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1. 发明申请

WO0231595A2 DISSOLUTION INHIBITORS IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY 审中-公开
标题翻译：溶致微生物光刻胶组合物中的溶解抑制剂
公开(公告)号：WO0231595A2
公开(公告)日：2002-04-18
申请号：PCT/US0142662
申请日：2001-10-12
申请人： DU PONT , BERGER LARRY L , FELDMAN JERALD , PETROV VIACHESLAV ALEXANDROVIC , SCHADT FRANK L III , FEIRING ANDREW F , ZUMSTEG FREDRICK CLAUS JR
发明人： BERGER LARRY L , FELDMAN JERALD , PETROV VIACHESLAV ALEXANDROVIC , SCHADT FRANK L III , FEIRING ANDREW F , ZUMSTEG FREDRICK CLAUS JR
IPC分类号： G03F7/039 , G03F7/004 , G03F7/038 , G03F7/20 , G03F7/30 , H01L21/027 , G03F7/00
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0395 , Y10S430/106 , Y10S430/108
摘要： The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound containing at least one functional group having the structure -C(Rf)(Rf')OR wherein Rf and Rf' are the same or different fluoroalkyl groups of from one to about ten carbon atoms or taken together are (CF2)a wherein a is an integer ranging from 2 to about 10 and R is a hydrogen atom or an acid labile protecting group. Typically, the dissolution inhibitor has an absorption coefficient of less than about 4.0 mu m at a wavelength of 157 nm.
摘要翻译：本发明涉及包含聚合物粘合剂的光刻胶组合物; 一种光敏组分; 和至少一种溶解抑制剂，所述溶解抑制剂包含含有至少一个具有结构-C（R f）（R f'）OR的官能团的链烷烃或环烷属化合物，其中R f和R f'是相同或不同的1至约10个碳的氟烷基原子或一起为（CF 2）a，其中a为2至约10的整数，R为氢原子或酸不稳定保护基。典型地，溶解抑制剂在157nm的波长下具有小于约4.0μm的吸收系数。

2. 发明申请

WO0244814A2 BASES AND SURFACTANTS AND THEIR USE IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY 审中-公开
标题翻译：基础和表面活性剂及其在光刻胶组合物中的应用
公开(公告)号：WO0244814A2
公开(公告)日：2002-06-06
申请号：PCT/US0144294
申请日：2001-11-26
申请人： DU PONT , BERGER LARRY L , CRAWFORD MICHAEL CARL , SCHADT FRANK L III , ZUMSTEG FREDRICK CLAUS JR
发明人： BERGER LARRY L , CRAWFORD MICHAEL CARL , SCHADT FRANK L III , ZUMSTEG FREDRICK CLAUS JR
IPC分类号： G03F7/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30 , H01L21/027
CPC分类号： G03F7/0046 , G03F7/0382 , G03F7/0395
摘要： A photoresist composition having: (A) a polymer selected from the group consisting of: (a) a fluorine-containing copolymer having a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: -C(Rf)(Rf')OH, wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CX2=CY2 where X = F or CF3 and Y = -H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX2=CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; (B) at least one photoactive component; and (C) a functional compound selected from the group consisting of a base and a surfactant. The polymer may have an absorption coefficient of less than about 5.0 ñm at a wavelength of about 157 nm. These photoresist compositions have improved imaging properties.
摘要翻译：一种光致抗蚀剂组合物，其具有：（A）选自以下的聚合物：（a）具有衍生自至少一种烯键式不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的; （b）含有保护的酸基团的支化聚合物，所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; （c）具有至少一个具有以下结构的氟代醇的含氟聚合物：-C（R f）（R f'）OH，其中R f和R f'是相同或不同的1至约10个碳原子的氟代烷基或一起为（ CF 2）n，其中n为2至10; （d）全氟（2,2-二甲基-1,3-二氧杂环戊烯）或CX2 = CY2的无定形乙烯基均聚物，其中X = F或CF 3和Y = -H或全氟（2,2-二甲基-1 ，3-二氧杂环戊烯）和CX2 = CY2; 和（e）由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; （B）至少一种光活性组分; 和（C）选自碱和表面活性剂的官能化合物。聚合物在约157nm的波长处可具有小于约5.0μm的吸收系数。这些光致抗蚀剂组合物具有改善的成像性能。

3. 发明申请

WO0244815A2 MULTILAYER ELEMENTS CONTAINING PHOTORESIST COMPOSITIONS AND THEIR USE IN MICROLITHOGRAPHY 审中-公开
标题翻译：包含光电组合物的多层元件及其在微结构中的应用
公开(公告)号：WO0244815A2
公开(公告)日：2002-06-06
申请号：PCT/US0144295
申请日：2001-11-26
申请人： DU PONT , BERGER LARRY L , SCHADT FRANK L III
发明人： BERGER LARRY L , SCHADT FRANK L III
IPC分类号： G03F7/033 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/09 , G03F7/11 , H01L21/027
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/094 , G03F7/11
摘要： A photoresist element comprising a substrate; an etch resistant layer; and at least one photoresist layer prepared from a photoresist composition comprising a polymer selected from the group consisting of: (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: -C(Rf)(Rf')OH, wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CX2=CY2 where X = F or CF3 and Y = -H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX2=CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and (B) at least one photoactive component.
摘要翻译：一种光致抗蚀剂元件，包括基底; 耐蚀刻层; 和由光致抗蚀剂组合物制备的至少一个光致抗蚀剂层，所述光致抗蚀剂组合物包含选自以下的聚合物：（a）包含衍生自至少一种烯属不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯键式不饱和化合物是多环的（b）含有保护的酸基团的支化聚合物，所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; （c）具有至少一个具有以下结构的氟代醇的含氟聚合物：-C（R f）（R f'）OH，其中R f和R f'是相同或不同的1至约10个碳原子的氟代烷基或一起为（ CF 2）n，其中n为2至10; （d）全氟（2,2-二甲基-1,3-二氧杂环戊烯）或CX2 = CY2的无定形乙烯基均聚物，其中X = F或CF 3和Y = -H或全氟（2,2-二甲基-1 ，3-二氧杂环戊烯）和CX2 = CY2; 和（e）由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; 和（B）至少一种光活性组分。

4. 发明申请

WO0244811A3 POLYMERS BLENDS AND THEIR USE IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY 审中-公开
标题翻译：聚合物混合物及其在光刻胶组合物中的应用
公开(公告)号：WO0244811A3
公开(公告)日：2004-09-23
申请号：PCT/US0143398
申请日：2001-11-21
申请人： DU PONT , BERGER LARRY L , SCHADT FRANK L III
发明人： BERGER LARRY L , SCHADT FRANK L III
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0382 , G03F7/0046 , G03F7/0392 , G03F7/0395 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： A photoresist composition having (A) at least two polymers selected from the group consisting of: (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure:-C(Rf)(Rf')OH wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10;(d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CX2=CY2 where X = F or CF3 and Y = H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX2 = CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and (B) at least one photoactive component.
摘要翻译：一种光致抗蚀剂组合物，其具有（A）至少两种选自以下的聚合物：（a）包含衍生自至少一种烯属不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的; （b）含有保护的酸基团的支化聚合物，所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; （c）具有至少一个具有以下结构的氟代醇的含氟聚合物：其中R f和R f'为相同或不同的具有1至约10个碳原子的氟代烷基或它们一起为（CF 2））n其中n为2至10;（d）全氟（2,2-二甲基-1,3-间二氧杂环戊烯）或CX2 = CY2的无定形乙烯基均聚物，其中X = F或CF 3和Y = H或全氟（2,2-二甲基-1,3-二氧杂环戊烯）和CX2 = CY2; 和（e）由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; 和（B）至少一种光活性组分。

5. 发明申请

WO0233489A3 COMPOSITIONS FOR MICROLITHOGRAPHY 审中-公开
标题翻译：显微组成
公开(公告)号：WO0233489A3
公开(公告)日：2002-11-21
申请号：PCT/US0142743
申请日：2001-10-16
申请人： DU PONT , BERGER LARRY L , CRAWFORD MICHAEL KARL , FELDMAN JERALD , JOHNSON LYNDA KAYE , SCHADT III FRANK L , ZUMSTEG JR FREDRICK CLAUS
发明人： BERGER LARRY L , CRAWFORD MICHAEL KARL , FELDMAN JERALD , JOHNSON LYNDA KAYE , SCHADT III FRANK L , ZUMSTEG JR FREDRICK CLAUS
IPC分类号： C08F232/00 , C08F232/08 , G03F7/004 , G03F7/039 , H01L21/027 , G03F7/09
CPC分类号： C08F232/08 , G03F7/0045 , G03F7/0046 , G03F7/0395
摘要： A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1'-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containing a functional group containing the structure: -C(Rf)(Rf')Orb wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is an integer ranging from 2 to about 10 and Rb is a hydrogen atom or an acid- or base-labile protecting group; r is an integer ranging from 0-4. The fluorine-containing polymer has an absorption coefficient of less than 4.0 mm- at a wavelength of 157 nm. These polymers are useful in photoresist compositions for microlithography. They exhibit high transparency at this short wavelength and also possess other key properties, including good plasma etch resistance and adhesive properties.
摘要翻译：由至少一种选自乙烯，α-烯烃，1,1'-二取代烯烃，乙烯基醇，乙烯基醚和1,3-二烯的间隔基团制备的含氟聚合物; 和含有结构为-C（Rf）（Rf'）Orb的官能团的降冰片基，其中Rf和Rf'是相同或不同的含1至约10个碳原子的氟代烷基或者合在一起为（CF2）n 其中n是2至约10的整数，Rb是氢原子或酸或碱不稳定的保护基; r是范围从0到4的整数。含氟聚合物在157nm的波长处具有小于4.0mm -1的吸收系数。这些聚合物在用于微光刻的光刻胶组合物中是有用的。它们在这种短波长下表现出高透明度，并且还具有其他关键性能，包括良好的抗等离子蚀刻性和粘合性能。

6. 发明申请

WO0244816A3 ANTIREFLECTIVE LAYER FOR USE IN MICROLITHOGRAPHY 审中-公开
标题翻译：用于微结构的抗反射层
公开(公告)号：WO0244816A3
公开(公告)日：2003-09-12
申请号：PCT/US0143437
申请日：2001-11-21
申请人： DU PONT , BERGER LARRY L , CRAWFORD MICHAEL KARL , FRENCH ROGER HARQUAIL , WHELAND ROBERT CLAYTON , ZUMSTEG FREDERICK CLAUS JR
发明人： BERGER LARRY L , CRAWFORD MICHAEL KARL , FRENCH ROGER HARQUAIL , WHELAND ROBERT CLAYTON , ZUMSTEG FREDERICK CLAUS JR
IPC分类号： G03F7/11 , G03F7/004 , G03F7/09 , H01L21/027
CPC分类号： G03F7/091 , G03F7/0046
摘要： An element having a support, and at least an antireflective layer; wherein the antireflective layer is prepared from a composition having a polymer selected from the group consisting of (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure:-C(Rf)(Rf')OHwherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro-2,2-dimethyl-1,3-dioxole or CX2=CY2, where X is -F, or -CF3 and Y is H, or amorphous vinyl copolymers of perfluoro-2,2-dimethyl-1,3-dioxole and CX2=CY2; (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and mixtures thereof.
摘要翻译：一种具有支撑体的元件和至少一个抗反射层; 其中所述抗反射层由具有选自以下的聚合物的组合物制备：（a）包含衍生自至少一种烯属不饱和化合物的重复单元的含氟共聚物，其特征在于至少一种烯属不饱和化合物是多环的; （b）含有保护的酸基团的支化聚合物，所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; （c）具有至少一个具有以下结构的氟代醇的含氟聚合物：具有以下结构的-C（R f）（R f'）OH其中R f和R f'为相同或不同的具有1至约10个碳原子的氟代烷基或一起为（CF 2） n其中n为2至10; （d）全氟-2,2-二甲基-1,3-二氧杂环戊烯或CX2 = CY2的无定形乙烯基均聚物，其中X为-F或-CF 3且Y为H，或全氟-2,2-二甲基-1,3-二氧杂环戊烯的无定形乙烯基共聚物，二甲基-1,3-二氧杂环戊烯和CX2 = CY2; （e）由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; 及其混合物。

7. 发明公开

EP1542659A4 PROCESS FOR COATING A PHARMACEUTICAL PARTICLE 审中-公开
标题翻译：法涂层的药物粒子
公开(公告)号：EP1542659A4
公开(公告)日：2008-03-26
申请号：EP03788623
申请日：2003-08-14
申请人： DU PONT
发明人： BERGER LARRY L , GANGRADE NUTAN , ZHAO QIAN QUI , DALZIEL SEAN MARK , SCHURR GEORGE A , FRIEDMAN THOMAS , TROUT TORENCE JOHN JR
IPC分类号： A61K9/20 , A61K9/48 , A61K9/50 , B01J2/00 , B05D7/00 , A61K9/14 , A61K9/16
CPC分类号： A61K9/2081 , A61K9/4866 , A61K9/5026 , A61K9/5047 , B01J2/006

8. 发明专利

AU2566602A Antireflective layer for use in microlithography 未知
公开(公告)号：AU2566602A
公开(公告)日：2002-06-11
申请号：AU2566602
申请日：2001-11-21
申请人： DU PONT
发明人： BERGER LARRY L , CRAWFORD MICHAEL KARL , FRENCH ROGER HARQUAIL , WHELAND ROBERT CLAYTON , ZUMSTEG FREDERICK CLAUS JR
IPC分类号： G03F7/11 , G03F7/004 , G03F7/09 , H01L21/027
摘要： An element having a support, and at least an antireflective layer; wherein the antireflective layer is prepared from a composition having a polymer selected from the group consisting of (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure:-C(Rf)(Rf')OHwherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro-2,2-dimethyl-1,3-dioxole or CX2=CY2, where X is -F, or -CF3 and Y is H, or amorphous vinyl copolymers of perfluoro-2,2-dimethyl-1,3-dioxole and CX2=CY2; (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and mixtures thereof.

9. 发明专利

AU4148902A Polymers blends and their use in photoresist compositions for microlithography 未知
公开(公告)号：AU4148902A
公开(公告)日：2002-06-11
申请号：AU4148902
申请日：2001-11-21
申请人： DU PONT
发明人： BERGER LARRY L , SCHADT FRANK L III
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
摘要： A photoresist composition having (A) at least two polymers selected from the group consisting of: (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: -C(Rf)(Rf')OH wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10;(d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole or CX2-CY2 where X=F or CF3 and Y=H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX2-CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and (B) at least one photoactive component.

10. 发明专利

AU2002241489A1 Polymers blends and their use in photoresist compositions for microlithography 未知
公开(公告)号：AU2002241489A1
公开(公告)日：2002-06-11
申请号：AU2002241489
申请日：2001-11-21
申请人： DU PONT
发明人： BERGER LARRY L , SCHADT FRANK L III
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
摘要： A photoresist composition having (A) at least two polymers selected from the group consisting of: (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: -C(Rf)(Rf')OH wherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10;(d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole or CX2-CY2 where X=F or CF3 and Y=H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX2-CY2; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and (B) at least one photoactive component.

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