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1. 发明授权

US5621780A X-ray apparatus for applying a predetermined flux to an interior surface of a body cavity 失效
标题翻译：用于将预定流量施加到体腔内表面的X射线装置
公开(公告)号：US5621780A
公开(公告)日：1997-04-15
申请号：US507845
申请日：1995-07-27
申请人： Donald O. Smith , Alan P. Sliski , Kenneth J. Harte
发明人： Donald O. Smith , Alan P. Sliski , Kenneth J. Harte
IPC分类号： G21K5/02 , A61B1/00 , A61N5/10 , G01N23/083 , G21K5/00 , G21K5/04 , G21K5/10 , H01J35/08 , H01J35/30 , H01J35/32 , H05G1/06 , H05G1/10 , H05G1/32 , H05G1/34
CPC分类号： A61N5/1001 , G21K5/04 , H01J35/08 , H01J35/30 , H01J35/32 , H05G1/06 , H05G1/10 , H05G1/32 , H05G1/34 , A61N2005/1005 , H01J2201/342
摘要： The present invention is directed to an x-ray source for irradiating a surface defining a body cavity in accordance with a predetermined dose distribution. The source comprises a housing, an elongated tubular probe, a target assembly, and an inflatable balloon. The housing encloses an electron beam source and includes elements for generating an electron beam along a beam path. The tubular probe extends along a central axis from the housing about the beam path. The target assembly extends along the central axis and is coupled to the end of the probe distal from the housing. The target assembly includes a target element is positioned in the beam path. The target element is adapted to emit x-rays in response to electrons incident thereon from the beam. The probe tip assembly and associated control electronics include elements for positioning the target element in the beam path, and is substantially x-ray transparent. The balloon is affixed to the distal end of the probe and is inflatable so that when that probe end is inserted into a body cavity, the balloon may be inflated to stretch the cavity to a known shape. Positioning the probe tip inside the inflated balloon allows delivery of a uniform, or other desired, dose of radiation to the surface defining a body cavity.
摘要翻译：本发明涉及一种用于根据预定剂量分布照射限定体腔的表面的X射线源。源包括壳体，细长管状探针，靶组件和可充气球囊。壳体包围电子束源并且包括用于沿着光束路径产生电子束的元件。管状探针沿着中心轴线从壳体围绕光束路径延伸。目标组件沿着中心轴线延伸并且远离壳体耦合到探针的端部。目标组件包括目标元件位于光束路径中。目标元件适于响应于从光束入射到其上的电子而发射X射线。探针尖端组件和相关联的控制电子器件包括用于将目标元件定位在光束路径中的元件，并且基本上是x射线透明的。气囊固定在探头的远端，并且是可充气的，使得当该探针端插入体腔时，气囊可被充气以将空腔拉伸到已知形状。将探针尖端定位在充气球囊内部允许将均匀的或其它所需剂量的辐射传送到限定体腔的表面。

2. 发明授权

US5422926A X-ray source with shaped radiation pattern 失效
标题翻译：具有形状辐射图的X射线源
公开(公告)号：US5422926A
公开(公告)日：1995-06-06
申请号：US184271
申请日：1994-01-21
申请人： Donald O. Smith , Alan P. Sliski , Kenneth J. Harte , Mark T. Dinsmore
发明人： Donald O. Smith , Alan P. Sliski , Kenneth J. Harte , Mark T. Dinsmore
IPC分类号： A61B19/00 , A61N5/10 , H01B11/22 , H01J35/00 , H01J35/06 , H01J35/08 , H01J35/14 , H01J35/30 , H01J35/32 , H05G1/00 , H05G1/06 , H05G1/10 , H05G1/32 , H05G1/34
CPC分类号： A61N5/1001 , A61B90/11 , H01J35/065 , H01J35/08 , H01J35/30 , H01J35/32 , H05G1/06 , H05G1/10 , H05G1/32 , H05G1/34 , A61B2090/101 , A61N2005/1005 , H01J2201/342
摘要： The present invention is directed to an x-ray source for irradiating a volume in accordance with a predetermined dose distribution. The source comprises a housing, an elongated tubular probe, and a target assembly. The housing encloses an electron beam source and includes elements for generating an electron beam along a beam path. The tubular probe extends along a central axis from the housing about the beam path. The target assembly extends along the central axis and is adapted for coupling to the end of the probe distal from the housing. The target assembly includes a target element, a probe tip assembly, and a variable transmission shield. The target element is positioned in the beam path. The target element is adapted to emit x-rays in response to electrons incident thereon from the beam. The probe tip assembly and associated control electronics include elements for positioning the target element in the beam path, and is substantially x-ray transparent. The variable transmission shield is positioned on an outer surface of the probe tip assembly, and is adapted to control the position of the isodose surfaces of the x-rays emitted from the target and passing through the probe tip assembly.
摘要翻译：本发明涉及一种用于根据预定剂量分布照射体积的x射线源。源包括壳体，细长管状探针和目标组件。壳体包围电子束源并且包括用于沿着光束路径产生电子束的元件。管状探针沿着中心轴线从壳体围绕光束路径延伸。目标组件沿着中心轴线延伸并且适于联接到远离壳体的探针的端部。目标组件包括目标元件，探针尖端组件和可变透射屏蔽。目标元件位于光束路径中。目标元件适于响应于从光束入射到其上的电子而发射X射线。探针尖端组件和相关联的控制电子器件包括用于将目标元件定位在光束路径中的元件，并且基本上是x射线透明的。可变透射屏蔽定位在探针头组件的外表面上，并且适于控制从靶发射并穿过探针头组件的X射线的等剂量表面的位置。

3. 发明授权

US5566221A Apparatus for applying a predetermined x-radiation flux to an interior surface of a body cavity 失效
标题翻译：用于将预定的x-辐射通量施加到体腔的内表面的装置
公开(公告)号：US5566221A
公开(公告)日：1996-10-15
申请号：US273963
申请日：1994-07-12
申请人： Donald O. Smith , Alan P. Sliski , Kenneth J. Harte , Robert A. Roth
发明人： Donald O. Smith , Alan P. Sliski , Kenneth J. Harte , Robert A. Roth
IPC分类号： A61B17/22 , A61N5/10
CPC分类号： A61N5/1001 , A61N5/1014 , A61B2017/22068 , A61M2025/1047
摘要： The present invention is directed to a kit for delivering x-rays to the interior surface of a body cavity. The kit includes an x-ray source and an x-ray source guidance tube. The guidance tube includes an inflatable inelastic balloon disposed about and affixed at its distal end such that when inflated, the central axis of the balloon is coaxial with and is disposed about the central axis of the tubular element. Inflation and deflation of the balloon is controllable from the proximal end of the tubular element. The x-ray source may include an electron activated target for generating x-rays in response to electrons incident on the target. The x-ray source may also includes means for generating an electron beam and steering the beam so that it is incident on the target. The target end is slidably positionable within an interior channel of the source guidance tube.
摘要翻译：本发明涉及一种用于将X射线输送到体腔内表面的试剂盒。该套件包括一个x射线源和一个x射线源引导管。引导管包括可膨胀的非弹性球囊，其设置在其远端周围并固定在其远端，使得当膨胀时，球囊的中心轴线与管状元件的中心轴线同轴并且围绕管状元件的中心轴线设置。从管状元件的近端可以控制气囊的充气和放气。 X射线源可以包括用于响应于入射到靶上的电子而产生X射线的电子激活靶。 X射线源还可以包括用于产生电子束并转向光束以使其入射到靶上的装置。目标端可滑动地定位在源引导管的内部通道内。

4. 发明授权

US5452720A Method for treating brain tumors 失效
标题翻译：脑肿瘤治疗方法
公开(公告)号：US5452720A
公开(公告)日：1995-09-26
申请号：US104338
申请日：1993-08-09
申请人： Donald O. Smith , Alan P. Sliski , Kenneth J. Harte , Peter J. Biggs , John F. Beatty
发明人： Donald O. Smith , Alan P. Sliski , Kenneth J. Harte , Peter J. Biggs , John F. Beatty
IPC分类号： A61N5/10 , H01J35/08 , H01J35/30 , H01J35/32 , H05G1/06 , H05G1/10 , H05G1/32 , H05G1/34 , A61B6/12 , A61M36/00
CPC分类号： A61N5/1001 , H01J35/08 , H01J35/30 , H01J35/32 , H05G1/06 , H05G1/10 , H05G1/32 , H05G1/34 , A61N2005/1005 , H01J2201/342
摘要： A method of treating brain tumors in a patient, comprising the steps of: identifying and locating a brain tumor in vivo by affixing a stereotactic frame to the head of the patient, performing a computer tomographic (CT) scan of the skull of the patient to determine the location, size, and shape of the tumor with respect to the stereotactic frame, performing a biopsy by inserting an extraction tool along a path measured with respect to the frame to the tumor location, extracting a tissue from the location, removing the needle and the extracted tissue and analyzing the tissue; implanting at least a portion of an adjustable x-ray radiation source in the patient proximate the tumor, the adjustable radiation source including an electron beam source outside the head of the patient, and directing an electron beam produced by the source outside the head of the patient along the path to the location; and controlling the source to generate an x-ray radiation pattern characterized by a spatial and temporal distribution, to selectively irradiate the tumor.
摘要翻译：一种治疗患者脑肿瘤的方法，包括以下步骤：通过将立体定向框架固定在患者的头部来识别和定位脑肿瘤，对患者的头骨进行计算机断层扫描（CT）扫描确定相对于立体定向框架的肿瘤的位置，大小和形状，通过沿着相对于框架测量的路径将提取工具插入到肿瘤位置进行活检，从该位置提取组织，移除针和提取的组织并分析组织; 在靠近肿瘤的患者中植入至少一部分可调节X射线辐射源，所述可调节辐射源包括位于患者头部外部的电子束源，并且将源头产生的电子束引导到患者头部外部患者沿着路径到位置; 并且控制源以产生以空间和时间分布为特征的X射线辐射图，以选择性地照射肿瘤。

5. 发明授权

US5635709A Method and apparatus for measuring radiation dose distribution 失效
标题翻译：用于测量辐射剂量分布的方法和装置
公开(公告)号：US5635709A
公开(公告)日：1997-06-03
申请号：US542066
申请日：1995-10-12
申请人： Alan P. Sliski , Michael Dalterio , Donald O. Smith
发明人： Alan P. Sliski , Michael Dalterio , Donald O. Smith
IPC分类号： G01T7/00 , A61N5/10 , G01T1/169 , G01D18/00
CPC分类号： G01T1/169 , A61N5/1048
摘要： A phantom apparatus for measuring the radiation dose distribution produced by a brachytherapy device used to treat a localized area with radiation. The brachytherapy device includes an insertable probe capable of producing predefined radiation dose geometries about a predefined point. The phantom apparatus includes a tank containing a medium having a radiological equivalent characteristic of the localized area to be treated. The phantom apparatus also includes a radiation sensor for measuring the radiation dose and a positioning system for moving the probe with respect to the radiation sensor. The radiation sensor is also coupled to a positioning system to orient the sensor for optimal dose measurements. The phantom apparatus includes a control system that coordinates the movements of the probe and the radiation sensor to avoid a collision. The control system moves the probe along a predefined path around radiation sensor and records the dose at predefined points along the path. In order to reduce the settling time of the sensor, the path is selected to coincide with the isodose contours of the radiation dose distribution of the probe.
摘要翻译：用于测量由用于用辐射治疗局部区域的近距离放射治疗装置产生的辐射剂量分布的幻影装置。近程放射治疗装置包括能够产生关于预定义点的预定辐射剂量几何形状的可插入探针。幻影装置包括容纳具有待处理的局部区域的放射性等效特性的介质的罐。幻影装置还包括用于测量辐射剂量的辐射传感器和用于相对于辐射传感器移动探针的定位系统。辐射传感器还耦合到定位系统以使传感器定向以获得最佳剂量测量。幻影装置包括一个控制系统，用于协调探头和辐射传感器的运动以避免碰撞。控制系统沿着辐射传感器周围的预定路径移动探头，并将该剂量记录在沿路径的预定点处。为了减少传感器的建立时间，选择路径与探针的辐射剂量分布的等剂量轮廓一致。

6. 发明授权

US4467211A Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system 失效
标题翻译：用于在多站电子束阵列光刻（EBAL）系统的站之间互换地暴露多电平注册图案的方法和装置
公开(公告)号：US4467211A
公开(公告)日：1984-08-21
申请号：US496902
申请日：1983-05-23
申请人： Donald O. Smith , Kenneth J. Harte
发明人： Donald O. Smith , Kenneth J. Harte
IPC分类号： H01J37/304 , H01J37/317 , G03F9/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3177
摘要： An electron-beam array lithography (EBAL) system and method of operation is described. The method comprises deriving fiducial marking signals from a lenslet stitching grid of fiducial elements formed on a standard stitching target for calibrating the boundaries of the fields of view of the respective lens elements of an array of lenslets. The fiducial marking signals are used to stitch together the individual fields of view of the lens elements in the array of lenslets in order to cover a desired area of a workpiece surface to be subsequently exposed to the electron beam, for example, the surface of a semiconductor wafer upon which a plurality of integrated circuit chips are to be formed. In order to register the levels of multi-level patterns written on the same chip, each chip is provided with a registration fiducial grid comprised of fiducial marks at the corners and only at the corners of the chips. Computer mapping of the stitching calibration grid and the chip registration grid to a computer ideal mathematical grid standard is provided. This is achieved by measuring the x-y coordinate position of the fiducial marking elements after precisely locating the positions of their centers using an electron beam or light probe. From these measurements, deviations between the actual position of each marking element and its corresponding location on the computer ideal mathematical grid are determined, and such deviations are used to modify the deflection signals of the electron beam column to correct for deviations from the ideal mathematical grid.
摘要翻译：描述了电子束阵列光刻（EBAL）系统和操作方法。该方法包括从形成在标准缝合目标上的基准元件的小孔缝合网格导出基准标记信号，以校准透镜阵列的各个透镜元件的视场的边界。基准标记信号用于将透镜元件的各个视场拼接在小透镜阵列中，以覆盖随后暴露于电子束的工件表面的期望区域，例如，将要形成多个集成电路芯片的半导体晶片。为了注册写在同一芯片上的多级模式的级别，每个芯片都设有一个注册基准网格，它由角点上的基准标记组成，仅在芯片的角落处。提供了拼接校准网格和芯片配准网格计算机映射到计算机理想数学网格标准。这是通过使用电子束或光探测器精确地定位其中心的位置之后测量基准标记元件的x-y坐标位置来实现的。从这些测量中，确定每个标记元件的实际位置与其在计算机理想数学网格上的相应位置之间的偏差，并且使用这种偏差来修改电子束列的偏转信号以校正与理想数学网格的偏差。

7. 发明授权

US4430571A Method and apparatus for exposing multi-level registered patterns interchangeably between stations of a multi-station electron-beam array lithography (EBAL) system 失效
标题翻译：用于在多站电子束阵列光刻（EBAL）系统的站之间互换地暴露多电平注册图案的方法和装置
公开(公告)号：US4430571A
公开(公告)日：1984-02-07
申请号：US254870
申请日：1981-04-16
申请人： Donald O. Smith , Kenneth J. Harte
发明人： Donald O. Smith , Kenneth J. Harte
IPC分类号： H01L21/027 , H01J37/304 , H01J37/317 , H01J37/147
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3177
摘要： An electron-beam array lithography (EBAL) system and method of operation which employs an electron beam column of the array optics type having an array lens assembly, an array fine deflector assembly and a coarse deflector assembly, is described. The method and system derives fiducial marking signals from a lenslet stitching grid of fiducial elements, formed on a standard stitching target, for calibrating the boundaries of the fields of view of the respective elements of the array of lenslets. The fiducial marking signals are used to stitch together the individual fields of view of the elements in the array of lenslets. The same stitching calibration target, a precise copy, or similar precisely mapped target is used to calibrate all of the exposure stations of a multi-station EBAL system with the result that any level of multi-level registered patterns can be exposed in any of the so calibrated EBAL exposure stations.In the event of flawed lenslets in the array lens, the locations of those parts of the exposed area which were subject to the fields of view of flawed lenslets in the array lens assembly are mapped in a computer memory and this information is used to blank the electron beam during any period that the coarse deflector might be directing the beam to a flawed lenslet. The system and method physically permutes the position of target area to a new physical position subject to the field of view of a different working lenslet. Appropriate coarse and fine deflection signals are obtained, and the electron beam then is caused to retrace over the areas previously subject to the field of view of flawed lenslets in accordance with the master pattern specifications whereby increased yield from the EBAL system is obtained.
摘要翻译：描述了使用具有阵列透镜组件，阵列精细偏转器组件和粗偏转器组件的阵列光学类型的电子束列的电子束阵列光刻（EBAL）系统和操作方法。该方法和系统从形成在标准缝合目标上的基准元件的小孔缝合网格导出基准标记信号，用于校准小透镜阵列的各个元件的视场的边界。基准标记信号用于将透镜阵列中的元件的各个视场拼接在一起。使用相同的拼接校准目标，精确复制或类似的精确映射的目标来校准多站EBAL系统的所有曝光站，结果是可以将任何级别的多级注册模式暴露在任何所以校准了EBAL曝光站。在阵列透镜中的有缺陷的小透镜的情况下，在阵列透镜组件中受到有缺陷的小透镜的视场的曝光区域的这些部分的位置映射到计算机存储器中，并且该信息用于将电子束在任何时间段内，粗略的偏转器可能将光束引导到有缺陷的小透镜。系统和方法将目标区域的位置物理地置换为受不同工作小透镜的视场影响的新的物理位置。获得适当的粗细和偏转信号，然后使电子束根据主图模式规格回溯到先前受到有缺陷的小透镜的视野的区域上，从而获得来自EBAL系统的产量。

8. 发明授权

US5039862A Switched electron beam source employing a common photo-emitter cathode and method of operation 失效
标题翻译：采用普通光电发射极阴极的开关电子束源和操作方法
公开(公告)号：US5039862A
公开(公告)日：1991-08-13
申请号：US481496
申请日：1990-02-20
申请人： Donald O. Smith , Kenneth J. Harte
发明人： Donald O. Smith , Kenneth J. Harte
IPC分类号： H01J37/073 , H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/073 , H01J37/3174 , H01J2237/31779
摘要： A light switched electron beam source employing a common photo-emitter cathode and at least two light emitting sources of monochromatic light, such as laser diodes, light emitting diodes and the like. A light optical collimating and aperture sub-system transmits the light images from the two or more light emitting sources onto a prism or other optical element for diverting the path of the light images onto a common path. The common photo-emitting cathode is positioned in the common path for selective excitation by the respective light emitting sources. An electron optical subsystem is coupled to the output from the common photo-emitter cathode for collimating and further sharpening the electron beam pattern and for projecting it upon a target plane which may comprise an integrated circuit structure upon which patterns are to be written.
摘要翻译：使用公共光电发射极阴极和至少两个单色光发光源的光开关电子束源，例如激光二极管，发光二极管等。光学准直和孔径子系统将来自两个或更多个发光源的光图像传输到棱镜或其他光学元件上，用于将光图像的路径转移到公共路径上。公共光发射阴极位于公共路径中，用于通过各个发光源进行选择性激发。电子光学子系统耦合到来自共同的光 - 发射极阴极的输出，用于准直和进一步锐化电子束图案并将其投影到目标平面上，目标平面可包括要在其上写入图案的集成电路结构。

9. 发明授权

US4390789A Electron beam array lithography system employing multiple parallel array optics channels and method of operation 失效
公开(公告)号：US4390789A
公开(公告)日：1983-06-28
申请号：US266074
申请日：1981-05-21
申请人： Donald O. Smith , Kenneth J. Harte
发明人： Donald O. Smith , Kenneth J. Harte
IPC分类号： H01L21/027 , H01J37/30 , H01J37/317 , H01J37/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3177
摘要： A multi-channel EBAL apparatus and method of operation employing a plurality of parallel operated electron beam channels with each electron beam channel being of the fly's eye array optics type having an electron gun for producing an electron beam, an array lenslet assembly and an associated fine deflector assembly together with a coarse deflector for selectively directing the electron beam to a desired array lenslet within the array lenslet assembly. The associated fine deflector element thereafter directs the electron beam to a desired point on a target surface such as a target semiconductor wafer being processed by electron beam lithography. A common movable stage is provided for supporting the target wafer surfaces below the plurality of parallel operated electron beam channels and for moving the target surfaces in common relative to the array optics axes of all of the electron beam channels. Common movement of all of the target surfaces is achieved automatically in preprogrammed manner preferably along either axis of an x-y translation mechanism. All of the electron beam channels are supported within a common housing which is evacuated along with the movable target platform which serves to move the target surfaces in common. The apparatus can be employed in conjunction with a pattern registration grid mapped with the aid of a lenslet stitching calibration grid and which provides fiducial marking signals for identifying the boundaries of the field of view of the respective lenslets in each electron beam channel as well as the field of view of all of the electron beam channels and for stitching together the required number of the fields of view to thereby cover a desired area of a target surface. Provision is made for accommodating the occurance of any flawed lenslet assemblies by permuting the target surface so as to place any portion of a target surface that had been subject to a flawed lenslet under the view of an unflawed lenslet for subsequent electron beam treatment. Increased production capacity can be obtained by connecting a plurality of such EBAL apparatuses in parallel and controlling them in common by an overall system executive computer.

10. 发明授权

US4122530A Data management method and system for random access electron beam memory 失效
标题翻译：随机存取电子束存储器的数据管理方法和系统
公开(公告)号：US4122530A
公开(公告)日：1978-10-24
申请号：US689831
申请日：1976-05-25
申请人： Donald O. Smith , Kenneth J. Harte , Hollister B. Sykes
发明人： Donald O. Smith , Kenneth J. Harte , Hollister B. Sykes
IPC分类号： G11B9/10 , G11C11/23 , G06F13/06 , G06F9/10 , G11C7/00
CPC分类号： G11C11/23 , G11B9/10
摘要： A data recording and readback subsystem for digital computer systems employing random access electron beam memories having an electron beam write/read apparatus for recording data to be stored on a recording member that is subject to fatigue in the eventuality of excessive write/read storage operations at any given physical location on the recording member. The improved method and apparatus for data management comprising systematically permuting the physical location of data stored on the recording member, recording each permutation of the data, deriving signals representative of the number of permutation operations, and combining programmer initiated requests from the computer system central processing unit for data stored in the electron beam memory with the signals representative of the number of permutations to derive an actual physical address signal for application to the electron beam memory for recovery of the requested data.
摘要翻译：一种用于数字计算机系统的数据记录和回读子系统，其采用具有电子束写入/读取装置的随机存取电子束存储器，用于记录要存储在记录部件上的数据，该记录部件在可能存在过度写/读存储操作的情况下经受疲劳录音成员上任何给定的物理位置。用于数据管理的改进方法和装置包括系统地置换存储在记录构件上的数据的物理位置，记录数据的每个置换，导出表示置换操作次数的信号，以及将来自计算机系统中央处理的程序员发起的请求存储在电子束存储器中的数据的单元，其具有表示排列数量的信号，以导出用于应用于电子束存储器的实际物理地址信号，用于恢复所请求的数据。

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