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    • 9. 发明授权
    • Method of fabricating nanostructure array and device including nanostructure array
    • 制造纳米结构阵列的方法和包括纳米结构阵列的器件
    • US08758985B2
    • 2014-06-24
    • US13198892
    • 2011-08-05
    • Kyeong Seok LeeWon Mok KimIn Ho Kim
    • Kyeong Seok LeeWon Mok KimIn Ho Kim
    • G03F7/26
    • G03F7/2016G03F7/201
    • Provided are a method of fabricating a nanostructure array and a device including the nanostructure array. Nanoscale patterning is caused at an interface of a resist layer by light passed through a focusing layer. By such nanoscale patterning, a nanostructure array is fabricated on a substrate in various ways. As the focusing layer, an array of beads or lenses is used, and a pattern of the resist layer may include a nanoscale pore-opening and an undercut structure connected to a lower portion of the opening. The method facilitates adjustment of the size and shape of nanostructures and the interval between the nanostructures. Also, performance of the device including the nanostructure array can be improved. In particular, the method and device result in a sensor having improved sensitivity and reliability optimized for an environment and purpose to be used.
    • 提供制造纳米结构阵列的方法和包括纳米结构阵列的器件。 通过穿过聚焦层的光在抗蚀剂层的界面处引起纳米级图案化。 通过这种纳米尺度的图案化,以各种方式在衬底上制造纳米结构阵列。 作为聚焦层,使用珠或透镜的阵列,并且抗蚀剂层的图案可以包括连接到开口的下部的纳米级孔隙和底切结构。 该方法有助于调整纳米结构的尺寸和形状以及纳米结构之间的间隔。 此外,可以提高包括纳米结构阵列的器件的性能。 特别地,该方法和装置导致传感器具有针对要使用的环境和目的优化的改进的灵敏度和可靠性。