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1. 发明授权

US06645358B2 Hollow cylindrical cathode sputtering target and process for producing it 失效
标题翻译：中空圆柱形阴极溅射靶及其制造方法
公开(公告)号：US06645358B2
公开(公告)日：2003-11-11
申请号：US10047343
申请日：2002-01-15
申请人： David Lupton , Ralf Heck , Bernd Stenger , Oliver Warkentin
发明人： David Lupton , Ralf Heck , Bernd Stenger , Oliver Warkentin
IPC分类号： C23C1434
CPC分类号： H01J37/3435 , C23C14/3407 , H01J37/342
摘要： A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder is disclosed. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.
摘要翻译：公开了一种具有中空圆柱形溅射材料和靶保持器的阴极溅射单元的中空圆柱形靶。溅射材料具有环形横截面并且同心地围绕目标保持器的纵向段。目标支架至少在靶的一端延伸出溅射材料，以允许连接到阴极溅射单元。从溅射材料延伸的目标夹持器的至少一部分是能够通过至少一个螺钉配件从目标脱离的单个部件。

2. 发明授权

US06756081B2 Hollow cylindrical cathode sputtering target and process for producing it 失效
标题翻译：中空圆柱形阴极溅射靶及其制造方法
公开(公告)号：US06756081B2
公开(公告)日：2004-06-29
申请号：US10386231
申请日：2003-03-11
申请人： David Lupton , Ralf Heck , Bernd Stenger , Oliver Warkentin
发明人： David Lupton , Ralf Heck , Bernd Stenger , Oliver Warkentin
IPC分类号： C23C1434
CPC分类号： H01J37/3435 , C23C14/3407 , H01J37/342
摘要： A hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder is disclosed. The sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The at least one part of the target holder that extends from the sputtering material is a single part that can be detached from the target by at least one screw fitting.
摘要翻译：公开了一种具有中空圆柱形溅射材料和靶保持器的阴极溅射单元的中空圆柱形靶。溅射材料具有环形横截面并且同心地围绕目标保持器的纵向段。目标支架至少在靶的一端延伸出溅射材料，以允许连接到阴极溅射单元。从溅射材料延伸的目标夹持器的至少一部分是能够通过至少一个螺钉配件从目标脱离的单个部件。

3. 发明授权

US06719034B2 Process for producing a tube-shaped cathode sputtering target 有权
标题翻译：管状阴极溅射靶的制造方法
公开(公告)号：US06719034B2
公开(公告)日：2004-04-13
申请号：US10025284
申请日：2001-12-19
申请人： Ralf Heck , Rainer Jüttner , David Lupton , Egon Maier , Peter Mainz , Harald Manhardt , Bernd Stenger , Holger Zingg
发明人： Ralf Heck , Rainer Jüttner , David Lupton , Egon Maier , Peter Mainz , Harald Manhardt , Bernd Stenger , Holger Zingg
IPC分类号： B22D1900
CPC分类号： B22D19/16 , B22D9/006 , B22D27/04 , C23C14/3414
摘要： A process for producing a tube target for cathode sputtering plants, in which the tube target is formed from a metallic inner tube (target holder) made of a first material with a first melting point of Ts1≧900 K and a metallic outer tube (target) that concentrically surrounds the inner tube and that is made of a second material with a second melting point of Ts2≦800 K. The inside diameter of the outer tube and the outside diameter of the inner tube are proportioned in such a way that the two tubes fit together tightly and are mechanically firmly joined. The outer tube is formed by casting the second material in a molten state in a heated, vertical, cylindrical permanent mold, which has a heated mandrel that constitutes the inner tube. After a space between the mold and the inner tube has been filled with the molten second material, a first thermal gradient develops between the inner tube and the mold, a second thermal gradient develops between the bottom and the top of the mold, and the outer tube is simultaneously cooled from the inside to the outside and from the bottom to the top.
摘要翻译：一种用于阴极溅射装置的管靶的制造方法，其中，所述管靶由金属内管（靶保持器）形成，所述内管由具有Ts1> 900K的第一熔点的第一材料制成，金属外管目标），其同心地围绕内管，并且由具有Ts2 <= 800K的第二熔点的第二材料制成。外管的内径和内管的外径成比例，使得两根管子紧紧地配合在一起，机械地牢固地连接在一起。外管通过将熔融状态的第二材料浇铸在加热的垂直圆柱形永久模具中，该永久模具具有构成内管的加热心轴。在模具和内管之间的空间已经填充有熔融的第二材料之后，在内管和模具之间产生第一热梯度，在模具的底部和顶部之间产生第二热梯度，并且外部管同时从内到外冷却，从底部到顶部。

4. 发明授权

US06080341A Process for making an indium-tin-oxide shaped body 失效
标题翻译：制造氧化铟锡体的方法
公开(公告)号：US06080341A
公开(公告)日：2000-06-27
申请号：US310310
申请日：1999-05-12
申请人： Bernd Stenger , Marek Gorywoda , David Francis Lupton , Wolfram Graf , Wolfgang Jablonski
发明人： Bernd Stenger , Marek Gorywoda , David Francis Lupton , Wolfram Graf , Wolfgang Jablonski
IPC分类号： C04B35/457 , C04B35/622 , C23C14/34 , C04B35/64
CPC分类号： C23C14/3414 , C04B35/457 , C04B35/622
摘要： A process for making an indium-tin-oxide shaped body, comprising: (a) filling an indium-tin-oxide powder into a first flexible mold, the indium-tin-oxide powder having a specific BET surface of at most 3 m.sup.2 /g with a mean primary particle size of 0.03 .mu.m to 1.0 .mu.m and/or having a density of at least 40% of theoretical density after cold pressing at a pressure of 100 MPa and/or the indium-tin-oxide powder being made by reacting at least two reaction partners comprising a molten indium-tin-metal alloy as a first reaction partner and oxygen as a second reaction partner in a plasma arc in a plasma chamber provided with an inlet opening for the reaction partners and an outlet with a gas-supply device to obtain a material, and quenching the material at the outlet opening of the plasma chamber with a gas stream which cools the material at a cooling rate of 10.sup.5 K/s to 10.sup.8 K/s to +50.degree. C. to +400.degree. C.; (b) cold pressing the indium-tin-oxide powder at a minimum pressure of 100 MPa; (c) placing the cold compact released from the first mold in a ceramic powder in a second mold, the ceramic powder having a maximum particle diameter of 250 .mu.m, and a melting point and a sintering temperature higher than +800.degree. C., the melting point of the second mold being higher than 800.degree. C. and the second mold being ductile under the conditions of a hot isostatic pressing; (d) sealing the second mold in a gastight manner; and (e) subjecting the wetted cold compact to hot isostatic pressing at a minimum temperature of +800.degree. C. and a minimum pressure of 20 MPa.
摘要翻译：一种制造铟锡氧化物成形体的方法，包括：（a）将铟锡氧化物粉末填充到第一柔性模具中，所述铟锡氧化物粉末具有至多3m 2 / g，平均一次粒径为0.03μm〜1.0μm，和/或在100MPa的压力下冷压后具有至少40％的理论密度的密度和/或制造的氧化铟锡粉末通过使等离子体室中的至少两个包含熔融的铟 - 锡 - 金属合金作为第一反应伴侣的氧和作为第二反应配对的氧反应，所述等离子体室具有用于反应配体的入口和具有气体供给装置，以获得材料，并且以105K / s至108K / s至+ 50℃的冷却速率将材料冷却的气流淬火在等离子体室的出口处的材料， +400℃。（b）在100MPa的最小压力下冷压氧化铟锡粉末; （c）将从第一模具释放的冷压实体放置在第二模具中的陶瓷粉末中，所述陶瓷粉末的最大粒径为250μm，熔点和烧结温度高于+800℃，第二模具的熔点高于800℃，第二模具在热等静压的条件下是延性的; （d）以气密方式密封第二模具; 和（e）在+ 800℃的最低温度和20MPa的最小压力下对湿润的冷成型体进行热等静压。

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