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1. 发明授权

US07297287B2 Method and apparatus for endpoint detection using partial least squares 有权
标题翻译：使用偏最小二乘法进行端点检测的方法和装置
公开(公告)号：US07297287B2
公开(公告)日：2007-11-20
申请号：US10472436
申请日：2002-03-25
申请人： David Fatke , Hongyu Yue
发明人： David Fatke , Hongyu Yue
IPC分类号： H01L21/306
CPC分类号： H01L22/20 , H01J37/32935 , H01J37/32963 , H01L2924/0002 , H01L2924/00
摘要： An apparatus and method for detection of a feature etch completion within an etching reactor. The method includes determining a correlation matrix by recording first measured data regarding a first etch process over successive time intervals to form a first recorded data matrix, assembling a first endpoint signal matrix using target endpoint data for a specific etch process, performing a partial least squares analysis on the recorded data matrix and the first endpoint signal matrix to refine the recorded data matrix, and computing a correlation matrix based upon the refined recorded data matrix and the first endpoint signal matrix. The method further includes performing a second etch process to form a second recorded data matrix. The correlation matrix and the second recorded data matrix are analyzed to determine whether an endpoint of the second etch process has been achieved.
摘要翻译：用于检测蚀刻反应器内的特征蚀刻完成的装置和方法。该方法包括通过在连续时间间隔上记录关于第一蚀刻处理的第一测量数据来形成相关矩阵以形成第一记录数据矩阵，使用用于特定蚀刻工艺的目标端点数据组装第一端点信号矩阵，执行偏最小二乘法对所记录的数据矩阵和第一端点信号矩阵进行分析以细化记录的数据矩阵，以及基于精细记录的数据矩阵和第一端点信号矩阵来计算相关矩阵。该方法还包括执行第二蚀刻工艺以形成第二记录数据矩阵。分析相关矩阵和第二记录数据矩阵以确定是否已经实现了第二蚀刻工艺的端点。

2. 发明授权

US07213478B2 Method for automatic configuration of processing system 有权
标题翻译：自动配置处理系统的方法
公开(公告)号：US07213478B2
公开(公告)日：2007-05-08
申请号：US10776452
申请日：2004-02-12
申请人： Satoshi Harada , Edward C. Hume, III , James E Willis , Kevin Andrew Chamness , Hieu A Lam , Hongyu Yue , David Fatke
发明人： Satoshi Harada , Edward C. Hume, III , James E Willis , Kevin Andrew Chamness , Hieu A Lam , Hongyu Yue , David Fatke
IPC分类号： G01N19/00
CPC分类号： G05B19/41865 , G05B19/41845 , G05B2219/31334 , G05B2219/32191 , G05B2219/45031 , Y02P90/16 , Y02P90/185 , Y02P90/20 , Y02P90/22 , Y02P90/86
摘要： A method of automatically configuring an Advanced Process Control (APC) system for a semiconductor manufacturing environment in which an auto-configuration script is generated for executing an auto-configuration program. The auto-configuration script activates default values for input to the auto-configuration program. The auto-configuration script is executed to generate an enabled parameter file output from the auto-configuration program. The enabled parameter file identifies parameters for statistical process control (SPC) chart generation.
摘要翻译：一种自动配置用于半导体制造环境的高级过程控制（APC）系统的方法，其中生成用于执行自动配置程序的自动配置脚本。自动配置脚本激活自动配置程序输入的默认值。执行自动配置脚本以生成从自动配置程序输出的启用参数文件。启用的参数文件识别统计过程控制（SPC）图生成的参数。

3. 发明申请

US20050016947A1 Method and apparatus for endpoint detection using partial least squares 有权
标题翻译：使用偏最小二乘法进行端点检测的方法和装置
公开(公告)号：US20050016947A1
公开(公告)日：2005-01-27
申请号：US10472436
申请日：2002-03-25
申请人： David Fatke , Hongyu Yue
发明人： David Fatke , Hongyu Yue
IPC分类号： H01L21/3065 , H01J37/32 , H01L21/66 , C23F1/00
CPC分类号： H01L22/20 , H01J37/32935 , H01J37/32963 , H01L2924/0002 , H01L2924/00
摘要： An apparatus and method for detection of a feature etch completion within an etching reactor. The method includes determining a correlation matrix by recording first measured data regarding a first etch process over successive time intervals to form a first recorded data matrix, assembling a first endpoint signal matrix using target endpoint data for a specific etch process, performing a partial least squares analysis on the recorded data matrix and the first endpoint signal matrix to refine the recorded data matrix, and computing a correlation matrix based upon the refined recorded data matrix and the first endpoint signal matrix. The method further includes performing a second etch process to form a second recorded data matrix. The correlation matrix and the second recorded data matrix are analyzed to determine whether an endpoint of the second etch process has been achieved.
摘要翻译：用于检测蚀刻反应器内的特征蚀刻完成的装置和方法。该方法包括通过在连续时间间隔上记录关于第一蚀刻处理的第一测量数据来形成相关矩阵以形成第一记录数据矩阵，使用用于特定蚀刻工艺的目标端点数据组装第一端点信号矩阵，执行偏最小二乘法对所记录的数据矩阵和第一端点信号矩阵进行分析以细化记录的数据矩阵，以及基于精细记录的数据矩阵和第一端点信号矩阵来计算相关矩阵。该方法还包括执行第二蚀刻工艺以形成第二记录数据矩阵。分析相关矩阵和第二记录数据矩阵以确定是否已经实现了第二蚀刻工艺的端点。

4. 发明申请

US20050015176A1 Method for automatic configuration of processing system 有权
标题翻译：自动配置处理系统的方法
公开(公告)号：US20050015176A1
公开(公告)日：2005-01-20
申请号：US10776452
申请日：2004-02-12
申请人： Satoshi Harada , Edward Hume , James Willis , Kevin Chamness , Hieu Lam , Hongyu Yue , David Fatke
发明人： Satoshi Harada , Edward Hume , James Willis , Kevin Chamness , Hieu Lam , Hongyu Yue , David Fatke
IPC分类号： G05B19/418 , G06F19/00
CPC分类号： G05B19/41865 , G05B19/41845 , G05B2219/31334 , G05B2219/32191 , G05B2219/45031 , Y02P90/16 , Y02P90/185 , Y02P90/20 , Y02P90/22 , Y02P90/86
摘要： A method of automatically configuring an Advanced Process Control (APC) system for a semiconductor manufacturing environment in which an auto-configuration script is generated for executing an auto-configuration program. The auto-configuration script activates default values for input to the auto-configuration program. The auto-configuration script is executed to generate an enabled parameter file output from the auto-configuration program. The enabled parameter file identifies parameters for statistical process control (SPC) chart generation.
摘要翻译：一种自动配置用于半导体制造环境的高级过程控制（APC）系统的方法，其中生成用于执行自动配置程序的自动配置脚本。自动配置脚本激活自动配置程序输入的默认值。执行自动配置脚本以生成从自动配置程序输出的启用参数文件。启用的参数文件识别统计过程控制（SPC）图生成的参数。

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