公开
标题翻译：高通量纳米压印光刻模板的制作
公开(公告)号：US20140212534A1
公开(公告)日：2014-07-31
申请号：US13754015
申请日：2013-01-30
申请人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
发明人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
IPC分类号： B29C59/02 , C23C16/40
CPC分类号： C23C16/401 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (ρporous/ρfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
摘要翻译：压印光刻模板包括限定平均孔径至少约0.4nm的多个孔的多孔材料。多孔材料包括硅和氧，并且杨氏模量（E）与多孔材料相对于熔融二氧化硅（“多孔/熔融二氧化硅”）的相对密度之比至少为约10:1。多孔材料的折射率在约1.4和1.5之间。多孔材料可以形成压印光刻模板的中间层或盖层。模板可以包括在多孔层和盖层之间的孔密封层，或者在盖层的顶部上的孔密封层。

8. 发明申请

US20110165412A1 ADHESION LAYERS IN NANOIMPRINT LITHOGRAHY 审中-公开
标题翻译： NANOIMPRINT LITHOGRAHY中的粘合层
公开(公告)号：US20110165412A1
公开(公告)日：2011-07-07
申请号：US12954376
申请日：2010-11-24
申请人： Zhengmao Ye , Frank Y. Xu , Dwayne L. LaBrake , Kosta S. Selinidis
发明人： Zhengmao Ye , Frank Y. Xu , Dwayne L. LaBrake , Kosta S. Selinidis
IPC分类号： B32B7/12 , B05D5/10 , B05D3/12
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/265
摘要： Forming an adhesive layer on a nanoimprint lithography template or a double-sided disk. Forming the adhesive layer on the double-sided disk includes immersing the double-sided disk in a liquid adhesive composition and removing the double-sided disk from the adhesive composition. The outer layer of the double-sided disk is a carbon overcoating or an intermediate layer. The adhesive composition is dried to form a first adhesion layer adhered directly to the carbon overcoating or intermediate layer on a first side of the disk and a second adhesion layer adhered directly to the carbon overcoating or intermediate layer on a second side of the disk. Forming the adhesive layer on the nanoimprint lithography template includes applying an adhesive material to the template, allowing the template to remain motionless, and rinsing a portion of the adhesive material from the template with a solvent, and drying the template.
摘要翻译：在纳米压印光刻模板或双面盘上形成粘合剂层。在双面盘上形成粘合剂层包括将双面盘浸入液体粘合剂组合物中并从粘合剂组合物中除去双面盘。双面盘的外层是碳外涂层或中间层。将粘合剂组合物干燥以形成直接附着在盘的第一侧上的碳外涂层或中间层的第一粘合层，以及直接粘附在盘的第二侧上的碳外涂层或中间层的第二粘附层。在纳米压印光刻模板上形成粘合剂层包括将粘合剂材料施加到模板上，允许模板保持静止，并用溶剂从模板中漂洗一部分粘合剂材料，并干燥模板。

9. 发明授权

US08968620B2 Safe separation for nano imprinting 有权
标题翻译：纳米压印安全分离
公开(公告)号：US08968620B2
公开(公告)日：2015-03-03
申请号：US13095514
申请日：2011-04-27
申请人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B29C45/76 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： B29C59/02 , B29C45/76 , B29L2007/001 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10S977/877
摘要： Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
摘要翻译：通过选择模板和/或衬底厚度（Tt和/或Tb），模板和/或衬底背压（Pt和/或Pb）的控制来控制模板和衬底之间的横向应变和横向应变比（dt / db））和/或材料刚度的选择。

10. 发明授权

US08652393B2 Strain and kinetics control during separation phase of imprint process 有权
标题翻译：压印过程分离阶段的应变和动力学控制
公开(公告)号：US08652393B2
公开(公告)日：2014-02-18
申请号：US12604517
申请日：2009-10-23
申请人： Niyaz Khusnatdinov , Frank Y. Xu , Mario Johannes Meissl , Michael N. Miller , Ecron D. Thompson , Gerard M. Schmid , Pawan Kumar Nimmakayala , Xiaoming Lu , Byung-Jin Choi
发明人： Niyaz Khusnatdinov , Frank Y. Xu , Mario Johannes Meissl , Michael N. Miller , Ecron D. Thompson , Gerard M. Schmid , Pawan Kumar Nimmakayala , Xiaoming Lu , Byung-Jin Choi
IPC分类号： B29C45/76
CPC分类号： B29C37/0003 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
摘要翻译：描述了在压印光刻工艺的分离过程期间改进鲁棒层分离的系统和方法。包括在待印刷的基底与模板之间匹配应变的方法，改变或改变在分离期间施加到模板和/或基底的力，或改变或改变分离过程的动力学。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式