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    • 1. 发明授权
    • Process for absorption of sulfur compounds from fluids
    • 从流体中吸收硫化合物的方法
    • US5098681A
    • 1992-03-24
    • US569120
    • 1990-08-16
    • Steven H. ChristiansenDane ChangDruce K. Crump
    • Steven H. ChristiansenDane ChangDruce K. Crump
    • B01D53/14B01D53/50C10K1/14
    • B01D53/1493B01D53/507C10K1/14
    • Sulfur dioxide is removed from a fluid containing SO.sub.2 by employing as an absorbent therefor an aqueous solution of compounds represented by Formulas I and II: ##STR1## wherein each R.sup.1 or R.sup.2 is independently hydrogen; an alkyl group; a hydroxyalkyl group; an aldehyde group; a carboxylic acid or salt group; an alkyl group containing at least one carboxylic ester, carboxylic acid or salt, ether, aldehyde, ketone or sulfoxide; and wherein at least one R.sup.1 or R.sup.2 is a carbonyl-containing group, such as an aldehyde group, a carboxylic acid containing group, a carboxyl ester group, or a ketone-containing group; ##STR2## wherein each R.sup.3 is independently hydrogen; an alkyl group; a hydroxyalkyl group; an aldehyde group; a carboxylic acid or salt group; or an alkyl, aryl, or aralkyl group containing at least one carboxylic ester, a carboxylic acid or salt, ether, aldehyde, ketones or sulfoxide group. The absorbent solution preferably can be thermally regenerated by heating to remove SO.sub.2.
    • 通过使用由式I和II表示的化合物的水溶液作为吸收剂,从含有SO 2的流体中除去二氧化硫:其中每个R 1或R 2独立地是氢; 烷基; 羟基烷基; 醛基; 羧酸或盐基; 含有至少一个羧酸酯,羧酸或盐,醚,醛,酮或亚砜的烷基; 并且其中至少一个R 1或R 2是含羰基的基团,例如醛基,含羧酸基团,羧基酯基团或含酮基团; 式II其中每个R 3独立地是氢; 烷基; 羟基烷基; 醛基 羧酸或盐基; 或含有至少一个羧酸酯,羧酸或盐,醚,醛,酮或亚砜基团的烷基,芳基或芳烷基。 吸收剂溶液优选通过加热热再生以除去SO 2。
    • 5. 发明授权
    • Formulations with unexpected cleaning performance incorporating a biodegradable chelant
    • 具有意想不到的清洁性能的配方,包含可生物降解的螯合剂
    • US08080508B2
    • 2011-12-20
    • US13190553
    • 2011-07-26
    • Druce K. CrumpDavid A. Wilson
    • Druce K. CrumpDavid A. Wilson
    • C11D1/02C11D1/66C11D1/62C11D3/20B08B3/04
    • C11D3/33C02F1/683C02F5/12C02F2101/20C02F2209/02C02F2305/04C11D3/046
    • A chelating composition suitable for low-temperature use or storage is disclosed. The chelating compositions include 20 to 70 wt. percent of a polar solvent and 30 to 80 wt. percent of a first component of the formula: wherein R is a hydroxyalkyl group and each R′ is individually selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups, carbonyl-containing alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; R″ is selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups; carbonyl-substituted alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; M1 and M2 are alkali metal ions, wherein the M1 has a higher atomic weight than M2; wherein x+y=n and the mole fraction of M1 is greater than 0.70 to 1. Methods of suppressing crystallization and methods of cleaning surfaces employing the compositions described herein are also disclosed.
    • 公开了适用于低温使用或储存的螯合组合物。 螯合组合物包含20至70wt。 极性溶剂的百分比和30至80wt。 百分数的下式的第一组分:其中R是羟烷基,每个R'分别选自氢,未取代或惰性取代的烷基,含羰基的烷基,含羧酸的烷基,羟基烷基 和烷氧基; R“选自氢,未取代或惰性取代的烷基; 羰基取代的烷基,含羧酸的烷基,羟基烷基和烷氧基; M1和M2是碱金属离子,其中M1具有比M2更高的原子量; 其中x + y = n,M1的摩尔分数大于0.70至1.还公开了使用本文所述的组合物抑制结晶的方法和清洁表面的方法。
    • 6. 发明授权
    • Formulations with unexpected cleaning performance incorporating a biodegradable chelant
    • 具有意想不到的清洁性能的配方,包含可生物降解的螯合剂
    • US08034756B2
    • 2011-10-11
    • US12297386
    • 2007-04-03
    • Druce K. CrumpDavid A. Wilson
    • Druce K. CrumpDavid A. Wilson
    • C11D7/26C11D7/32C11D7/10
    • C11D3/33C02F1/683C02F5/12C02F2101/20C02F2209/02C02F2305/04C11D3/046
    • A chelating composition suitable for low-temperature use or storage is disclosed. The chelating compositions include 20 to 70 wt. percent of a polar solvent and 30 to 80 wt. percent of a first component of the formula: (I) wherein R is a hydroxyalkyl group and each R′ is individually selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups, carbonyl-containing alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; R″ is selected from the group consisting of hydrogen, unsubstituted or inertly substituted alkyl groups; carbonyl-substituted alkyl groups, carboxylate-containing alkyl groups, hydroxyalkyl groups and alkoxy groups; M1 and M2 are alkali metal ions, wherein the M1 has a higher atomic weight than M2; wherein x+y=n and the mole fraction of M1 is greater than 0.70 to 1. Methods of suppressing crystallization and methods of cleaning surfaces employing the compositions described herein are also disclosed.
    • 公开了适用于低温使用或储存的螯合组合物。 螯合组合物包含20至70wt。 极性溶剂的百分比和30至80wt。 百分数的下式的第一组分:(I)其中R是羟烷基,每个R'分别选自氢,未取代或惰性取代的烷基,含羰基的烷基,含羧酸的烷基 ,羟基烷基和烷氧基; R“选自氢,未取代或惰性取代的烷基; 羰基取代的烷基,含羧酸的烷基,羟基烷基和烷氧基; M1和M2是碱金属离子,其中M1具有比M2更高的原子量; 其中x + y = n,M1的摩尔分数大于0.70至1.还公开了使用本文所述的组合物抑制结晶的方法和清洁表面的方法。