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    • 2. 发明专利
    • Posttreatment agent for etching treatment with chromic acid-sulfuric acid mixed liquid
    • 用色氨酸 - 硫酸混合液进行蚀刻处理的处理剂
    • JP2007126745A
    • 2007-05-24
    • JP2006247671
    • 2006-09-13
    • Okuno Chem Ind Co Ltd奥野製薬工業株式会社
    • SATO KAZUYAIMAMURA MAKOTOOTSUKA KUNIAKIKITA KOJI
    • C23C18/24C23C18/40
    • PROBLEM TO BE SOLVED: To provide a new treatment agent, in a plating treatment method including an etching stage with a chromic acid-sulfuric acid mixed liquid, which has a stable neutralization action to the chromic acid comprised in the etching treatment liquid, and also can exhibit excellent catalyst sticking capacity to various resin moldings.
      SOLUTION: The posttreatment agent for etching treatment with a chromium acid-sulfuric acid mixed liquid is composed of an aqueous solution comprising an amine compound. In the plating method to a resin molding, a resin molding is subjected to etching treatment using a chromic acid-sulfuric acid mixed liquid, thereafter, the resin molding is brought into contact with the above posttreatment agent, subsequently, catalyst application and electroless plating are performed, and further, electroplating is performed as necessary.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了提供新的处理剂,在包括对铬酸 - 硫酸混合液的蚀刻阶段的电镀处理方法中,其对腐蚀处理液中包含的铬酸具有稳定的中和作用 ,并且还可以对各种树脂模制品显示出优异的催化剂粘附能力。 解决方案:用铬酸 - 硫酸混合液进行蚀刻处理的后处理剂由含有胺化合物的水溶液构成。 在树脂成形体的电镀法中,使用铬酸 - 硫酸混合液对树脂成型体进行蚀刻处理,然后使树脂成型体与上述后处理剂接触,接着,催化剂涂布和无电镀 并进一步根据需要进行电镀。 版权所有(C)2007,JPO&INPIT
    • 9. 发明专利
    • Pretreatment method for plating to styrene-based resin molded body
    • 用于固化苯乙烯树脂模制体的预处理方法
    • JP2007100174A
    • 2007-04-19
    • JP2005292368
    • 2005-10-05
    • Okuno Chem Ind Co Ltd奥野製薬工業株式会社
    • OTSUKA KUNIAKIMAEDA TAKEAKI
    • C23C18/22C23C18/24C25D5/56
    • PROBLEM TO BE SOLVED: To provide a new pretreatment method for plating where a plating film having high adhesion to a resin molded body composed of a polystyrene-based resin or a polystyrene-based alloy resin can be formed, and further, a permanganate water solution used as an etching treatment solution can be continuously used stably over a long period.
      SOLUTION: The pretreatment method for plating to a resin molded body composed of a polystyrene-based resin or a polystyrene-based alloy resin as a resin component comprises the following stages (1) to (3): the stage (1) where a water-dispersed solution or a water solution comprising a specified organic compound is brought into contact with the resin molded body; the stage (2) where the resin molded body treated in the stage (1) is brought into contact with a water solution comprising a permanganate; and the stage (3) where the resin molded body treated in the stage (2) is brought into contact with a water solution comprising at least one kind of component selected from the group consisting of acids, perchlorates and peroxo acid salts.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:为了提供一种新的电镀预处理方法,其中可以形成对由聚苯乙烯类树脂或聚苯乙烯基合金树脂构成的树脂成形体具有高粘附性的镀膜,而且, 作为蚀刻处理液使用的高锰酸盐水溶液能够长时间稳定地连续使用。 解决方案:将由聚苯乙烯类树脂或聚苯乙烯类合金树脂构成的树脂成型体作为树脂成分的电镀前处理方法包括以下(1)〜(3)工序:(1) 其中包含特定有机化合物的水分散溶液或水溶液与树脂成型体接触; 在阶段(1)中处理的树脂成型体与包含高锰酸盐的水溶液接触的阶段(2) 和在阶段(2)中处理的树脂成型体与包含选自酸,高氯酸盐和过氧酸盐中的至少一种成分的水溶液接触的阶段(3)。 版权所有(C)2007,JPO&INPIT
    • 10. 发明专利
    • Two-pack electroless silver plating solution
    • 双包电镀银镀层解决方案
    • JP2006016659A
    • 2006-01-19
    • JP2004195145
    • 2004-07-01
    • Okuno Chem Ind Co LtdToyoda Gosei Co Ltd奥野製薬工業株式会社豊田合成株式会社
    • OTSUKA KUNIAKIMAEDA TAKEAKIMARUOKA YOSUKEOGISU YASUHIKOWATARAI HIROSHI
    • C23C18/44
    • PROBLEM TO BE SOLVED: To provide a two-pack electroless silver plating solution which is capable of forming a silver film excellent in gloss and free from discoloration or irregularity, and favorable for spray coating or the like.
      SOLUTION: The two-pack electroless silver plating solution consists of two solution, i.e., (i) a silver-containing aqueous solution containing silver compound and ammonium and (ii) a reducing aqueous solution containing reducing agent. In addition, ethylene amines expressed by a general formula : R
      1 R
      2 N(CH
      2 CH
      2 NR
      3 )
      n R
      4 (where, R
      1 , R
      2 , R
      3 and R
      4 are the same or different and each hydrogen atom, alkyl group, alkoxy group or epoxy group; and n denotes integer of 1 to 4) are contained in either or both of the silver-containing aqueous solution and the reducing agent containing aqueous solution.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种双组分无电镀银溶液,其能够形成光泽优异且无变色或不规则性并且有利于喷涂等的银膜。 解决方案:双组分无电镀银溶液由两种溶液组成,即(i)含有银化合物和铵的含银水溶液和(ii)含还原剂的还原水溶液。 另外,由以下通式表示的亚乙基胺:R SP 1,R SP 2,N,CH 2, 3 R 4 (其中,R 1 ,R 2 ,R R 3和R 4相同或不同,各氢原子,烷基,烷氧基或环氧基,n表示1〜4的整数) 或含有银的水溶液和还原剂水溶液两者。 版权所有(C)2006,JPO&NCIPI