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1. 发明申请

US20100216062A1 Reflective photomask and method of fabricating, reflective illumination system and method of process using the same 失效
标题翻译：反光光掩模及其制造方法，反光照明系统及其使用方法
公开(公告)号：US20100216062A1
公开(公告)日：2010-08-26
申请号：US12656668
申请日：2010-02-12
申请人： Dong-Gun Lee , Seong-Sue Kim , Hwan-Seok Seo , In-Sung Kim
发明人： Dong-Gun Lee , Seong-Sue Kim , Hwan-Seok Seo , In-Sung Kim
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/26
摘要： A reflective photomask includes a phase shift object on a substrate, a reflective layer stacked on the substrate and the phase shift object, a capping layer on the reflective layer, the capping layer including at least one surface portion having a bent shape, and a light absorption pattern on the capping layer, the light absorption pattern including at least one slit exposing the surface portion of the capping layer having the bent shape.
摘要翻译：反射光掩模包括在基板上的相移物体，层叠在基板上的反射层和相移物体，反射层上的覆盖层，封盖层包括至少一个具有弯曲形状的表面部分，以及光吸收图案包括使具有弯曲形状的覆盖层的表面部分露出的至少一个狭缝。

2. 发明授权

US08119309B2 Reflective photomask and method of fabricating, reflective illumination system and method of process using the same 失效
标题翻译：反光光掩模及其制造方法，反光照明系统及其使用方法
公开(公告)号：US08119309B2
公开(公告)日：2012-02-21
申请号：US12656668
申请日：2010-02-12
申请人： Dong-Gun Lee , Seong-Sue Kim , Hwan-Seok Seo , In-Sung Kim
发明人： Dong-Gun Lee , Seong-Sue Kim , Hwan-Seok Seo , In-Sung Kim
IPC分类号： G03F1/00 , G03F9/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/26
摘要： A reflective photomask includes a phase shift object on a substrate, a reflective layer stacked on the substrate and the phase shift object, a capping layer on the reflective layer, the capping layer including at least one surface portion having a bent shape, and a light absorption pattern on the capping layer, the light absorption pattern including at least one slit exposing the surface portion of the capping layer having the bent shape.
摘要翻译：反射光掩模包括在基板上的相移物体，层叠在基板上的反射层和相移物体，反射层上的覆盖层，封盖层包括至少一个具有弯曲形状的表面部分，以及光吸收图案包括使具有弯曲形状的覆盖层的表面部分露出的至少一个狭缝。

3. 发明授权

US08287792B2 Methods of forming fine patterns using a nanoimprint lithography 失效
标题翻译：使用纳米压印光刻形成精细图案的方法
公开(公告)号：US08287792B2
公开(公告)日：2012-10-16
申请号：US12657750
申请日：2010-01-27
申请人： Jeong-Hoon Lee , Jeong-Ho Yeo , Joo-On Park , In-Sung Kim , Doo-Hoon Goo , Jin-Hong Park , Chang-Min Park
发明人： Jeong-Hoon Lee , Jeong-Ho Yeo , Joo-On Park , In-Sung Kim , Doo-Hoon Goo , Jin-Hong Park , Chang-Min Park
IPC分类号： B29C59/00
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00
摘要： In a method of forming fine patterns, a photocurable coating layer is formed on a substrate. A first surface of a template makes contact with the photocurable coating layer. The first surface of the template includes at least two first patterns having a first dispersion degree of sizes, and at least one portion of the first surface of the template includes a photo attenuation member. A light is irradiated onto the photocurable coating layer through the template to form a cured coating layer including second patterns having a second dispersion degree of sizes. The second patterns are generated from the first patterns and the second dispersion degree is less than the first dispersion degree. The template is separate from the cured coating layer. A size dispersion degree of the patterns used in a nanoimprint lithography process may be adjusted by the light attenuation member, so that the fine patterns may be formed to have an improved size dispersion degree.
摘要翻译：在形成精细图案的方法中，在基板上形成光固化涂层。模板的第一表面与光固化涂层接触。模板的第一表面包括具有第一分散度大小的至少两个第一图案，并且模板的第一表面的至少一部分包括光衰减构件。通过模板将光照射到可光固化涂层上，以形成具有第二分散度尺寸的第二图案的固化涂层。从第一图案生成第二图案，第二色散度小于第一色散度。模板与固化涂层分开。可以通过光衰减部件调整在纳米压印光刻工艺中使用的图案的尺寸分散度，使得精细图案可以形成为具有改进的尺寸分散度。

4. 发明授权

US07635547B2 Stencil mask having main and auxiliary strut and method of forming the same 失效
标题翻译：具有主支柱和辅助支柱的模板掩模及其形成方法
公开(公告)号：US07635547B2
公开(公告)日：2009-12-22
申请号：US12114946
申请日：2008-05-05
申请人： In-Sung Kim , Ho-Chul Kim
发明人： In-Sung Kim , Ho-Chul Kim
IPC分类号： G03F9/00
CPC分类号： G03F1/20 , Y10S430/143
摘要： A stencil mask includes a membrane forming thin layer having membrane areas and a border area that limits the membrane areas. The membrane areas have a plurality of pattern areas which include an aperture through which particle beams can permeate and non-pattern areas interposed between the pattern areas. A main strut supports the membrane areas and is formed on the border area of the membrane forming thin layer. An auxiliary strut is formed in the non-pattern areas inside the membrane pattern area such that the auxiliary strut divides the membrane areas into plural divided membrane areas. The auxiliary strut supports the divided membrane areas.
摘要翻译：模板掩模包括具有膜区域的膜形成薄层和限制膜区域的边界区域。膜区域具有多个图案区域，其包括孔径，颗粒束可穿过该孔，并且插入在图案区域之间的非图案区域。主支柱支撑膜区域并形成在膜形成薄层的边界区域上。在膜图案区域内的非图案区域中形成辅助支柱，使得辅助支柱将膜区域分成多个分隔的膜区域。辅助支柱支撑分隔膜区域。

5. 发明申请

US20050003278A1 Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same 有权
标题翻译：用于形成二维重复的光刻胶图案的光掩模及其制造方法
公开(公告)号：US20050003278A1
公开(公告)日：2005-01-06
申请号：US10827556
申请日：2004-04-19
申请人： Chan Hwang , In-Sung Kim , Young-Seog Kang
发明人： Chan Hwang , In-Sung Kim , Young-Seog Kang
IPC分类号： H01L21/027 , G03C5/00 , G03F1/00 , G03F1/36 , G03F9/00
CPC分类号： G03F1/36
摘要： A photomask includes a transparent substrate, and a plurality of light-shielding patterns repeatedly aligned on the transparent substrate in two dimensions. Each of the light-shielding patterns has length and width measurements that differ from each other. Further, the photomask includes at least one through hole penetrating a portion of each of the light-shielding patterns to expose the transparent substrate.
摘要翻译：光掩模包括透明基板和在二维上在透明基板上重复对准的多个遮光图案。每个遮光图案具有彼此不同的长度和宽度测量值。此外，光掩模包括贯穿每个遮光图案的一部分的至少一个通孔，以露出透明基板。

6. 发明申请

US20090004718A1 Antioxidant Fermenting Microorganism Agent Reducing Volatile Organic Compounds From Polyurethane Foam, and Urethane Foam Comprising the Same 审中-公开
标题翻译：抗氧化发酵微生物减少聚氨酯泡沫的挥发性有机化合物和包含它的聚氨酯泡沫
公开(公告)号：US20090004718A1
公开(公告)日：2009-01-01
申请号：US12224154
申请日：2007-05-09
申请人： Taek Lim , Jae-Yong Ko , Eun-Ju Lee , In-Sung Kim , Chang-Hong Lee
发明人： Taek Lim , Jae-Yong Ko , Eun-Ju Lee , In-Sung Kim , Chang-Hong Lee
IPC分类号： C12N11/04 , C12N1/20
CPC分类号： C12N1/20 , C08G2101/00 , C08G2290/00 , C08L75/04 , C12N1/16 , C08L2666/28
摘要： Disclosed is an antioxidant fermenting microorganism agent and a polyurethane foam including the same. The antioxidant fermenting microorganism agent is used to generate a substance that is capable of reducing an amount of volatile organic compounds generated from the polyurethane foam and has an antimicrobial ability. The polyurethane foam containing the antioxidant fermenting microorganism according to the present invention can be used as the material for the interior of a vehicle to protect humans from noxious substances causing sick car syndrome.
摘要翻译：公开了一种抗氧化发酵微生物剂和包含其的聚氨酯泡沫体。抗氧化剂发酵微生物剂用于产生能够减少由聚氨酯泡沫体产生的挥发性有机化合物的量并具有抗菌能力的物质。含有根据本发明的抗氧化剂发酵微生物的聚氨酯泡沫体可以用作车辆内部的材料，以保护人类免受引起恶心综合征的有害物质的伤害。

7. 发明授权

US07384711B2 Stencil mask having main and auxiliary strut and method of forming the same 失效
标题翻译：具有主支柱和辅助支柱的模板掩模及其形成方法
公开(公告)号：US07384711B2
公开(公告)日：2008-06-10
申请号：US10827513
申请日：2004-04-19
申请人： In-Sung Kim , Ho-Chul Kim
发明人： In-Sung Kim , Ho-Chul Kim
IPC分类号： G03F9/00
CPC分类号： G03F1/20 , Y10S430/143
摘要： A stencil mask includes a membrane forming thin layer having membrane areas and a border area that limits the membrane areas. The membrane areas have a plurality of pattern areas which include an aperture through which particle beams can permeate and non-pattern areas interposed between the pattern areas. A main strut supports the membrane areas and is formed on the border area of the membrane forming thin layer. An auxiliary strut is formed in the non-pattern areas inside the membrane pattern area such that the auxiliary strut divides the membrane areas into plural divided membrane areas. The auxiliary strut supports the divided membrane areas.
摘要翻译：模板掩模包括具有膜区域的膜形成薄层和限制膜区域的边界区域。膜区域具有多个图案区域，其包括孔径，颗粒束可穿过该孔，并且插入在图案区域之间的非图案区域。主支柱支撑膜区域并形成在膜形成薄层的边界区域上。在膜图案区域内的非图案区域中形成辅助支柱，使得辅助支柱将膜区域分成多个分隔的膜区域。辅助支柱支撑分隔膜区域。

8. 发明授权

US08158958B2 Flare evaluation methods 有权
标题翻译：火炬评估方法
公开(公告)号：US08158958B2
公开(公告)日：2012-04-17
申请号：US12732960
申请日：2010-03-26
申请人： In-Sung Kim , Jooon Park , Doo-Hoo Goo , Jeong-Hoon Lee , Chang-Min Park
发明人： In-Sung Kim , Jooon Park , Doo-Hoo Goo , Jeong-Hoon Lee , Chang-Min Park
IPC分类号： G01T1/04
CPC分类号： G03F7/70941 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/44 , G03F1/70 , G03F7/70433
摘要： A flare evaluation method includes: extracting DC flare reference data using a preliminary measurement pattern mask and a dummy mask having an open region in which a preliminary measurement pattern is formed; providing a plurality of flare gauge sets including an opaque pad, a measurement pattern, and a flare pattern, the measure pattern being disposed at an inside of the opaque pad to measure strength of a flare, the flare pattern being disposed at an outside of the opaque pad to generate the flare; and detecting a change of a photo resist measurement pattern caused by the flare pattern and the measurement pattern for each of the flare gauge sets, wherein an outer radius of the flare pattern increases by a predetermined amount depending on the flare gauge set.
摘要翻译：闪光评估方法包括：使用初步测量图案掩模和具有形成初步测量图案的开放区域的虚拟掩模来提取DC闪光参考数据; 提供多个包括不透明衬垫，测量图案和耀斑图案的扩口仪，所述测量图案设置在所述不透明衬垫的内侧，以测量耀斑的强度，所述耀斑图案设置在所述不透明衬垫的外侧不透明垫产生耀斑; 并且检测由每个所述火炬仪的所述火炬图案和所述测量图案引起的光致抗蚀剂测量图案的变化，其中所述耀斑图案的外半径根据所述张力计集合而增加预定量。

9. 发明申请

US20110294074A1 EXPOSURE APPARATUS AND EXPOSING METHOD USING THE APPARATUS 审中-公开
标题翻译：曝光装置和使用装置的曝光方法
公开(公告)号：US20110294074A1
公开(公告)日：2011-12-01
申请号：US13149030
申请日：2011-05-31
申请人： Ji-Eun LEE , In-Sung Kim , Jeong-Ho Yeo , Chang-Min Park , Je-Bum Yoon
发明人： Ji-Eun LEE , In-Sung Kim , Jeong-Ho Yeo , Chang-Min Park , Je-Bum Yoon
IPC分类号： G03F7/20
CPC分类号： H01L21/76898 , G03F7/70391
摘要： An exposure apparatus and an exposing method using the apparatus. The exposure apparatus includes a photomask having a plurality of optical sources attached to a substrate.
摘要翻译：一种使用该装置的曝光装置和曝光方法。曝光装置包括具有附接到基板的多个光源的光掩模。

10. 发明申请

US20100258744A1 Flare Evaluation Methods 有权
标题翻译：火炬评估方法
公开(公告)号：US20100258744A1
公开(公告)日：2010-10-14
申请号：US12732960
申请日：2010-03-26
申请人： In-Sung Kim , Jooon Park , Doo-Hoo Goo , Jeong-Hoon Lee , Chang-Min Park
发明人： In-Sung Kim , Jooon Park , Doo-Hoo Goo , Jeong-Hoon Lee , Chang-Min Park
IPC分类号： G01T1/00
CPC分类号： G03F7/70941 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/44 , G03F1/70 , G03F7/70433
摘要： A flare evaluation method includes: extracting DC flare reference data using a preliminary measurement pattern mask and a dummy mask having an open region in which a preliminary measurement pattern is formed; providing a plurality of flare gauge sets including an opaque pad, a measurement pattern, and a flare pattern, the measure pattern being disposed at an inside of the opaque pad to measure strength of a flare, the flare pattern being disposed at an outside of the opaque pad to generate the flare; and detecting a change of a photo resist measurement pattern caused by the flare pattern and the measurement pattern for each of the flare gauge sets, wherein an outer radius of the flare pattern increases by a predetermined amount depending on the flare gauge set.
摘要翻译：闪光评估方法包括：使用初步测量图案掩模和具有形成初步测量图案的开放区域的虚拟掩模来提取DC闪光参考数据; 提供多个包括不透明衬垫，测量图案和耀斑图案的扩口仪，所述测量图案设置在所述不透明衬垫的内侧，以测量耀斑的强度，所述耀斑图案设置在所述不透明衬垫的外侧不透明垫产生耀斑; 并且检测由每个所述火炬仪的所述火炬图案和所述测量图案引起的光致抗蚀剂测量图案的变化，其中所述耀斑图案的外半径根据所述张力计集合而增加预定量。

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