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    • 6. 发明授权
    • Highly selective etch process for submicron contacts
    • 亚微米接触的高选择性蚀刻工艺
    • US06001699A
    • 1999-12-14
    • US589903
    • 1996-01-23
    • Phi L. NguyenMark A. FradkinGilroy J. Vandentop
    • Phi L. NguyenMark A. FradkinGilroy J. Vandentop
    • H01L21/311H01L21/768C03C15/00
    • H01L21/76802H01L21/31116
    • A method for forming contacts with vertical sidewalls, high aspect ratios, improved salicide and photoresist etch selectivity at submicron dimensions. In one currently preferred embodiment, an opening is formed in a dual oxide layer by etching the undoped oxide layer at a first rate and then etching the doped oxide layer at a second rate. The etch process is performed in a low density parallel plate reactor. The process parameters of the etch are fixed in ranges which optimize the etch process and allow greater control over the critical dimensions of the opening. For example, the oxide layer is etched at a pressure in the range of approximately 100-300 mTorr and with an etch chemistry having a CHF.sub.3 :CF.sub.4 gas flow ratio in the range of approximately 3:1-1:1, respectively.
    • 用于在亚微米尺寸处形成具有垂直侧壁的接触的方法,高纵横比,改进的自对准硅化物和光致抗蚀剂蚀刻选择性。 在一个当前优选的实施例中,通过以第一速率蚀刻未掺杂的氧化物层,然后以第二速率蚀刻掺杂的氧化物层,在双重氧化物层中形成开口。 蚀刻工艺在低密度平行板反应器中进行。 蚀刻的工艺参数固定在优化蚀刻工艺并允许对开口的关键尺寸的更大控制的范围内。 例如,氧化物层在大约100-300mTorr的压力下蚀刻,并且蚀刻化学物质的CHF 3:CF 4气体流动比分别在大约3:1-1:1范围内。