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1. 发明授权

US07169231B2 Gas distribution system with tuning gas 有权
标题翻译：配有调节气的配气系统
公开(公告)号：US07169231B2
公开(公告)日：2007-01-30
申请号：US10318612
申请日：2002-12-13
申请人： Dean J. Larson , Babak Kadkhodayan , Di Wu , Kenji Takeshita , Bi-Ming Yen , Xingcai Su , William M. Denty, Jr. , Peter Loewenhardt
发明人： Dean J. Larson , Babak Kadkhodayan , Di Wu , Kenji Takeshita , Bi-Ming Yen , Xingcai Su , William M. Denty, Jr. , Peter Loewenhardt
IPC分类号： C23C16/52 , C23C16/455 , C23C16/00 , H01L21/306
CPC分类号： H01L21/67017
摘要： An apparatus for providing different gases to different zones of a processing chamber is provided. A gas supply for providing an etching gas flow is provided. A flow splitter in fluid connection with the gas supply for splitting the etching gas flow from the gas supply into a plurality of legs is provided. A tuning gas system in fluid connection to at least one of the legs of the plurality of legs is provided.
摘要翻译：提供了一种用于向处理室的不同区域提供不同气体的装置。提供了用于提供蚀刻气体流的气体供应。提供了一种与气体供应流体连接的分流器，用于将来自气体供给的蚀刻气体流分解成多个支腿。提供了与多个腿部中的至少一个腿流体连接的调节气体系统。

2. 发明授权

US08801892B2 Uniform etch system 有权
标题翻译：均匀刻蚀系统
公开(公告)号：US08801892B2
公开(公告)日：2014-08-12
申请号：US12055212
申请日：2008-03-25
申请人： Dean J. Larson , Babak Kadkhodayan , Di Wu , Kenji Takeshita , Bi-Ming Yen , Xingcai Su , William M. Denty, Jr. , Peter Loewenhardt
发明人： Dean J. Larson , Babak Kadkhodayan , Di Wu , Kenji Takeshita , Bi-Ming Yen , Xingcai Su , William M. Denty, Jr. , Peter Loewenhardt
IPC分类号： H01L21/3065 , C23C16/455 , C23C16/50 , C23C16/505 , C23C16/509 , C23C16/52
CPC分类号： H01L21/67017
摘要： Etching a layer over a substrate is provided. The substrate is placed in a plasma processing chamber. A first gas is provided to an inner zone within the plasma processing chamber. A second gas is provided to the outer zone within the plasma processing chamber, where the outer zone surrounds the inner zone and the first gas is different than the second gas. Plasmas are simultaneously generated from the first gas and second gas. The layer is etched, where the layer is etched by the plasmas from the first gas and second gas.
摘要翻译：提供了在衬底上蚀刻一层。将基板放置在等离子体处理室中。第一气体被提供到等离子体处理室内的内部区域。第二气体被提供到等离子体处理室内的外部区域，其中外部区域围绕内部区域并且第一气体不同于第二气体。从第一气体和第二气体同时产生等离子体。蚀刻该层，其中该层被来自第一气体和第二气体的等离子体蚀刻。

3. 发明授权

US07371332B2 Uniform etch system 有权
标题翻译：均匀刻蚀系统
公开(公告)号：US07371332B2
公开(公告)日：2008-05-13
申请号：US10642083
申请日：2003-08-14
申请人： Dean J. Larson , Babak Kadkhodayan , Di Wu , Kenji Takeshita , Bi-Ming Yen , Xingcai Su , William M. Denty, Jr. , Peter Loewenhardt
发明人： Dean J. Larson , Babak Kadkhodayan , Di Wu , Kenji Takeshita , Bi-Ming Yen , Xingcai Su , William M. Denty, Jr. , Peter Loewenhardt
IPC分类号： H01L21/306
CPC分类号： H01L21/67017
摘要： Etching a layer over a substrate is provided. The substrate is placed in a plasma processing chamber. A first gas is provided to an inner zone within the plasma processing chamber. A second gas is provided to the outer zone within the plasma processing chamber, where the outer zone surrounds the inner zone and the first gas is different than the second gas. Plasmas are simultaneously generated from the first gas and second gas. The layer is etched, where the layer is etched by the plasmas from the first gas and second gas.
摘要翻译：提供了在衬底上蚀刻一层。将基板放置在等离子体处理室中。第一气体被提供到等离子体处理室内的内部区域。第二气体被提供到等离子体处理室内的外部区域，其中外部区域围绕内部区域并且第一气体不同于第二气体。从第一气体和第二气体同时产生等离子体。蚀刻该层，其中该层被来自第一气体和第二气体的等离子体蚀刻。

4. 发明申请

US20080210377A1 UNIFORM ETCH SYSTEM 有权
标题翻译：均匀蚀刻系统
公开(公告)号：US20080210377A1
公开(公告)日：2008-09-04
申请号：US12055212
申请日：2008-03-25
申请人： Dean J. Larson , Babak Kadkhodayan , Di Wu , Kenji Takeshita , Bi-Ming Yen , Xingcai Su , William M. Denty , Peter Loewenhardt
发明人： Dean J. Larson , Babak Kadkhodayan , Di Wu , Kenji Takeshita , Bi-Ming Yen , Xingcai Su , William M. Denty , Peter Loewenhardt
IPC分类号： C23F1/08
CPC分类号： H01L21/67017
摘要： Etching a layer over a substrate is provided. The substrate is placed in a plasma processing chamber. A first gas is provided to an inner zone within the plasma processing chamber. A second gas is provided to the outer zone within the plasma processing chamber, where the outer zone surrounds the inner zone and the first gas is different than the second gas. Plasmas are simultaneously generated from the first gas and second gas. The layer is etched, where the layer is etched by the plasmas from the first gas and second gas.
摘要翻译：提供了在衬底上蚀刻一层。将基板放置在等离子体处理室中。第一气体被提供到等离子体处理室内的内部区域。第二气体被提供到等离子体处理室内的外部区域，其中外部区域围绕内部区域并且第一气体不同于第二气体。从第一气体和第二气体同时产生等离子体。蚀刻该层，其中该层被来自第一气体和第二气体的等离子体蚀刻。

5. 发明授权

US09388169B2 Use of 15-benzylidene-14-deoxy-11, 12-dehydroandrographolide derivative in manufacture of medicaments for protecting liver and anti-hepatitis C virus 有权
公开(公告)号：US09388169B2
公开(公告)日：2016-07-12
申请号：US14377386
申请日：2013-02-05
申请人： Guifu Dai , Songlin Zhu , Yanan Wang , Jian Wu , Dan Zhao , Di Wu , Huanfei Liu , Haiwei Xu , Mengjiao Liu , Jing Zhao , Wei Han , Zhenwei Wu , Hang Wang , Hongmin Liu
发明人： Guifu Dai , Songlin Zhu , Yanan Wang , Jian Wu , Dan Zhao , Di Wu , Huanfei Liu , Haiwei Xu , Mengjiao Liu , Jing Zhao , Wei Han , Zhenwei Wu , Hang Wang , Hongmin Liu
IPC分类号： C07D405/00 , C07D405/12 , A61K31/365 , A61K31/443 , A61K9/00 , C07D307/33 , C07D307/58 , A61K47/38
CPC分类号： A61K31/365 , A61K9/0019 , A61K9/0053 , A61K31/443 , A61K31/455 , A61K47/38 , C07D307/33 , C07D307/58 , C07D405/12
摘要： Disclosed is use of andrographolide derivative as shown by general formula 1 in manufacture of medicaments for anti-hepatitis C virus, and preventing and treating immunological liver damage caused by virus infection and different chemical liver damage.

6. 发明授权

US09360307B2 Structured-light based measuring method and system 有权
标题翻译：基于结构光的测量方法和系统
公开(公告)号：US09360307B2
公开(公告)日：2016-06-07
申请号：US13696785
申请日：2010-05-07
申请人： Danwei Shi , Di Wu , Wenchuang Zhao , Qi Xie
发明人： Danwei Shi , Di Wu , Wenchuang Zhao , Qi Xie
IPC分类号： H04N7/18 , G01B11/25 , G06T7/00
CPC分类号： G01B11/2545 , G06T7/521 , G06T2207/10012
摘要： A structured-light measuring method, includes: matching process, in which the number and the low-precision depth of a laser point are achieved by using the imaging position of the laser point on a first camera (21) according to a first corresponding relationship in a calibration database, and the imaging position of the laser point on a second camera (22) is searched according to the number and the low-precision depth of the laser point so as to acquire the candidate matching points, then the matching process is completed according to the imaging position of the first camera (21) and the candidate matching points of the imaging position of the first camera (21) on the second camera (22) so that a matching result is achieved; and computing process, in which the imaging position of the second camera (22) matching with the imaging position of the first camera (21) is achieved according to the matching result, and then the precision position of the laser point is determined by a second corresponding relationship in the calibration database. A structured-light measuring system utilizes the above measuring method.
摘要翻译：一种结构光测量方法，包括：匹配处理，其中通过根据第一对应关系在第一相机（21）上使用激光点的成像位置来实现激光点的数量和低精度深度在校准数据库中，根据激光点的数量和低精度深度搜索激光点在第二相机（22）上的成像位置，以获得候选匹配点，则匹配处理为根据第一相机（21）的成像位置和第二相机（22）上的第一相机（21）的成像位置的候选匹配点完成，从而实现匹配结果; 以及计算处理，其中根据匹配结果实现与第一相机（21）的成像位置匹配的第二相机（22）的成像位置，然后由第二相位确定激光点的精确位置校准数据库中的对应关系。结构光测量系统采用上述测量方法。

7. 发明授权

US09307220B2 Image display device, image display method, and program 有权
标题翻译：图像显示装置，图像显示方法和程序
公开(公告)号：US09307220B2
公开(公告)日：2016-04-05
申请号：US13358997
申请日：2012-01-26
申请人： Di Wu , Michiaki Sakamoto
发明人： Di Wu , Michiaki Sakamoto
IPC分类号： H04N13/00 , H04N13/04
CPC分类号： H04N13/128 , G06T7/11 , G06T7/50 , G06T2200/04 , G06T2207/10028 , H04N13/349 , H04N13/361
摘要： An image display device includes region of interest extraction unit, parallax image generation unit and 3D image display unit. Region of interest extraction unit generates depth image signal by depth image conversion employing depth threshold, depth image signal including information on distance in three-dimensional space between viewpoint and each pixel of two-dimensional image including region of interest desired to be noted by observer, depth image conversion being such that depth value indicating distance between viewpoint and each pixel of two-dimensional image is converted to depth value for 2D display when depth value is equal to or larger than depth threshold. Parallax image generation unit generates both-eye parallax image having parallax in region of interest alone, from two-dimensional image and image obtained by conversion of region of interest image representing region of interest at each of both-eye viewpoints, based on two-dimensional image and depth image signal. 3D image display unit displays both eye parallax image.
摘要翻译：图像显示装置包括感兴趣区域提取单元，视差图像生成单元和3D图像显示单元。感兴趣区域提取单元通过使用深度阈值的深度图像转换生成深度图像信号，深度图像信号包括关于视点与视点之间的三维空间中的距离的信息的深度图像信号，包括期望由观察者注意的感兴趣区域的二维图像的每个像素，深度图像转换使得当深度值等于或大于深度阈值时，指示视点与二维图像的每个像素之间的距离的深度值被转换为2D显示的深度值。视差图像生成单元基于二维图像生成具有视点的双眼视差图像，二维图像和二维图像中的每个双眼视点的感兴趣区域的图像表示获得的图像图像和深度图像信号。 3D图像显示单元显示双眼视差图像。

8. 发明授权

US08855191B2 Parallelization of high-performance video encoding on a single-chip multiprocessor 有权
标题翻译：在单芯片多处理器上并行化高性能视频编码
公开(公告)号：US08855191B2
公开(公告)日：2014-10-07
申请号：US12625484
申请日：2009-11-24
申请人： J. Dean Brederson , Greg Gillis , Sean Heffernan , Daichi Furusaka , Keishi Chikamura , Masato Hori , Di Wu , Lim Boon Shyang
发明人： J. Dean Brederson , Greg Gillis , Sean Heffernan , Daichi Furusaka , Keishi Chikamura , Masato Hori , Di Wu , Lim Boon Shyang
IPC分类号： H04N7/12 , H04N19/61 , H04N19/433 , H04N19/436 , H04N19/174 , H04N19/423
CPC分类号： H04N19/00515 , H04N19/174 , H04N19/423 , H04N19/433 , H04N19/436 , H04N19/61
摘要： High-quality video encoding may be implemented using a single-chip multiprocessor system. Video encoding may be parallelized to take advantage of multiple processing elements available on a single-chip multiprocessor system. Task level parallelism may comprise parallelizing encoding tasks, such as motion estimation, compensation, transformation, quantization, deblocking filtering, and the like across multiple processing elements. Data level parallelism may comprise segmenting video frame data into macroblock partitions and slabs adapted to provide data independence between parallel processing elements. Data communications and synchronization features of the single-chip system may be leveraged to provide for data sharing and synchronism between processing elements.
摘要翻译：可以使用单片多处理器系统来实现高质量视频编码。视频编码可以并行化以利用单芯片多处理器系统上可用的多个处理元件。任务级并行可以包括跨多个处理元件并行编码任务，诸如运动估计，补偿，变换，量化，去块滤波等。数据级并行可以包括将视频帧数据分割成宏块分区和适于在并行处理元件之间提供数据独立性的平板。可以利用单芯片系统的数据通信和同步特征来提供处理元件之间的数据共享和同步。

9. 发明授权

US08261998B2 Customizable transaction card 有权
标题翻译：可定制交易卡
公开(公告)号：US08261998B2
公开(公告)日：2012-09-11
申请号：US12916823
申请日：2010-11-01
申请人： Christopher Michael Roncari , Di Wu
发明人： Christopher Michael Roncari , Di Wu
IPC分类号： G06K19/05
CPC分类号： G06K19/07703 , B42D15/0053
摘要： A financial transaction device is disclosed. The device includes a first surface and a second surface. The first surface comprises a writable field enabling a writing instrument and/or a printing device to write on the first writable field. The writable field allows transaction device purchasers to include a custom note, picture, design, logo, pattern and/or any other indicia on the device. The writable field creates an added element of thoughtfulness to make the gift exchange more special.
摘要翻译：公开了金融交易装置。该装置包括第一表面和第二表面。第一表面包括使写入工具和/或打印装置能够在第一可写字段上写入的可写字段。可写字段允许交易设备购买者在设备上包括自定义笔记，图片，设计，标志，图案和/或任何其他标记。可写字段创造了一个周到的元素，使礼物交换更加特别。

10. 发明申请

US20120032555A1 CIRCUIT FOR COMPENSATING INFLUENCE OF TEMPERATURE ON A RESONATOR 有权
标题翻译：用于补偿温度对谐振器的影响的电路
公开(公告)号：US20120032555A1
公开(公告)日：2012-02-09
申请号：US13139481
申请日：2009-12-21
申请人： Jan Jacob Koning , Di Wu , Joep Bontemps
发明人： Jan Jacob Koning , Di Wu , Joep Bontemps
IPC分类号： H01L41/107
CPC分类号： H03H9/02448 , H03K3/011 , H03K3/3545
摘要： The invention relates to a device for compensating influence of temperature on a resonator circuit. The device comprises a resonator circuit and a supply unit for supplying an electric bias signal to the resonator circuit, wherein the supply unit is adapted for adjusting the electric bias signal for compensating influence of temperature on the resonator circuit.
摘要翻译：本发明涉及一种用于补偿温度对谐振器电路的影响的装置。该装置包括谐振器电路和用于向谐振器电路提供偏置偏置信号的供电单元，其中供电单元适于调整偏置信号以补偿谐振器电路的温度影响。

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