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1. 发明授权

US08809192B2 Method for deposition of at least one electrically conducting film on a substrate 有权
标题翻译：在基板上沉积至少一个导电膜的方法
公开(公告)号：US08809192B2
公开(公告)日：2014-08-19
申请号：US13143940
申请日：2010-01-11
申请人： Dietrich Bertram , Jochen Hugo Stollenwerk , Johannes Krijne , Holger Schwab , Edward Willem Albert Young , Jeroen Henri Antoine Maria Van Buul , Andres Gasser , Konrad Wissenbach , Christian Vedder , Norbert Pirch
发明人： Dietrich Bertram , Jochen Hugo Stollenwerk , Johannes Krijne , Holger Schwab , Edward Willem Albert Young , Jeroen Henri Antoine Maria Van Buul , Andres Gasser , Konrad Wissenbach , Christian Vedder , Norbert Pirch
IPC分类号： H01L21/443
CPC分类号： H01L51/0021 , H01L51/0009 , H05K3/101 , H05K3/3468 , H05K2203/107
摘要： A method for deposition of at least one electrically conducting film on a substrate, wherein the method includes the steps of: selecting a layer of a film material, wherein the layer includes a mask on a front side, and wherein the layer and the mask are one piece; positioning the front side of the layer upon the substrate; applying at least one laser pulse onto a back side of the layer, so as to melt and to vaporize at least parts of the layer such that melt droplets are propelled toward and deposited upon the substrate; and forming the film, wherein at least one slot of the mask limits the distribution of the melt droplets.
摘要翻译：一种用于在基板上沉积至少一个导电膜的方法，其中所述方法包括以下步骤：选择膜材料层，其中所述层包括正面上的掩模，并且其中所述层和掩模是一块; 将层的前侧定位在基底上; 将至少一个激光脉冲施加到该层的背面上，以便使该层的至少部分熔化和蒸发，使得熔体液滴朝向和沉积在该基底上; 并且形成所述膜，其中所述掩模的至少一个狭槽限制所述熔体液滴的分布。

2. 发明申请

US20110318924A1 METHOD FOR DEPOSITION OF AT LEAST ONE ELECTRICALLY CONDUCTING FILM ON A SUBSTRATE 有权
标题翻译：在基板上沉积至少一个电导膜的方法
公开(公告)号：US20110318924A1
公开(公告)日：2011-12-29
申请号：US13143940
申请日：2010-01-11
申请人： Dietrich Bertram , Jochen Stollenwerk , Johannes Krijne , Holger Schwab , Edward W. A. Young , Jeroen H. A. M. Van Buul , Andres Gasser , Konrad Wissenbach , Christian Vedder , Norbert Pirch
发明人： Dietrich Bertram , Jochen Stollenwerk , Johannes Krijne , Holger Schwab , Edward W. A. Young , Jeroen H. A. M. Van Buul , Andres Gasser , Konrad Wissenbach , Christian Vedder , Norbert Pirch
IPC分类号： H01L21/3205
CPC分类号： H01L51/0021 , H01L51/0009 , H05K3/101 , H05K3/3468 , H05K2203/107
摘要： The invention relates to a method for deposition of at least one electrically conducting film (20) on a substrate (30), comprising the steps: selecting a layer (10) of a film material, wherein the layer (10) comprises a mask (40) on a front side (11) and wherein the layer (10) and the mask (40) are one piece, positioning the front side (11) of the layer (10) upon the substrate (30), applying at least one laser pulse (120) onto a back side (12) of the layer (10), so as to melt and to vaporize at least parts of the layer (10) such that melt droplets (110) are propelled toward and deposited upon said substrate (30), forming the film (20), wherein at least one slot (45) of the mask (40) limits the distribution of said melt droplets (110).
摘要翻译：本发明涉及一种在衬底（30）上沉积至少一个导电膜（20）的方法，包括以下步骤：选择膜材料层（10），其中所述层（10）包括掩模（ 40）在前侧（11）上，并且其中所述层（10）和所述掩模（40）是一体的，将所述层（10）的前侧（11）定位在所述基底（30）上，施加至少一个激光脉冲（120）到所述层（10）的背面（12）上，以便熔化并蒸发所述层（10）的至少一部分，使得熔体液滴（110）朝向并沉积在所述衬底上（30），形成所述膜（20），其中所述掩模（40）的至少一个狭槽（45）限制所述熔体液滴（110）的分布。

3. 发明授权

US08395177B2 Package for protecting a device from ambient substances 有权
标题翻译：用于保护设备免受环境物质的包装
公开(公告)号：US08395177B2
公开(公告)日：2013-03-12
申请号：US12518900
申请日：2007-12-12
申请人： Edward Willem Albert Young , Johannes Krijne
发明人： Edward Willem Albert Young , Johannes Krijne
IPC分类号： H01L33/00
CPC分类号： H05B33/04 , B32B27/00 , H01L51/5237 , H01L51/524
摘要： A package (1; 20) for protecting a device (2; 21) from ambient substances, the package comprising an enclosure surrounding the device (2; 21). The enclosure includes a multi-layer barrier (7; 24) and an internal substance binding member (14; 27) which is provided inside the enclosure to bind at least one of said ambient substances having penetrated the enclosure. The package (1; 20) further comprises an intermediate substance binding member (14; 29) which is provided between an inner (11a-b; 25) and an outer (16a-b; 28) barrier layer of the multi-layer barrier (7; 24) to bind a fraction of the substance having penetrated the outer barrier layer (16a-b; 28).
摘要翻译：一种用于保护设备（2; 21）免受环境物质的包装（1; 20），所述包装件包括围绕所述装置（2; 21）的外壳。所述外壳包括多层隔离物（7; 24）和内部物质结合构件（14; 27），所述内部物质接合构件（14; 27）设置在所述外壳内部以结合穿过所述外壳的至少一种所述环境物质。所述包装（1; 20）还包括中间物质结合件（14; 29），其设置在所述多层屏障的内部（11a-b; 25）和外部（16a-b; 28）阻挡层之间（7; 24）以结合穿过外阻挡层（16a-b; 28）的物质的一部分。

4. 发明授权

US08179036B2 Light emitting device with a shunt 有权
标题翻译：具有分流器的发光器件
公开(公告)号：US08179036B2
公开(公告)日：2012-05-15
申请号：US12523167
申请日：2008-01-17
申请人： Juergen Eser , Edward Willem Albert Young , Johannes Krijne , Arie Van Der Van Der Padt
发明人： Juergen Eser , Edward Willem Albert Young , Johannes Krijne , Arie Van Der Van Der Padt
IPC分类号： H01L51/00
CPC分类号： H01L51/5212 , H01L51/5228 , H01L2251/5361
摘要： A light emitting device includes a stack of layers having a basic layer, a first electrode layer and a second electrode layer. An organic light-emitting layer is sandwiched between the first and second electrode layers. At least one shunt element has a connection-end and a free-end. The connection-end is connected with one of the electrode layers, and the free-end is jutting out of the stack of layers.
摘要翻译：发光器件包括具有碱性层的层叠层，第一电极层和第二电极层。有机发光层被夹在第一和第二电极层之间。至少一个分流元件具有连接端和自由端。连接端与电极层之一连接，自由端从层叠层突出。

5. 发明申请

US20100025723A1 PACKAGE FOR PROTECTING A DEVICE FROM AMBIENT SUBSTANCES 有权
标题翻译：用于从环境物质保护设备的包装
公开(公告)号：US20100025723A1
公开(公告)日：2010-02-04
申请号：US12518900
申请日：2007-12-12
申请人： Edward Willem Albert Young , Johannes Krijne
发明人： Edward Willem Albert Young , Johannes Krijne
IPC分类号： H01L33/00 , H01L23/48 , H01L23/02
CPC分类号： H05B33/04 , B32B27/00 , H01L51/5237 , H01L51/524
摘要： A package (1; 20) for protecting a device (2; 21) from ambient substances, the package comprising an enclosure surrounding the device (2; 21). The enclosure includes a multi-layer barrier (7; 24) and an internal substance binding member (14; 27) which is provided inside the enclosure to bind at least one of said ambient substances having penetrated the enclosure. The package (1; 20) further comprises an intermediate substance binding member (14; 29) which is provided between an inner (11a-b; 25) and an outer (16a-b; 28) barrier layer of the multi-layer barrier (7; 24) to bind a fraction of the substance having penetrated the outer barrier layer (16a-b; 28).
摘要翻译：一种用于保护设备（2; 21）免受环境物质的包装（1; 20），所述包装件包括围绕所述装置（2; 21）的外壳。所述外壳包括多层隔离物（7; 24）和内部物质结合构件（14; 27），所述内部物质接合构件（14; 27）设置在所述外壳内部以结合穿过所述外壳的至少一种所述环境物质。所述包装件（1; 20）还包括中间物质装订构件（14; 29），其设置在所述多层屏障的内部（11a-b; 25）和外部（16a-b; 28）阻挡层之间（7; 24）以结合穿过外阻挡层（16a-b; 28）的物质的一部分。

6. 发明申请

US20100109513A1 LIGHT EMITTING DEVICE 有权
标题翻译：发光装置
公开(公告)号：US20100109513A1
公开(公告)日：2010-05-06
申请号：US12523167
申请日：2008-01-17
申请人： Juergen Eser , Edward Willem Albert Young , Johannes Krijne , Arie Van Der Van Der Padt
发明人： Juergen Eser , Edward Willem Albert Young , Johannes Krijne , Arie Van Der Van Der Padt
IPC分类号： H01J1/62
CPC分类号： H01L51/5212 , H01L51/5228 , H01L2251/5361
摘要： The invention relates to a light emitting device (10), comprising a stack of layers (15) comprising a basic layer (20), a first electrode layer (30) and a second electrode layer (40), wherein an organic light-emitting layer (50) is sandwiched between the first (30) and the second electrode layer (40), with at least one shunt element (60,60′), comprising a connection-end (65) and a free-end (66), wherein the connection-end (65) is connected with one of the electrode layers (30,40), and wherein the free-end (66) is jutting out of the stack of layers (15). The invention further relates to a method to manufacture such a device.
摘要翻译：本发明涉及一种发光器件（10），它包括一层包括一个基本层（20），一个第一电极层（30）和一个第二电极层（40）的层（15），其中有机发光层（50）夹在第一（30）和第二电极层（40）之间，其中至少一个分流元件（60,60'）包括连接端（65）和自由端（66），其中所述连接端（65）与所述电极层（30,40）中的一个连接，并且其中所述自由端（66）从所述层叠层（15）突出。本发明还涉及制造这种装置的方法。

7. 发明授权

US09064740B2 Measurement device and method for vapour deposition applications 有权
标题翻译：气相沉积应用的测量装置和方法
公开(公告)号：US09064740B2
公开(公告)日：2015-06-23
申请号：US14112571
申请日：2012-04-16
申请人： Johannes Krijne , Jürgen Eser
发明人： Johannes Krijne , Jürgen Eser
IPC分类号： H01L21/00 , H01L21/66 , C23C14/54 , C23C14/56 , G01B11/06 , H01L51/00
CPC分类号： H01L22/12 , C23C14/12 , C23C14/24 , C23C14/543 , C23C14/545 , C23C14/546 , C23C14/547 , C23C14/56 , C23C14/562 , C23C16/45565 , G01B11/0625 , G01B11/0641 , H01L22/26 , H01L51/001 , H01L2924/0002 , H01L2924/00
摘要： In vapor deposition applications, especially OLED mass production, where it is necessary to measure and/or control the deposition rate of evaporation sources within specific tolerances, a measurement system is adapted to use robust and accurate optical thickness measurement methods at high and low rate sources, so that the thickness of a layer deposited on a substrate can be measured and controlled. A first evaporation source (11) deposits a layer of material on a substrate (20). A mobile element (41) is provided, On which a film is deposited from a second evaporation source (12b) in a deposition location (D1). Subsequently the mobile element is conveyed to a measurement location (D2) where the thickness of the film is measured by a thickness detector (45). The measurement apparatus is arranged to control the deposition of the first evaporation source in dependence on the thickness of the film deposited on the mobile element.
摘要翻译：在气相沉积应用中，特别是OLED大规模生产中，需要在特定公差范围内测量和/或控制蒸发源的沉积速率，测量系统适用于在高和低速率源下使用鲁棒且准确的光学厚度测量方法，从而可以测量和控制沉积在基底上的层的厚度。第一蒸发源（11）将一层材料沉积在基底（20）上。提供了一种移动元件（41），其中在沉积位置（D1）中从第二蒸发源（12b）沉积膜。随后，移动元件被传送到测量位置（D2），其中膜的厚度由厚度检测器（45）测量。测量装置被布置成根据沉积在移动元件上的膜的厚度来控制第一蒸发源的沉积。

8. 发明申请

US20120178190A1 Arrangement for Holding a Substrate in a Material Deposition Apparatus 有权
标题翻译：用于在材料沉积装置中保持基板的布置
公开(公告)号：US20120178190A1
公开(公告)日：2012-07-12
申请号：US13262776
申请日：2010-03-29
申请人： Johannes Krijne , Erwin Eiling , Karl-Heinz Hohaus , Wolfgang Goergen , Andreas Lovich , Marc Philippens , Richard Scheicher , Ansgar Fischer , Martin Mueller
发明人： Johannes Krijne , Erwin Eiling , Karl-Heinz Hohaus , Wolfgang Goergen , Andreas Lovich , Marc Philippens , Richard Scheicher , Ansgar Fischer , Martin Mueller
IPC分类号： H01L51/56 , B05D3/12 , B05C13/02
CPC分类号： C23C14/042 , C23C14/50
摘要： An arrangement (1) for holding a substrate (10) in a material deposition apparatus, which substrate (10) has a deposition side (10a) upon which material (M) is to be deposited, and which arrangement (1) comprises: a shadow mask (20) comprising a number of deposition openings (Di); a support structure (30) comprising a number of surround openings (Si); and a support structure holding means (6) for holding the support mask (30) and/or a substrate holding means (5) for holding the substrate (10), such that the support structure (30) is on the same side as the deposition side (10a) of the substrate (10), and the shadow mask (20) is positioned between the substrate (10) and the support structure (30) such that at least one deposition opening (Di) of the shadow mask (10) lies within a corresponding surround opening (Si) of the support structure (30).
摘要翻译：一种用于将材料（10）保持在材料沉积装置中的装置（1），所述衬底（10）具有要沉积材料（M）的沉积侧（10a），并且所述装置（1）包括：包括多个沉积开口（Di）的荫罩（20）; 包括多个环绕开口（Si）的支撑结构（30）; 以及用于保持支撑掩模（30）的支撑结构保持装置（6）和/或用于保持基板（10）的基板保持装置（5），使得支撑结构（30）位于与所述基板（10）的沉积侧（10a）和所述荫罩（20）位于所述基板（10）和所述支撑结构（30）之间，使得所述荫罩（10）的至少一个沉积开口（Di））位于支撑结构（30）的相应环绕开口（Si）内。

9. 发明申请

US20140186974A1 MEASUREMENT DEVICE AND METHOD FOR VAPOUR DEPOSITION APPLICATIONS 有权
标题翻译：用于蒸发沉积应用的测量装置和方法
公开(公告)号：US20140186974A1
公开(公告)日：2014-07-03
申请号：US14112571
申请日：2012-04-16
申请人： Johannes Krijne , Jürgen Eser
发明人： Johannes Krijne , Jürgen Eser
IPC分类号： H01L21/66 , G01B11/06
CPC分类号： H01L22/12 , C23C14/12 , C23C14/24 , C23C14/543 , C23C14/545 , C23C14/546 , C23C14/547 , C23C14/56 , C23C14/562 , C23C16/45565 , G01B11/0625 , G01B11/0641 , H01L22/26 , H01L51/001 , H01L2924/0002 , H01L2924/00
摘要： In vapour deposition applications, especially OLED mass production, where it is necessary to measure and/or control the deposition rate of evaporation sources within specific tolerances, a measurement system is adapted to use robust and accurate optical thickness measurement methods at high and low rate sources, so that the thickness of a layer deposited on a substrate can be measured and controlled. A first evaporation source (11) deposits a layer of material on a substrate (20). A mobile element (41) is provided, On which a film is deposited from a second evaporation source (12b) in a deposition location (D1). Subsequently the mobile element is conveyed to a measurement location (D2) where the thickness of the film is measured by a thickness detector (45). The measurement apparatus is arranged to control the deposition of the first evaporation source in dependence on the thickness of the film deposited on the mobile element.
摘要翻译：在气相沉积应用中，特别是OLED大规模生产中，需要在特定公差范围内测量和/或控制蒸发源的沉积速率，测量系统适用于在高和低速率源下使用鲁棒且精确的光学厚度测量方法，从而可以测量和控制沉积在基底上的层的厚度。第一蒸发源（11）将一层材料沉积在基底（20）上。提供了一种移动元件（41），其中在沉积位置（D1）中从第二蒸发源（12b）沉积膜。随后，移动元件被传送到测量位置（D2），其中膜的厚度由厚度检测器（45）测量。测量装置被布置成根据沉积在移动元件上的膜的厚度来控制第一蒸发源的沉积。

10. 发明授权

US08657889B2 Arrangement for holding a substrate in a material deposition apparatus 有权
公开(公告)号：US08657889B2
公开(公告)日：2014-02-25
申请号：US13262776
申请日：2010-03-29
申请人： Johannes Krijne , Erwin Eiling , Karl-Heinz Hohaus , Wolfgang Goergen , Andreas Lovich , Marc Philippens , Richard Scheicher , Ansgar Fischer , Martin Mueller
发明人： Johannes Krijne , Erwin Eiling , Karl-Heinz Hohaus , Wolfgang Goergen , Andreas Lovich , Marc Philippens , Richard Scheicher , Ansgar Fischer , Martin Mueller
IPC分类号： H01L51/40
摘要： An arrangement (1) for holding a substrate (10) in a material deposition apparatus, which substrate (10) has a deposition side (10a) upon which material (M) is to be deposited, and which arrangement (1) comprises: a shadow mask (20) comprising a number of deposition openings (Di); a support structure (30) comprising a number of surround openings (Si); and a support structure holding means (6) for holding the support mask (30) and/or a substrate holding means (5) for holding the substrate (10), such that the support structure (30) is on the same side as the deposition side (10a) of the substrate (10), and the shadow mask (20) is positioned between the substrate (10) and the support structure (30) such that at least one deposition opening (Di) of the shadow mask (10) lies within a corresponding surround opening (Si) of the support structure (30).

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