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1. 发明授权

US07315022B1 High-speed electron beam inspection 有权
标题翻译：高速电子束检查
公开(公告)号：US07315022B1
公开(公告)日：2008-01-01
申请号：US11031091
申请日：2005-01-06
申请人： David L. Adler , Mark A. McCord , Mehdi Vaez-Iravani , Liqun Han , Kirk J. Bertsche
发明人： David L. Adler , Mark A. McCord , Mehdi Vaez-Iravani , Liqun Han , Kirk J. Bertsche
IPC分类号： H01J37/20 , G01R31/28
CPC分类号： G01R31/307 , H01J37/244 , H01J37/28 , H01J2237/0653 , H01J2237/20214 , H01J2237/20228 , H01J2237/244 , H01J2237/24507 , H01J2237/24564 , H01J2237/24592 , H01J2237/248 , H01J2237/2809 , H01J2237/2817
摘要： One embodiment disclosed relates to an electron beam apparatus for inspection of a semiconductor wafer, wherein substantially an entire area of the wafer surface is scanned without moving the stage. A cathode ray tube (CRT) gun may be used to rapidly (and cost effectively) scan the beam over the wafer. Another embodiment disclosed relates to a high-speed automated e-beam inspector configured to scan the e-beam in one dimension while translating the wafer in a perpendicular direction. The translation may be linear, or alternatively, may be in a spiral path. Other embodiments are also disclosed.
摘要翻译：所公开的一个实施例涉及一种用于检查半导体晶片的电子束装置，其中在不移动载物台的情况下扫描晶片表面的大致整个区域。阴极射线管（CRT）枪可以用于快速（并且成本有效地）扫描晶片上的光束。所公开的另一实施例涉及一种配置成在一个维度上扫描电子束的高速自动电子束检查器，同时沿垂直方向平移晶片。平移可以是线性的，或者可以是螺旋形路径。还公开了其他实施例。

2. 发明授权

US08614427B1 Suspended membrane calibration sample 有权
标题翻译：悬浮膜校准样品
公开(公告)号：US08614427B1
公开(公告)日：2013-12-24
申请号：US10195638
申请日：2002-07-15
申请人： Mark A. McCord , Liqun Han
发明人： Mark A. McCord , Liqun Han
IPC分类号： G01N23/00
CPC分类号： G01N23/225 , G01N2223/303 , G01N2223/611
摘要： One embodiment disclosed relates to a method for fabricating a calibration sample. The method includes lithographically patterning a first side of a wafer with a pattern of a self-supporting membrane, etching the first side of the wafer to form the self-supporting membrane in a layer on the first side, and etching a second side of the wafer to reach the layer so as to suspend the membrane over an empty space. Another embodiment disclosed relates to a charged particle beam system. The system includes a charged particle source, a focusing column and lens assembly, a detector, and a suspended membrane calibration sample. Another embodiment disclosed relates a suspended membrane calibration sample for a charged particle beam system. The calibration sample includes a plurality of calibration patterns in an array, a suspended membrane that is self-supporting and includes the plurality of calibration patterns, and an empty space underneath the membrane.
摘要翻译：公开的一个实施例涉及一种用于制造校准样品的方法。该方法包括利用自支撑膜的图案将晶片的第一侧光刻图案化，蚀刻晶片的第一侧以在第一侧上的层中形成自支撑膜，并且蚀刻第二面晶片到达该层，以便将膜悬挂在空的空间上。所公开的另一实施例涉及带电粒子束系统。该系统包括带电粒子源，聚焦柱和透镜组件，检测器和悬浮膜校准样品。所公开的另一实施例涉及用于带电粒子束系统的悬浮膜校准样品。校准样品包括阵列中的多个校准图案，自支撑并包括多个校准图案的悬浮膜和膜下方的空白空间。

3. 发明授权

US06774646B1 Electron beam inspection system using multiple electron beams and uniform focus and deflection mechanisms 有权
标题翻译：电子束检查系统采用多个电子束和均匀的焦点和偏转机制
公开(公告)号：US06774646B1
公开(公告)日：2004-08-10
申请号：US10058614
申请日：2002-01-28
申请人： Liqun Han , Mark A. McCord
发明人： Liqun Han , Mark A. McCord
IPC分类号： G01R3100
CPC分类号： H01J37/28 , G01N23/04 , H01J37/04 , H01J37/141 , H01J37/145 , H01J37/147 , H01J2237/04756 , H01J2237/103 , H01J2237/2817
摘要： A method for inspecting samples uses a multiple beam electron system having a uniform magnetic focusing field. Deflection of the incident electron beams is produced by deflector plates generating an electrostatic deflection force which produces a uniform force on the electron beams. Thermal field emission sources generate incident electron beams towards at least two portions of the sample. A detector array collects multiple detection electrons.
摘要翻译：用于检查样品的方法使用具有均匀磁场的多束电子系统。入射电子束的偏转由偏转板产生，该偏转板产生在电子束上产生均匀的力的静电偏转力。热场发射源朝向样品的至少两部分产生入射电子束。检测器阵列收集多个检测电子。

4. 发明授权

US08092927B2 Shielding, particulate reducing high vacuum components 有权
标题翻译：屏蔽，颗粒减少高真空组件
公开(公告)号：US08092927B2
公开(公告)日：2012-01-10
申请号：US13034770
申请日：2011-02-25
申请人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
发明人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
IPC分类号： B32B15/04 , B32B15/18 , F16C29/00 , F16C29/02
CPC分类号： C22C19/051 , B32B15/01 , C22C19/00 , Y10T428/12625 , Y10T428/12931 , Y10T428/12937 , Y10T428/12944 , Y10T428/12951 , Y10T428/24025 , Y10T428/30
摘要： A method of forming a gate valve for use in a high vacuum environment of an electron gun by machining a core of non-magnetic nickel-chromium-molybdenum-iron-tungsten-silicon-carbon alloy that is weldable with nickel alloys and has a tensile strength of about 750 megapascals, machining a cladding of nickel-iron, welding the core to the cladding to form the gate valve, and machining the gate valve so as to remove any dimensional differences at an interface between the core and the cladding. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic alloy, good vacuum performance, and tight mechanical tolerance control. Also, because the alloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.
摘要翻译：一种形成用于电子枪的高真空环境中的闸阀的方法，该方法是通过加工可与镍合金焊接的非磁性镍铬钼铁 - 钨 - 硅 - 碳合金芯，并且具有拉伸强度强度为约750兆帕，加工镍铁包层，将芯焊接到包层以形成闸阀，并加工闸阀，以消除芯和包层之间的界面处的任何尺寸差异。以这种方式，由于通过加工而不是部件组装来控制最终机械公差，因此获得极高的对准精度。最后一部分提供了由镍合金壳提供的场屏蔽，由非磁性合金提供的低杂散场，良好的真空性能和严格的机械公差控制。此外，由于与不锈钢和钛相比，该合金具有低氧化速度的优点，所以由于诸如电子束轰击的条件，存在较少的污染物积聚。

5. 发明授权

US07919193B1 Shielding, particulate reducing high vacuum components 有权
标题翻译：屏蔽，颗粒减少高真空组件
公开(公告)号：US07919193B1
公开(公告)日：2011-04-05
申请号：US11877713
申请日：2007-10-24
申请人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
发明人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
IPC分类号： B32B15/04 , B32B15/18
CPC分类号： C22C19/051 , B32B15/01 , C22C19/00 , Y10T428/12625 , Y10T428/12931 , Y10T428/12937 , Y10T428/12944 , Y10T428/12951 , Y10T428/24025 , Y10T428/30
摘要： A component for use in a high vacuum environment, the component including a core of non-magnetic Hastelloy with a cladding of nickel-iron covering the core at least in part. The component can be, for example, at least one of a gate valve for use in a high vacuum environment of an electron gun, a bearing, a slide way, a gate valve bearing, a rotary slide, a linear slide, an electron beam column, and electron beam chamber, and a vacuum chamber. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic Hastelloy, good vacuum performance, and tight mechanical tolerance control. Also, because Hastelloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.
摘要翻译：一种用于高真空环境的部件，该部件包括非磁性哈氏合金的核心，其中镍铁包层至少部分地覆盖芯部。该部件可以是例如用于电子枪的高真空环境中的闸阀中的至少一个，轴承，滑动方式，闸阀轴承，旋转滑块，线性滑块，电子束柱和电子束室，以及真空室。以这种方式，由于通过加工而不是部件组装来控制最终机械公差，因此获得极高的对准精度。最后部分提供了由镍合金壳提供的场屏蔽，由非磁性哈氏合金提供的低杂散场，良好的真空性能和严格的机械公差控制。此外，由于与不锈钢和钛相比，哈氏合金具有低氧化速度的优点，因为诸如电子束轰击的条件，污染物积聚较少。

6. 发明授权

US08362425B2 Multiple-beam system for high-speed electron-beam inspection 有权
标题翻译：用于高速电子束检测的多光束系统
公开(公告)号：US08362425B2
公开(公告)日：2013-01-29
申请号：US13095585
申请日：2011-04-27
申请人： Liqun Han , Xinrong Jiang , John D. Greene
发明人： Liqun Han , Xinrong Jiang , John D. Greene
IPC分类号： G01N23/04 , G01N23/00
CPC分类号： G01N23/2251 , G01N2223/102 , G01N2223/611 , H01J37/04 , H01J37/28 , H01J2237/0435 , H01J2237/04926 , H01J2237/1205 , H01J2237/15 , H01J2237/2446
摘要： One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.
摘要翻译：公开的一个实施例涉及用于对目标基板的表面进行成像的多子束电子束成像装置。分束器透镜阵列被配置为分离照明光束以形成主子束阵列，并且扫描系统被配置为在目标基板的表面的区域上扫描主子束阵列。另外，被配置为检测单个二次电子束的检测系统。所公开的另一实施例涉及使用多子束电子束柱对目标衬底的表面进行成像的方法。还公开了其它特征和实施例。

7. 发明授权

US08461526B2 Electron beam column and methods of using same 有权
标题翻译：电子束柱及其使用方法
公开(公告)号：US08461526B2
公开(公告)日：2013-06-11
申请号：US12958174
申请日：2010-12-01
申请人： Marian Mankos , Liqun Han , Xinrong Jiang , Rex Runyon , Carmela Moreno
发明人： Marian Mankos , Liqun Han , Xinrong Jiang , Rex Runyon , Carmela Moreno
IPC分类号： G01N23/00
CPC分类号： H01J37/04 , H01J2237/0458 , H01J2237/0492 , H01J2237/063 , H01J2237/1035 , H01J2237/14 , H01J2237/186 , H01J2237/24535
摘要： In one embodiment, a first vacuum chamber of an electron beam column has an opening which is positioned along an optical axis so as to pass a primary electron beam that travels down the column. A source that emits electrons is positioned within the first vacuum chamber. A beam-limiting aperture is configured to pass a limited angular range of the emitted electrons. A magnetic immersion lens is positioned outside of the first vacuum chamber and is configured to immerse the electron source in a magnetic field so as to focus the emitted electrons into the primary electron beam. An objective lens is configured to focus the primary electron beam onto a beam spot on a substrate surface so as to produce scattered electrons from the beam spot. Controllable deflectors are configured to scan the beam spot over an area of the substrate surface. Other features and embodiments are also disclosed.
摘要翻译：在一个实施例中，电子束列的第一真空室具有沿着光轴定位的开口，以便通过沿着该列行进的一次电子束。发射电子的源被定位在第一真空室内。光束限制孔被配置成通过发射电子的有限角度范围。磁浸透镜位于第一真空室的外部，并且被配置为将电子源浸入磁场中，以将发射的电子聚焦到一次电子束中。物镜被配置为将一次电子束聚焦到衬底表面上的束斑上，以便从束斑产生散射的电子。可控制偏转器被配置为在衬底表面的区域上扫描束斑。还公开了其它特征和实施例。

8. 发明申请

US20110142382A1 Shielding, Particulate Reducing High Vacuum Components 有权
标题翻译：屏蔽，颗粒减少高真空组件
公开(公告)号：US20110142382A1
公开(公告)日：2011-06-16
申请号：US13034770
申请日：2011-02-25
申请人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
发明人： Mohammed Tahmassebpur , Salam Harb , Liqun Han , Marian Mankos
IPC分类号： F16C29/00 , B23K31/02 , B32B15/00
CPC分类号： C22C19/051 , B32B15/01 , C22C19/00 , Y10T428/12625 , Y10T428/12931 , Y10T428/12937 , Y10T428/12944 , Y10T428/12951 , Y10T428/24025 , Y10T428/30
摘要： A method of forming a gate valve for use in a high vacuum environment of an electron gun by machining a core of non-magnetic nickel-chromium-molybdenum-iron-tungsten-silicon-carbon alloy that is weldable with nickel alloys and has a tensile strength of about 750 megapascals, machining a cladding of nickel-iron, welding the core to the cladding to form the gate valve, and machining the gate valve so as to remove any dimensional differences at an interface between the core and the cladding. In this manner, because the final mechanical tolerance is controlled by machining instead of part assembling, extremely high alignment accuracy is obtained. The final part provides field shielding as provided by the nickel alloy shell, low stray field provided by the non-magnetic alloy, good vacuum performance, and tight mechanical tolerance control. Also, because the alloy has the advantage of a low oxidation rate in comparison to stainless steel and titanium, there is less contamination buildup due to conditions such as electron beam bombardment.
摘要翻译：一种形成用于电子枪的高真空环境中的闸阀的方法，该方法是通过加工可与镍合金焊接的非磁性镍铬钼铁 - 钨 - 硅 - 碳合金芯，并且具有拉伸强度强度为约750兆帕，加工镍铁包层，将芯焊接到包层以形成闸阀，并加工闸阀，以消除芯和包层之间的界面处的任何尺寸差异。以这种方式，由于通过加工而不是部件组装来控制最终机械公差，因此获得极高的对准精度。最后一部分提供了由镍合金壳提供的场屏蔽，由非磁性合金提供的低杂散场，良好的真空性能和严格的机械公差控制。此外，由于与不锈钢和钛相比，该合金具有低氧化速度的优点，所以由于诸如电子束轰击的条件，存在较少的污染物积聚。

9. 发明授权

US08664594B1 Electron-optical system for high-speed and high-sensitivity inspections 失效
标题翻译：用于高速和高灵敏度检测的电子光学系统
公开(公告)号：US08664594B1
公开(公告)日：2014-03-04
申请号：US13095574
申请日：2011-04-27
申请人： Xinrong Jiang , Liqun Han , Mohammed Tahmassebpur , Salam Harb , John D. Greene
发明人： Xinrong Jiang , Liqun Han , Mohammed Tahmassebpur , Salam Harb , John D. Greene
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/28 , G01N2223/418 , G01N2223/611 , H01J2237/004 , H01J2237/2817
摘要： The present disclosure provides an electron beam column with substantially improved resolution and/or throughput for inspecting manufactured substrates. The electron beam column comprises an electron gun, a scanner, an objective lens, and a detector. In accordance with one embodiment, the electron gun includes a gun lens having a flip-up pole piece configuration. In accordance with another embodiment, the scanner comprises a dual scanner having a pre-scanner and a main scanner, and the detector may be configured between the electron gun and the pre-scanner. In accordance with another embodiment, the electron beam column includes a continuously-variable aperture configured to select a beam current. Other embodiments relate to methods of using an electron beam column for automated inspection of manufactured substrates. In one embodiment, for example, an aperture size is adjusted to achieve a minimum spot size given a selected beam current and a column-condition domain being used.
摘要翻译：本公开提供了一种电子束柱，其具有用于检查制造的基底的显着改善的分辨率和/或通过量。电子束柱包括电子枪，扫描仪，物镜和检测器。根据一个实施例，电子枪包括具有翻转极片构造的枪形透镜。根据另一个实施例，扫描器包括具有预扫描器和主扫描器的双扫描器，并且检测器可以配置在电子枪和预扫描器之间。根据另一实施例，电子束列包括被配置为选择束电流的连续可变孔径。其他实施例涉及使用电子束柱来自动检查制造的基板的方法。在一个实施例中，例如，在给定所选择的束电流和使用列条件域的情况下，调节孔径尺寸以实现最小斑点尺寸。

10. 发明申请

US20120241606A1 MULTIPLE-BEAM SYSTEM FOR HIGH-SPEED ELECTRON-BEAM INSPECTION 有权
标题翻译：用于高速电子束检测的多光束系统
公开(公告)号：US20120241606A1
公开(公告)日：2012-09-27
申请号：US13095585
申请日：2011-04-27
申请人： Liqun Han , Xinrong Jiang , John D. Greene
发明人： Liqun Han , Xinrong Jiang , John D. Greene
IPC分类号： G01N23/04 , G01N23/00
CPC分类号： G01N23/2251 , G01N2223/102 , G01N2223/611 , H01J37/04 , H01J37/28 , H01J2237/0435 , H01J2237/04926 , H01J2237/1205 , H01J2237/15 , H01J2237/2446
摘要： One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.
摘要翻译：公开的一个实施例涉及用于对目标基板的表面进行成像的多子束电子束成像装置。分束器透镜阵列被配置为分离照明光束以形成主子束阵列，并且扫描系统被配置为在目标基板的表面的区域上扫描主子束阵列。另外，被配置为检测单个二次电子束的检测系统。所公开的另一实施例涉及使用多子束电子束柱对目标衬底的表面进行成像的方法。还公开了其它特征和实施例。

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