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1. 发明授权

US5508947A Process gas distribution system and method with automatic transducer zero calibration 失效
标题翻译：具有自动换能器零点校准的过程气体分配系统和方法
公开(公告)号：US5508947A
公开(公告)日：1996-04-16
申请号：US242805
申请日：1994-05-13
申请人： Dennis A. Sierk , Ronald R. DuRoss , Stephen G. Geist , Gregory L. Hayes
发明人： Dennis A. Sierk , Ronald R. DuRoss , Stephen G. Geist , Gregory L. Hayes
IPC分类号： F17C13/02 , F17C13/04 , H01L21/00 , G01F25/00 , G01G23/01
CPC分类号： H01L21/67276 , F17C13/02 , F17C13/04 , H01J37/3244 , H01L21/67253 , F17C2205/0111 , F17C2205/0176 , F17C2205/0338 , F17C2205/0391 , F17C2227/044 , F17C2250/032 , F17C2250/034 , F17C2250/0443 , F17C2250/0636 , F17C2270/0518
摘要： A system including a plurality of gas flow control units in cabinets which are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. Transducers are used in the system to measure pressures and other control parameters. Zero calibration of the transducers is provided by automatically subjecting each transducer to a reference computer routine to compute the difference between the standard value and the transducer output, and store the difference as an "offset" to correct the output of the transducer. Thus, re-calibration is performed simply and quickly, at a relatively low labor cost and with relatively little downtime for the system.
摘要翻译：一种系统，包括在机柜中的多个气体流量控制单元，其被连接以根据需要将处理气体分配到半导体制造工厂中被称为“工具”位置的多个利用位置。系统中使用传感器来测量压力和其他控制参数。通过将每个换能器自动对参考计算机程序进行计算，以计算标准值和换能器输出之间的差异，并将差值存储为“偏移”来校正换能器的输出，从而提供换能器的零点校准。因此，以相对低的人工成本且系统的停机时间相对较少，简单而快速地执行重新校准。

2. 发明授权

US5657254A Process gas distribution system and method with automatic transducer zero calibration 失效
标题翻译：具有自动换能器零点校准的过程气体分配系统和方法
公开(公告)号：US5657254A
公开(公告)日：1997-08-12
申请号：US632708
申请日：1996-04-15
申请人： Dennis A. Sierk , Ronald R. DuRoss , Stephen G. Geist , Gregory L. Hayes
发明人： Dennis A. Sierk , Ronald R. DuRoss , Stephen G. Geist , Gregory L. Hayes
IPC分类号： F17C13/02 , F17C13/04 , H01L21/00 , G01F25/00 , G01G23/01
CPC分类号： H01L21/67276 , F17C13/02 , F17C13/04 , H01J37/3244 , H01L21/67253 , F17C2205/0111 , F17C2205/0176 , F17C2205/0338 , F17C2205/0391 , F17C2227/044 , F17C2250/032 , F17C2250/034 , F17C2250/0443 , F17C2250/0636 , F17C2270/0518
摘要： A system including a plurality of gas flow control units in cabinets which are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. Transducers are used in the system to measure pressures and other control parameters. Zero calibration of the transducers is provided by automatically subjecting each transducer to a reference computer routine to compute the difference between the standard value and the transducer output, and store the difference as an "offset" to correct the output of the transducer. Thus, re-calibration is performed simply and quickly, at a relatively low labor cost and with relatively little downtime for the system.
摘要翻译：一种系统，包括在机柜中的多个气体流量控制单元，其被连接以根据需要将处理气体分配到半导体制造工厂中被称为“工具”位置的多个利用位置。系统中使用传感器来测量压力和其他控制参数。通过将每个换能器自动对参考计算机程序进行计算，以计算标准值和换能器输出之间的差异，并将差值存储为“偏移”来校正换能器的输出，从而提供换能器的零点校准。因此，以相对低的人工成本且系统的停机时间相对较少，简单而快速地执行重新校准。

3. 发明授权

US5497316A Process gas distribution system and method 失效
标题翻译：工艺气体分配系统及方法
公开(公告)号：US5497316A
公开(公告)日：1996-03-05
申请号：US416511
申请日：1995-04-04
申请人： Dennis A. Sierk , Ronald R. DuRoss , Stephen G. Geist , Gregory L. Hayes
发明人： Dennis A. Sierk , Ronald R. DuRoss , Stephen G. Geist , Gregory L. Hayes
IPC分类号： F17C13/02 , F17C13/04 , H01L21/00 , G05B11/01 , G06F15/00
CPC分类号： H01L21/67276 , F17C13/02 , F17C13/04 , H01J37/3244 , H01L21/67253 , F17C2205/0111 , F17C2205/0176 , F17C2205/0338 , F17C2205/0391 , F17C2227/044 , F17C2250/032 , F17C2250/034 , F17C2250/0443 , F17C2250/0636 , F17C2270/0518
摘要： Gas flow control units in cabinet are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. The flow control units are adapted to deliver process gas selectively from one of two supply tanks to any one or all of four different tool locations. Simple, fast, low-cost purging of the gas delivery conduits is provided to facilitate maintenance, gas cylinder changes, etc. Means are provided to enable pulse purging of the long gas delivery conduit from the cabinet to the tool when flow-through or other purging is not possible.
摘要翻译：机柜中的气体流量控制单元被连接以将处理气体根据需要分配到半导体制造工厂中称为“工具”位置的多个利用位置。流量控制单元适于从两个供应罐中的一个选择性地将工艺气体输送到四个不同工具位置中的任何一个或全部。提供简单，快速，低成本的气体输送管道的清洗，以便于维护，气瓶更换等。提供了使流体通过或其它流体从长时间的气体输送管道从机柜到工具的脉冲吹扫清洗是不可能的。

4. 发明授权

US5220517A Process gas distribution system and method with supervisory control 失效
标题翻译：工艺气体分配系统及其监控方法
公开(公告)号：US5220517A
公开(公告)日：1993-06-15
申请号：US576067
申请日：1990-08-31
申请人： Dennis A. Sierk , Ronald R. DuRoss , Stephen G. Geist , Gregory L. Hayes
发明人： Dennis A. Sierk , Ronald R. DuRoss , Stephen G. Geist , Gregory L. Hayes
IPC分类号： F17C13/02 , F17C13/04 , H01L21/00
CPC分类号： H01L21/67276 , F17C13/02 , F17C13/04 , H01J37/3244 , H01L21/67253 , F17C2205/0111 , F17C2205/0176 , F17C2205/0338 , F17C2205/0391 , F17C2227/044 , F17C2250/032 , F17C2250/034 , F17C2250/0443 , F17C2250/0636 , F17C2270/0518
摘要： A plurality of gas flow control units in cabinets are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. Each gas flow control unit is connected to a single tool interface controller over a single communications cable. The status and operational characteristics of the individual units are communicated through the tool interface controller to a supervisory control computer by means of polling. Each flow control cabinet has its own data processor, and can be operated alone. Also, the supervisory computer can be used to operate each cabinet, as well as to monitor operations of the system. Gas demand and other signals are communicated from each tool location to the control units through a single cable connected to the interface controller, thus reducing the original wiring cost. Changing the communications path to accompany a change of the tool to which a given conduit in one of the cabinets delivers its gas can be done quickly, in software, with a few keystrokes. Mechanical re-wiring is not needed.
摘要翻译：连接机柜中的多个气体流量控制单元，以将处理气体根据需要分配到半导体制造工厂中被称为“工具”位置的多个利用位置。每个气体流量控制单元通过单个通信电缆连接到单个工具接口控制器。各个单元的状态和操作特性通过工具界面控制器通过轮询方式传送到监控控制计算机。每个流量控制柜都有自己的数据处理器，可以单独操作。此外，监控计算机可用于操作每个机柜，以及监视系统的操作。气体需求和其他信号通过连接到接口控制器的单个电缆从每个工具位置传送到控制单元，从而降低原始接线成本。改变通信路径以伴随其中一个机柜中的给定导管传送其气体的工具的改变，可以通过软件快速地进行几次击键。不需要机械重新布线。

5. 发明授权

US5329463A Process gas distribution system and method with gas cabinet exhaust flow control 失效
标题翻译：具有气柜排气流量控制的工艺气体分配系统和方法
公开(公告)号：US5329463A
公开(公告)日：1994-07-12
申请号：US3550
申请日：1993-01-13
申请人： Dennis A. Sierk , Ronald R. DuRoss , Stephen G. Geist , Gregory L. Hays
发明人： Dennis A. Sierk , Ronald R. DuRoss , Stephen G. Geist , Gregory L. Hays
IPC分类号： F17C13/02 , F17C13/04 , H01L21/00 , G06F15/46 , G01F1/34
CPC分类号： H01L21/67276 , F17C13/02 , F17C13/04 , H01J37/3244 , H01L21/67253 , F17C2205/0111 , F17C2205/0176 , F17C2205/0338 , F17C2205/0391 , F17C2227/044 , F17C2250/032 , F17C2250/034 , F17C2250/0443 , F17C2250/0636 , F17C2270/0518
摘要： Gas flow control units in cabinets are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. Each gas flow control cabinet has an exhaust duct which connects to an exhaust duct in the plant through which waste gases from the cabinet are exhausted by a fan to the atmosphere. Low flow alarm signals are generated if the exhaust flow is below a desired level. A programmable controller is provided for controlling the alarm function according to the size of the exhaust ducting from the plant so as to facilitate installation and operation of each cabinet in a variety of locations with different duct sizes.
摘要翻译：机柜中的气体流量控制单元被连接以将处理气体根据需要分配到半导体制造工厂中被称为“工具”位置的多个利用位置。每个气体流量控制柜具有排气管道，该排气管道连接到设备中的排气管道，来自柜体的废气通过风扇排放到大气中。如果排气流低于期望水位，则会产生低流量报警信号。提供了可编程控制器，用于根据来自设备的排气管道的尺寸控制报警功能，以便于在各种具有不同管道尺寸的位置安装和操作每个机柜。

6. 发明授权

US5657786A Zero dead-leg gas control apparatus and method 失效
标题翻译：零死点气体控制装置及方法
公开(公告)号：US5657786A
公开(公告)日：1997-08-19
申请号：US664788
申请日：1996-06-17
申请人： Ronald R. DuRoss , William K. Tucker
发明人： Ronald R. DuRoss , William K. Tucker
IPC分类号： C23C16/44 , F16K11/20 , F16K11/22 , F16K17/00 , F16K27/00 , F17D1/04 , B08B5/00 , B08B9/06 , F16K7/17
CPC分类号： C23C16/4408 , F16K11/207 , F16K11/22 , F16K17/003 , F16K27/003 , F17D1/04 , Y10T137/0402 , Y10T137/0491 , Y10T137/4252 , Y10T137/4259 , Y10T137/87249 , Y10T137/87877 , Y10T137/87893
摘要： A gas cabinet manifold is free of dead-legs both during delivery of process gas to a semiconductor fabrication tool location and during purging of the manifold. The manifold includes three similar dual valve assembly blocks. Each valve assembly block includes two valves and each of the valves has a valve chamber in which are formed three ports. Each valve also includes a mechanism for selectively closing one of its three ports. Each of the valves has one of its non-closeable ports connected via a conduit to a corresponding non-closeable port of the other valve, and the other non-closeable ports are connected by a second conduit which is connected by a third conduit to a port by which gas may be introduced into the valve block. A vacuum venturi or other vacuum source is used to vent process gas from a high pressure area of the manifold by way of a pressure regulator and a low pressure area of the manifold. A valve block similar to those described above, but with manually actuated valves, is used in a purge gas manifold that is installed in association with the gas cabinet manifold.
摘要翻译：在将工艺气体输送到半导体制造工具位置和在歧管清洗期间，气柜歧管都没有死角。歧管包括三个类似的双阀组件块。每个阀组件块包括两个阀，并且每个阀具有形成三个端口的阀室。每个阀还包括用于选择性地关闭其三个端口中的一个的机构。每个阀具有通过管道连接到另一个阀的相应的不可关闭端口的其不可关闭端口中的一个，并且其它不可关闭端口通过第二导管连接，第二导管通过第三导管连接到气体可以被引入阀块的端口。真空文丘里管或其他真空源用于通过压力调节器和歧管的低压区域从歧管的高压区域排出处理气体。类似于上述的阀块，但是具有手动致动的阀，被用在与气柜歧管相关联地安装的吹扫气体歧管中。

7. 发明授权

US5794659A Zero dead-leg valve structure 失效
标题翻译：零死腿阀结构
公开(公告)号：US5794659A
公开(公告)日：1998-08-18
申请号：US777837
申请日：1996-12-31
申请人： Ronald R. DuRoss , William K. Tucker
发明人： Ronald R. DuRoss , William K. Tucker
IPC分类号： C23C16/44 , F16K11/20 , F16K11/22 , F16K17/00 , F16K27/00 , F17D1/04
CPC分类号： C23C16/4408 , F16K11/207 , F16K11/22 , F16K17/003 , F16K27/003 , F17D1/04 , Y10T137/0402 , Y10T137/0491 , Y10T137/4252 , Y10T137/4259 , Y10T137/87249 , Y10T137/87877 , Y10T137/87893
摘要： A valve structure without dead-legs is provided for controlling the flow of gases in a semiconductor fabrication facility. The valve structure comprises a conduit forming a loop with three ports. Flexible metallic diaphragms are selectively operable to open and close two of the ports.
摘要翻译：提供没有死腿的阀结构，用于控制半导体制造设备中的气体流。阀结构包括形成具有三个端口的回路的导管。灵活的金属隔膜可选择性地操作以打开和关闭两个端口。

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