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    • 4. 发明专利
    • Laser welding method
    • 激光焊接方法
    • JP2009226420A
    • 2009-10-08
    • JP2008072630
    • 2008-03-20
    • Denso Corp株式会社デンソー
    • TAKENAKA MASAYUKIIMADA SHINJIKASUGAI HIROSHI
    • B23K26/20B23K26/32B23K103/12B23K103/16B23K103/18
    • PROBLEM TO BE SOLVED: To provide a laser welding method for joining first and second metal members by superposing the first metal member on the second metal member and irradiating laser beam to the surface side of the first member, enabling welding with low laser energy, and being suitable for suppressing explosion or sputtering of a planting layer formed on the first member by the heat of the laser beam. SOLUTION: The laser welding method joins both members 11, 12 by superposing the first metal member 11 on the second metal member 12 and irradiating the laser beam L to the surface side of the first member 11. A first planting layer 21 and a second planting layer 22 are formed on the first member 11 and the second member 12, respectively before overlapping of both members 11, 12. The first planting layer 21 has a laser beam absorption ratio higher than that of the second planting layer 22 and a melting point equal to or higher than that of the second planting layer 22. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:为了提供一种通过将第一金属构件叠置在第二金属构件上并将激光束照射到第一构件的表面侧来接合第一和第二金属构件的激光焊接方法,使得能够用低激光 能量,并且适合于通过激光束的热来抑制形成在第一构件上的种植层的爆炸或溅射。 解决方案:激光焊接方法通过将第一金属构件11叠置在第二金属构件12上并将激光束L照射到第一构件11的表面侧来连接两个构件11,12。第一种植层21和 分别在两个部件11,12重叠之前的第一部件11和第二部件12上形成第二种植层22.第一种植层21的激光束吸收比高于第二种植层22的激光吸收比, 熔点等于或高于第二种植层22的熔点。(C)2010,JPO&INPIT
    • 8. 发明专利
    • Wiring substrate and manufacturing method for the same
    • 接线基板及其制造方法
    • JP2010147126A
    • 2010-07-01
    • JP2008320595
    • 2008-12-17
    • Denso Corp株式会社デンソー
    • NAKAMURA TOSHIHIROOTANI YUJIKASUGAI HIROSHIIMADA SHINJISAGAWA HARUHIDETERUI KENICHIRO
    • H05K1/09C25D5/10C25D5/56C25D7/00H01L23/12H05K3/24
    • H01L2224/48091H01L2924/00014
    • PROBLEM TO BE SOLVED: To provide a wiring substrate that properly prevents bulging in a conductive film and pinholes in the conductive film, without having to provide inclination or unevenness on the surface of the conductive film, in a wiring substrate having the conductive film. SOLUTION: The wiring substrate 1 has a conductive film 10, formed by successively laminating a base layer 11 made of a conductor, copper layers 12, 13 made of copper, and a gold layer 14 made of gold on its surface; the copper layers 12, 13 are formed, by successively forming a first layer 12 made of copper plating and a second layer 13 made of copper plating from the side of the base layer 11. Each gas-venting passage 15 for venting the gas generated between the base layer 11 and the first layer 12 is formed inside the first layer 12, from the face on the side of the base layer 11 to the face on the side of the second layer 13 in the first layer 12, and each gas-venting passage 15 is closed by the second layer 13 on the face on the side of the second layer 13 in the first layer 12. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:为了提供一种能够适当地防止导电膜中的膨胀和导电膜中的针孔的布线基板,而不必在导电膜的表面上提供倾斜或不均匀,在具有导电性的布线基板 电影。 布线基板1具有导电膜10,其通过在其表面上依次层叠由导体制成的基底层11,铜层12,13和由金制成的金层14而形成。 通过从基底层11侧依次形成由镀铜制成的第一层12和由镀铜制成的第二层13,形成铜层12,13。每个排气通道15,用于排出在 基底层11和第一层12形成在第一层12的内部,从基底层11的表面到第一层12中的第二层13的一侧的表面,并且每个气体排出 通道15由第一层12中第二层13侧面上的第二层13封闭。版权所有(C)2010,JPO&INPIT