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    • 2. 发明授权
    • Lithography rework analysis method and system
    • 光刻返工分析方法和系统
    • US06805283B2
    • 2004-10-19
    • US10064381
    • 2002-07-09
    • Kun-Pei LiHsiu-Lan TingPao-Hsing LinNai-Chun Li
    • Kun-Pei LiHsiu-Lan TingPao-Hsing LinNai-Chun Li
    • G06K1300
    • G03F7/70525G03F7/70533H01L22/20
    • A lithography rework analysis method and system. The method is applied to a system having a network server and a user computer having a browser interface. The method transfers initial data of various machines into the network database. The network database contains rework data of machines performing lithography rework operation. Analysis time node is input to the browser interface and the analysis time node is transferred to the network server. According to the analysis time node, the network server retrieves required data from the network database and displays the data on the browser interface. Rework data residing within the network database includes data table production time, product number, production line code, station code, department code, product code, mask rework pieces, measuring station, production machine, worker name, rework reason code, rework reason title, current status, wafer lot note item, rework time and rework region.
    • 光刻返工分析方法及系统。 该方法应用于具有网络服务器和具有浏览器接口的用户计算机的系统。 该方法将各种机器的初始数据传输到网络数据库。 网络数据库包含执行光刻返工操作的机器的返工数据。 分析时间节点输入到浏览器界面,分析时间节点被传送到网络服务器。 根据分析时间节点,网络服务器从网络数据库检索所需的数据,并在浏览器界面上显示数据。 驻留在网络数据库中的返工数据包括数据表生产时间,产品编号,生产线代码,车站代码,部门代码,产品代码,掩模返工件,测量站,生产机器,工人名称,返工原因代码,返工原理标题, 当前状态,晶圆批号,返工时间和返工区。