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    • 1. 发明授权
    • Gallium nitride for liquid crystal electrodes
    • 液晶电极用氮化镓
    • US08268707B2
    • 2012-09-18
    • US12817421
    • 2010-06-17
    • Daniel P. ReslerWilliam E. Hoke
    • Daniel P. ReslerWilliam E. Hoke
    • H01L21/20H01L21/36H01L31/20
    • G02F1/13439H01L29/2003H01L29/7787
    • Described herein is a liquid crystal (LC) device having Gallium Nitride HEMT electrodes. The Gallium Nitride HEMT electrodes can be grown on a variety of substrates, including but not limited to sapphire, silicon carbide, silicon, fused silica (using a calcium fluoride buffer layer), and spinel. Also described is a structure provided from GaN HEMT grown on large area silicon substrates and transferred to another substrate with appropriate properties for OPA devices. Such substrates include, but are not limited to sapphire, silicon carbide, silicon, fused silica (using a calcium fluoride buffer layer), and spinel. The GaN HEMT structure includes an AlN interlayer for improving the mobility of the structure.
    • 这里描述的是具有氮化镓HEMT电极的液晶(LC)器件。 氮化镓HEMT电极可以在各种衬底上生长,包括但不限于蓝宝石,碳化硅,硅,熔融二氧化硅(使用氟化钙缓冲层)和尖晶石。 还描述了由在大面积硅衬底上生长的GaN HEMT提供的结构,并将其转移到具有用于OPA器件的适当性质的另一衬底。 这样的基底包括但不限于蓝宝石,碳化硅,硅,熔融二氧化硅(使用氟化钙缓冲层)和尖晶石。 GaN HEMT结构包括用于改善结构的迁移率的AlN夹层。
    • 2. 发明申请
    • Gallium Nitride for Liquid Crystal Electrodes
    • 液晶电极用氮化镓
    • US20120299012A1
    • 2012-11-29
    • US13572157
    • 2012-08-10
    • Daniel P. ReslerWilliam E. Hoke
    • Daniel P. ReslerWilliam E. Hoke
    • H01L29/20H01L29/205
    • G02F1/13439H01L29/2003H01L29/7787
    • Described herein is a liquid crystal (LC) device having Gallium Nitride HEMT electrodes. The Gallium Nitride HEMT electrodes can be grown on a variety of substrates, including but not limited to sapphire, silicon carbide, silicon, fused silica (using a calcium flouride buffer layer), and spinel. Also described is a structure provided from GaN HEMT grown on large area silicon substrates and transferred to another substrate with appropriate properties for OPA devices. Such substrates include, but are not limited to sapphire, silicon carbide, silicon, fused silica (using a calcium fluoride buffer layer), and spinel. The GaN HEMT structure includes an AlN interlayer for improving the mobility of the structure.
    • 这里描述的是具有氮化镓HEMT电极的液晶(LC)器件。 氮化镓HEMT电极可以在各种基板上生长,包括但不限于蓝宝石,碳化硅,硅,熔融二氧化硅(使用硅酸钙缓冲层)和尖晶石。 还描述了由在大面积硅衬底上生长的GaN HEMT提供的结构,并将其转移到具有用于OPA器件的适当性质的另一衬底。 这样的基底包括但不限于蓝宝石,碳化硅,硅,熔融二氧化硅(使用氟化钙缓冲层)和尖晶石。 GaN HEMT结构包括用于改善结构的迁移率的AlN夹层。
    • 3. 发明授权
    • Gallium nitride for liquid crystal electrodes
    • 液晶电极用氮化镓
    • US08698200B2
    • 2014-04-15
    • US13572157
    • 2012-08-10
    • Daniel P. ReslerWilliam E. Hoke
    • Daniel P. ReslerWilliam E. Hoke
    • H01L29/66
    • G02F1/13439H01L29/2003H01L29/7787
    • Described herein is a liquid crystal (LC) device having Gallium Nitride HEMT electrodes. The Gallium Nitride HEMT electrodes can be grown on a variety of substrates, including but not limited to sapphire, silicon carbide, silicon, fused silica (using a calcium flouride buffer layer), and spinel. Also described is a structure provided from GaN HEMT grown on large area silicon substrates and transferred to another substrate with appropriate properties for OPA devices. Such substrates include, but are not limited to sapphire, silicon carbide, silicon, fused silica (using a calcium fluoride buffer layer), and spinel. The GaN HEMT structure includes an AlN interlayer for improving the mobility of the structure.
    • 这里描述的是具有氮化镓HEMT电极的液晶(LC)器件。 氮化镓HEMT电极可以在各种基板上生长,包括但不限于蓝宝石,碳化硅,硅,熔融二氧化硅(使用硅酸钙缓冲层)和尖晶石。 还描述了由在大面积硅衬底上生长的GaN HEMT提供的结构,并将其转移到具有用于OPA器件的适当性质的另一衬底。 这样的基底包括但不限于蓝宝石,碳化硅,硅,熔融二氧化硅(使用氟化钙缓冲层)和尖晶石。 GaN HEMT结构包括用于改善结构的迁移率的AlN夹层。
    • 4. 发明申请
    • GALLIUM NITRIDE FOR LIQUID CRYSTAL ELECTRODES
    • 用于液晶电极的氮化钠
    • US20100320474A1
    • 2010-12-23
    • US12817421
    • 2010-06-17
    • Daniel P. ReslerWilliam E. Hoke
    • Daniel P. ReslerWilliam E. Hoke
    • H01L29/20H01L21/335
    • G02F1/13439H01L29/2003H01L29/7787
    • Described herein is a liquid crystal (LC) device having Gallium Nitride HEMT electrodes. The Gallium Nitride HEMT electrodes can be grown on a variety of substrates, including but not limited to sapphire, silicon carbide, silicon, fused silica (using a calcium fluoride buffer layer), and spinel. Also described is a structure provided from GaN HEMT grown on large area silicon substrates and transferred to another substrate with appropriate properties for OPA devices. Such substrates include, but are not limited to sapphire, silicon carbide, silicon, fused silica (using a calcium fluoride buffer layer), and spinel. The GaN HEMT structure includes an AlN interlayer for improving the mobility of the structure.
    • 这里描述的是具有氮化镓HEMT电极的液晶(LC)器件。 氮化镓HEMT电极可以在各种衬底上生长,包括但不限于蓝宝石,碳化硅,硅,熔融二氧化硅(使用氟化钙缓冲层)和尖晶石。 还描述了由在大面积硅衬底上生长的GaN HEMT提供的结构,并将其转移到具有用于OPA器件的适当性质的另一衬底。 这样的基底包括但不限于蓝宝石,碳化硅,硅,熔融二氧化硅(使用氟化钙缓冲层)和尖晶石。 GaN HEMT结构包括用于改善结构的迁移率的AlN夹层。
    • 9. 发明授权
    • Liquid crystal cell window
    • 液晶电池窗
    • US4882235A
    • 1989-11-21
    • US162922
    • 1988-03-02
    • Daniel P. Resler
    • Daniel P. Resler
    • G02B1/02G02F1/1333G02F1/1343G02F3/00H01Q3/26
    • H01Q3/2676G02F1/1333G02F1/13439Y10S148/084Y10T428/12549Y10T428/12681
    • An optical time delay unit for use in an optical phased array beam-steering system includes a switchable polarization rotator in conjunction with Brewster plates and mirrors to form electrically-selectable optical paths of different lengths. The switchable polarization rotator is aligned with the optical beam and is responsive to a control signal for varying the polarization of light passing therethrough. The Brewster plates receive the light passing through the first polarization rotator and are transmissive to a first polarization and reflective of a second. The transmissive and reflective paths are of different lengths, and are recombined at a second Brewster plate. The original polarization may be restored by a second polarization rotator. A plurality of time delay units may be cascaded to permit selection from among many paths of various lengths. In a preferred embodiment, the polarization rotators include liquid crystal cells having nematic phase molecules. Optically-transparent electrodes are formed on the cell windows by an ion implantation process. A planar phased array beamforming system comprises a plurality of time delay units, illustratively arranged in a 2-by-2 configuration, wherein each unit is illuminated by a corresponding sector of a single light beam.