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1. 发明授权

US09013684B2 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于在微光刻投影曝光装置的照明系统中监视多个反射镜阵列的方法和装置
公开(公告)号：US09013684B2
公开(公告)日：2015-04-21
申请号：US13556408
申请日：2012-07-24
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
IPC分类号： G03F7/20 , G02B26/08 , G01M11/00 , G01N21/55
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
摘要翻译：微光刻照明系统包括单独驱动的元件以可变地照亮系统的光瞳表面。每个元件基于施加到元件的控制信号偏离入射光束。该系统还包括提供测量信号的仪器，以及基于模型的状态估计器，被配置为基于测量信号为每个元件计算估计状态向量。估计状态向量表示由元件引起的光束的偏差; 和偏差的时间导数。照明系统还包括调节器，其被配置为针对每个元件接收：a）估计的状态矢量; 和b）目标值：i）由偏差元素引起的光束的偏差; 和ii）偏差的时间导数。

2. 发明授权

US08320043B2 Illumination apparatus for microlithographyprojection system including polarization-modulating optical element 有权
标题翻译：包括偏光调制光学元件的微光刻投影系统的照明装置
公开(公告)号：US08320043B2
公开(公告)日：2012-11-27
申请号：US12205572
申请日：2008-09-05
申请人： Damian Fiolka , Markus Deguenther
发明人： Damian Fiolka , Markus Deguenther
IPC分类号： G02B5/30 , F21V9/14 , G03B27/72
CPC分类号： G02B5/3083 , G02B1/08 , G02B5/3025 , G02B5/3075 , G02B27/286 , G02F1/0136 , G02F1/0147 , G03F7/70058 , G03F7/70341 , G03F7/70566
摘要： A polarization-modulating optical element including an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.
摘要翻译：包括光学活性晶体材料的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。偏振调制光学元件具有第一线性偏振光的振荡平面和第二直线偏振光的振动平面分别旋转第一旋转角度和第二旋转角度的效果具有第一旋转角度和第二旋转角度彼此不同。

3. 发明申请

US20100039629A1 METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：用于在微观投影曝光装置的照明系统中监测多个反射镜阵列的方法和装置
公开(公告)号：US20100039629A1
公开(公告)日：2010-02-18
申请号：US12506364
申请日：2009-07-21
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
IPC分类号： G03B27/54
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.
摘要翻译：微光刻投影曝光装置的照明系统具有瞳孔表面和基本上平坦的布置，其具有期望地单独驱动的光束偏离元件，用于可变照明瞳孔表面。每个光束偏离元件允许作为施加到光束偏离元件的控制信号的函数来实现入射到其上的投影光束的偏移。测量照明仪器将独立于投影光束的测量光束引导到光束偏离元件上。检测仪器在光束偏离元件偏离后记录测量光束。评估单元确定投影光束与由检测器仪器提供的测量信号的偏差。

4. 发明申请

US20070019179A1 Polarization-modulating optical element 审中-公开
标题翻译：极化调制光学元件
公开(公告)号：US20070019179A1
公开(公告)日：2007-01-25
申请号：US11440475
申请日：2006-05-25
申请人： Damian Fiolka , Markus Deguenther
发明人： Damian Fiolka , Markus Deguenther
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G02B7/008 , G02B27/286 , G03B27/72 , G03F7/70341 , G03F7/70566 , G03F7/70891 , G03F7/70966
摘要： The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickness, wherein the effective optical thickness varies at least as a function of one coordinate different from the preferred coordinate of the coordinate system, in addition or alternative the first and/or the second polarization-modulating optical element comprises solid and/or liquid optically active material, wherein the effective optical thickness is constant as a function of at least one coordinate different from the preferred coordinate of the coordinate system; wherein the first polarization-modulating optical element comprises optically active material with a specific rotation of opposite sign compared to the optically active material of the second polarization-modulating optical element.
摘要翻译：本发明涉及一种投影系统，包括辐射源，可操作以照亮结构化掩模的照明系统和用于将掩模结构的图像投影到感光基板上的投影物镜，其中所述投影系统包括光学系统包括通过光学系统传播的光束的方向给出的光轴或优选方向; 所述光学系统包括由坐标系的坐标描述的温度补偿偏振调制光学元件，其中所述坐标系的一个优选坐标平行于光轴或平行于所述优选方向; 所述温度补偿偏振调制光学元件包括第一和第二偏振调制光学元件，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料和有效光学厚度的轮廓，其中另外或替代地，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料，其中有效光学厚度至少作为不同于坐标系的优选坐标的一个坐标的函数而变化，其中有效光学厚度作为与坐标系的优选坐标不同的至少一个坐标的函数是恒定的; 其中与第二偏振调制光学元件的光学活性材料相比，第一偏振调制光学元件包括具有相反符号的特定旋转的光学活性材料。

5. 发明授权

US08482717B2 Polarization-modulating optical element 有权
标题翻译：极化调制光学元件
公开(公告)号：US08482717B2
公开(公告)日：2013-07-09
申请号：US12201767
申请日：2008-08-29
申请人： Damian Fiolka , Markus Deguenther
发明人： Damian Fiolka , Markus Deguenther
IPC分类号： G03B27/42
CPC分类号： G03F7/70191 , G02B7/008 , G02B27/286 , G03B27/72 , G03F7/70341 , G03F7/70566 , G03F7/70891 , G03F7/70966
摘要： The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickness, wherein the effective optical thickness varies at least as a function of one coordinate different from the preferred coordinate of the coordinate system, in addition or alternative the first and/or the second polarization-modulating optical element comprises solid and/or liquid optically active material, wherein the effective optical thickness is constant as a function of at least one coordinate different from the preferred coordinate of the coordinate system; wherein the first polarization-modulating optical element comprises optically active material with a specific rotation of opposite sign compared to the optically active material of the second polarization-modulating optical element.
摘要翻译：本发明涉及一种投影系统，包括辐射源，可操作以照亮结构化掩模的照明系统和用于将掩模结构的图像投影到光敏基板上的投影物镜，其中所述投影系统包括光学系统包括通过光学系统传播的光束的方向给出的光轴或优选方向; 所述光学系统包括由坐标系的坐标描述的温度补偿偏振调制光学元件，其中所述坐标系的一个优选坐标平行于光轴或平行于所述优选方向; 所述温度补偿偏振调制光学元件包括第一和第二偏振调制光学元件，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料和有效光学厚度的轮廓，其中另外或替代地，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料，其中有效光学厚度至少作为不同于坐标系的优选坐标的一个坐标的函数而变化，其中有效光学厚度作为与坐标系的优选坐标不同的至少一个坐标的函数是恒定的; 其中与第二偏振调制光学元件的光学活性材料相比，第一偏振调制光学元件包括具有相反符号的特定旋转的光学活性材料。

6. 发明授权

US08339577B2 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于在微光刻投影曝光装置的照明系统中监视多个反射镜阵列的方法和装置
公开(公告)号：US08339577B2
公开(公告)日：2012-12-25
申请号：US12506364
申请日：2009-07-21
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Andras G. Major , Manfred Maul , Johannes Eisenmenger , Damian Fiolka , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Johannes Wangler , Michael Layh
IPC分类号： G01C11/26 , G01N21/00 , G03B27/32 , G03B27/54 , G03B27/74
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.
摘要翻译：微光刻投影曝光装置的照明系统具有瞳孔表面和基本上平坦的布置，其具有期望地单独驱动的光束偏离元件，用于可变照明瞳孔表面。每个光束偏离元件允许作为施加到光束偏离元件的控制信号的函数来实现入射到其上的投影光束的偏移。测量照明仪器将独立于投影光束的测量光束引导到光束偏离元件上。检测仪器在光束偏离元件偏离后记录测量光束。评估单元确定投影光束与由检测器仪器提供的测量信号的偏差。

7. 发明授权

US08279524B2 Polarization-modulating optical element 有权
标题翻译：极化调制光学元件
公开(公告)号：US08279524B2
公开(公告)日：2012-10-02
申请号：US10580698
申请日：2005-01-14
申请人： Damian Fiolka , Markus Deguenther
发明人： Damian Fiolka , Markus Deguenther
IPC分类号： G02B5/30 , G02B27/28 , F21V9/14 , G03B27/72
CPC分类号： G02B5/3083 , G02B1/08 , G02B5/3025 , G02B5/3075 , G02B27/286 , G02F1/0136 , G02F1/0147 , G03F7/70058 , G03F7/70341 , G03F7/70566
摘要： A polarization-modulating optical element formed of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second linearly polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.
摘要翻译：由光学活性晶体材料形成的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。偏振调制光学元件具有第一线性偏振光的振荡平面和第二直线偏振光的振动平面分别旋转第一旋转角度和第二旋转角度的效果具有第一旋转角度和第二旋转角度彼此不同。

8. 发明授权

US07511886B2 Optical beam transformation system and illumination system comprising an optical beam transformation system 有权
标题翻译：光束变换系统和包括光束变换系统的照明系统
公开(公告)号：US07511886B2
公开(公告)日：2009-03-31
申请号：US11271976
申请日：2005-11-14
申请人： Joerg Schultz , Markus Deguenther , Markus Brotsack , Gerhard Fuerter , Wolfgang Singer , Manfred Maul , Alexander Kohl , Damian Fiolka
发明人： Joerg Schultz , Markus Deguenther , Markus Brotsack , Gerhard Fuerter , Wolfgang Singer , Manfred Maul , Alexander Kohl , Damian Fiolka
IPC分类号： G02B5/30 , G02B27/28 , F21V9/14 , G03B27/72
CPC分类号： G03F7/70183 , G02B5/32 , G02B27/09 , G02B27/0927 , G02B27/0944 , G02B27/095 , G02B27/0977 , G03F7/70108 , G03F7/70566
摘要： An optical beam transformation system has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include a transformation element causing a radial redistribution of light intensity and having a transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface. The optical elements further include an optical compensation element effecting a spatially dependent compensation of transmission inhomogeneties caused by the polarization-selective reflection at the transformation surface according to a compensation symmetry adapted to the efficiency symmetry of the transformation surface.
摘要翻译：光束变换系统具有沿着光束转换系统的光轴布置的一系列光学元件，其被设计用于将入射光束分布到光束转换系统的入射面上，使得入射光分布从出射表面出射的出射光分布的光束转换系统通过光强度的径向再分布。光学元件包括变换元件，其导致光强度的径向重新分布并且具有相对于光轴倾斜的变换表面，并且根据转变表面的效率对称特性引起入射在相变表面上的光分布的偏振选择反射。光学元件还包括光学补偿元件，该光学补偿元件根据适应于转换表面的效率对称性的补偿对称性，在变换表面处实现由偏振选择反射引起的透射不均匀性的空间依赖补偿。

9. 发明申请

US20080316598A1 POLARIZATION-MODULATING OPTICAL ELEMENT 有权
标题翻译：极化调制光学元件
公开(公告)号：US20080316598A1
公开(公告)日：2008-12-25
申请号：US12200068
申请日：2008-08-28
申请人： Damian Fiolka , Markus Deguenther
发明人： Damian Fiolka , Markus Deguenther
IPC分类号： G02B5/30
CPC分类号： G02B5/3083 , G02B1/08 , G02B5/3025 , G02B5/3075 , G02B27/286 , G02F1/0136 , G02F1/0147 , G03F7/70058 , G03F7/70341 , G03F7/70566
摘要： A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second line early polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.
摘要翻译：由光学活性晶体材料组成的偏振调制光学元件具有厚度分布，其中沿光轴方向测量的厚度在光学元件的面积上变化。偏振调制光学元件具有如下效果：第一直线偏振光的振荡平面和第二行的早期偏振光的振动平面分别旋转第一旋转角度和第二角度旋转，第一旋转角度和第二旋转角度彼此不同。

10. 发明申请

US20080316459A1 POLARIZATION-MODULATING OPTICAL ELEMENT 有权
标题翻译：极化调制光学元件
公开(公告)号：US20080316459A1
公开(公告)日：2008-12-25
申请号：US12201767
申请日：2008-08-29
申请人： Damian Fiolka , Markus Deguenther
发明人： Damian Fiolka , Markus Deguenther
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G02B7/008 , G02B27/286 , G03B27/72 , G03F7/70341 , G03F7/70566 , G03F7/70891 , G03F7/70966
摘要： The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickness, wherein the effective optical thickness varies at least as a function of one coordinate different from the preferred coordinate of the coordinate system, in addition or alternative the first and/or the second polarization-modulating optical element comprises solid and/or liquid optically active material, wherein the effective optical thickness is constant as a function of at least one coordinate different from the preferred coordinate of the coordinate system; wherein the first polarization-modulating optical element comprises optically active material with a specific rotation of opposite sign compared to the optically active material of the second polarization-modulating optical element.
摘要翻译：本发明涉及一种投影系统，包括辐射源，可操作以照亮结构化掩模的照明系统和用于将掩模结构的图像投影到感光基板上的投影物镜，其中所述投影系统包括光学系统包括通过光学系统传播的光束的方向给出的光轴或优选方向; 所述光学系统包括由坐标系的坐标描述的温度补偿偏振调制光学元件，其中所述坐标系的一个优选坐标平行于光轴或平行于所述优选方向; 所述温度补偿偏振调制光学元件包括第一和第二偏振调制光学元件，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料和有效光学厚度的轮廓，其中另外或替代地，第一和/或第二偏振调制光学元件包括固体和/或液体光学活性材料，其中有效光学厚度至少作为不同于坐标系的优选坐标的一个坐标的函数而变化，其中有效光学厚度作为与坐标系的优选坐标不同的至少一个坐标的函数是恒定的; 其中与第二偏振调制光学元件的光学活性材料相比，第一偏振调制光学元件包括具有相反符号的特定旋转的光学活性材料。

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