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    • 8. 发明授权
    • Semiconductor device
    • 半导体器件
    • US06646350B2
    • 2003-11-11
    • US09922230
    • 2001-08-03
    • Naotaka TanakaHideo MiuraYoshiyuki KadoIkuo YoshidaTakahiro Naito
    • Naotaka TanakaHideo MiuraYoshiyuki KadoIkuo YoshidaTakahiro Naito
    • H01L2352
    • H01L23/562H01L21/563H01L23/145H01L2224/16225H01L2224/32225H01L2224/73203H01L2224/73204H01L2924/01078H01L2924/01079H01L2924/01087H01L2924/12044H01L2924/00
    • In order to realize a semiconductor device and a manufacturing method thereof which can keep with a high reliability an electric connection between each of bump pads formed on LSI chips and each of electrode pads formed on an interconnection substrate, within an guaranteed temperature range, a thermal expansion coefficient of an adhesive (3) is in the range of 20 to 60 ppm, and an elastic modulus of a build-up portion (6) is in the range of 5 to 10 GPa. Further, the build-up portion (6) is constituted by a multi-layer build-up substrate in which buid-up portion a peak value (a glass transition temperature) of a loss coefficient exists within a range of 100° C. to 250° C. and does not exist within a range of 0° C. to 100° C. By setting or selecting the physical properties in the manner disclosed above, it is possible to realize a semiconductor device and a manufacturing method thereof which can keep with a high reliability an electric bonding between the bump pads (2) formed on the LSI chips (1) and the electrode pads (4) on the interconnection substrate (5) within an guaranteed temperature range.
    • 为了实现能够保持高可靠性的半导体器件及其制造方法,在形成在LSI芯片上的每个凸块焊盘和形成在互连基板上的每个电极焊盘之间的电连接在保证的温度范围内, 粘合剂(3)的膨胀系数在20〜60ppm的范围内,积聚部(6)的弹性模量在5〜10GPa的范围内。 此外,积存部(6)由多层积层基板构成,在该多层积层基板中,增益部分的损耗系数的峰值(玻璃化转变温度)存在于100℃〜 250℃,并且不存在于0℃至100℃的范围内。通过以上述方式设置或选择物理性质,可以实现可以保持的半导体器件及其制造方法 在保证温度范围内,形成在LSI芯片(1)上的凸块焊盘(2)和互连基板(5)上的电极焊盘(4)之间的电连接具有高可靠性。