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1. 发明申请

WO2009062013A3 SOLVENT STRIPPING PROCESS ULTILIZING AN ANTIOXIDANT 审中-公开
标题翻译：溶剂剥离方法使抗氧化剂达到最大化
公开(公告)号：WO2009062013A3
公开(公告)日：2009-07-16
申请号：PCT/US2008082764
申请日：2008-11-07
申请人： DU PONT , ARORA PANKAJ , SIDDIQUI JUNAID AHMED , FRISK SIMON , KIM YOUNG H
发明人： ARORA PANKAJ , SIDDIQUI JUNAID AHMED , FRISK SIMON , KIM YOUNG H
IPC分类号： D01F1/10 , D01F6/60 , D01F13/04 , D06B15/09
CPC分类号： D01F1/10 , D01D5/0038 , D01F6/60 , D01F13/04 , Y02P70/629
摘要： The invention is an improved process for stripping chemically bonded spinning solvent from a solution-spun nonwoven web by adding antioxidant to the fiber-forming polymer, and transporting the nonwoven web through a solvent stripping zone at a temperature and for a time sufficient to reduce the solvent concentration of the fibers to less than about 1000 ppmw.
摘要翻译：本发明是一种改进的方法，用于通过向成纤聚合物中加入抗氧化剂，从溶液纺丝的非织造纤维网中剥离化学键合的纺丝溶剂，并将该非织造纤维网通过溶剂汽提区在足以减少纤维的溶剂浓度小于约1000ppmw。

2. 发明申请

WO2005077032A2 UV RADIATION BLOCKING PROTECTIVE LAYERS COMPATIBLE WITH THICK FILM PASTES 审中-公开
标题翻译：紫外线辐射阻挡保护层与厚膜相容
公开(公告)号：WO2005077032A2
公开(公告)日：2005-08-25
申请号：PCT/US2005003982
申请日：2005-02-04
申请人： DU PONT , KIM YOUNG H , XU GANN
发明人： KIM YOUNG H , XU GANN
IPC分类号： G03C1/492 , G03F7/00 , G03F7/004 , G03F7/039 , G03F7/09 , G03F7/20 , G03F7/40
CPC分类号： G03F7/039 , G03F7/002 , G03F7/0035 , G03F7/0045 , G03F7/0392 , G03F7/091 , G03F7/2022 , G03F7/40
摘要： This invention relates to novel compositions comprising a protective polymer layer and a UV blocking agent. This is used in the fabrication of electronic devices using thick film pastes. The present invention is also an electronic device fabrication process using the compostionss. The protective polymer layer is fabricated from materials, which are insoluble after irradiation in the ester-type solvents contained in the thick film paste. By appropriate selection of protective film polymers, the protective film can be compatible with the thick film paste and can be further used to shield portions of the thick film paste from UV irradiation.
摘要翻译：本发明涉及包含保护性聚合物层和UV阻断剂的新型组合物。这用于使用厚膜浆料的电子器件的制造。本发明也是使用这些组合物的电子器件制造方法。保护性聚合物层由在厚膜糊剂中所含的酯型溶剂中照射后不溶解的材料制成。通过适当选择保护膜聚合物，保护膜可以与厚膜糊相容，并且可以进一步用于屏蔽厚膜糊的部分以免紫外线照射。

3. 发明申请

WO2004047166A3 PROCESS FOR USING PROTECTIVE LAYERS IN THE FABRICATION OF ELECTRONIC DEVICES 审中-公开
标题翻译：在电子设备制造中使用保护层的方法
公开(公告)号：WO2004047166A3
公开(公告)日：2004-07-15
申请号：PCT/US0336542
申请日：2003-11-14
申请人： DU PONT , KIM YOUNG H
发明人： KIM YOUNG H
IPC分类号： G03F7/00 , G03F7/004 , G03F7/039 , G03F7/11 , H01L23/00
CPC分类号： C09D133/14 , G03F7/0035 , G03F7/0047 , G03F7/0392 , G03F7/11
摘要： This invention relates to novel processes comprising a protective polymer layer in the fabrication of electronic devices using thick film pastes. The protective polymer layer is fabricated from materials which are insoluble after irradiation in the ester-type solvents contained in the thick film paste. By appropriate selection of protective film polymers, the protective film can be compatible with the thick film paste.
摘要翻译：本发明涉及在使用厚膜浆料的电子器件的制造中包含保护性聚合物层的新方法。保护性聚合物层由在厚膜糊剂中所含的酯型溶剂中照射后不溶解的材料制成。通过适当选择保护膜聚合物，保护膜可与厚膜糊兼容。

4. 发明申请

WO2005116761A3 UV RADIATION BLOCKING PROTECTIVE LAYERS COMPATIBLE WITH THICK FILM PASTES 审中-公开
标题翻译：紫外线辐射阻挡保护层与厚膜相容
公开(公告)号：WO2005116761A3
公开(公告)日：2006-02-23
申请号：PCT/US2005018971
申请日：2005-05-27
申请人： DU PONT , KIM YOUNG H
发明人： KIM YOUNG H
IPC分类号： G03F7/09 , G03F7/00 , G03F7/039
CPC分类号： G03F7/091 , G03F7/0392
摘要： This invention relates to compositions comprising a photoresist material and a UV-B blocking agent. These compositions are used in the fabrication of electronic devices, particularly those formed from thick film pastes. The present invention is also an electronic device fabrication process using the compositions. A protective polymer layer is fabricated from materials that are insoluble after irradiation in the ester-type solvents contained in a thick film paste. By appropriate selection of protective film polymers, the protective film can be used to photo-image a pattern with an unfiltered mercury lamp radiation source.
摘要翻译：本发明涉及包含光致抗蚀剂材料和UV-B封闭剂的组合物。这些组合物用于制造电子装置，特别是由厚膜浆料形成的装置。本发明也是使用该组合物的电子器件制造方法。保护性聚合物层由在厚膜糊剂中所含的酯型溶剂中照射后不溶解的材料制成。通过适当选择保护膜聚合物，保护膜可用于对未过滤的汞灯辐射源进行图像成像。

5. 发明申请

WO2004053593A3 POSITIVE IMAGEABLE THICK FILM COMPOSITIONS 审中-公开
标题翻译：正性可成像的厚膜组合物
公开(公告)号：WO2004053593A3
公开(公告)日：2004-10-28
申请号：PCT/US0338810
申请日：2003-12-05
申请人： DU PONT , ROACH DAVID HERBERT , KIM YOUNG H , CHENG LAP-TAK ANDREW
发明人： ROACH DAVID HERBERT , KIM YOUNG H , CHENG LAP-TAK ANDREW
IPC分类号： G03F7/004 , G03F7/023 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0047 , G03F7/023
摘要： This invention provides compositions that can be used as positive imageable photoresists. These compositions include positive imageable photopolymer systems and particulate materials. These compositions can be used in thick film and other processes to make films and patterned structures that are useful in producing electronic devices.
摘要翻译：本发明提供可用作正性可成像光致抗蚀剂的组合物。这些组合物包括可成像的光聚合物体系和颗粒材料。这些组合物可用于厚膜和其他工艺中以制造用于制造电子器件的薄膜和图案化结构。

6. 发明申请

WO2006099380A3 PHOTOIMAGEABLE, THERMOSETTABLE FLUORINATED RESISTS 审中-公开
标题翻译：可光热释放的氟化物电阻
公开(公告)号：WO2006099380A3
公开(公告)日：2007-12-13
申请号：PCT/US2006009050
申请日：2006-03-11
申请人： DU PONT , KIM YOUNG H
发明人： KIM YOUNG H
IPC分类号： G03F7/004 , C08F214/18 , C08F214/26 , C08F232/08 , G03F7/00 , G03F7/038 , G03F7/039 , G03F7/095
CPC分类号： G03F7/0046 , C08F214/186 , C08F220/18 , C08F220/32 , C08F232/08 , G03F7/0007 , G03F7/038 , G03F7/0382 , G03F7/0392 , G03F7/0395 , G03F7/095
摘要： The present invention provides fluorinated, thermosettable compositions that are photoimageable and which function as low dielectric materials. Such low dielectric materials are useful as passivation resist layers in liquid crystal displays, electroluminescent displays, light emitting diodes and semiconductor manufacture.
摘要翻译：本发明提供可光成像并且用作低电介质材料的氟化的可热固组合物。这种低介电材料可用作液晶显示器，电致发光显示器，发光二极管和半导体制造中的钝化抗蚀剂层。

7. 发明专利

CA1320308C METHOD FOR MAKING POLYAMIDE ANION SOLUTIONS 未知
公开(公告)号：CA1320308C
公开(公告)日：1993-07-13
申请号：CA588124
申请日：1989-01-12
申请人： KIM YOUNG H
发明人： KIM YOUNG H
IPC分类号： C08G69/48
摘要： TITLE CR-8581 METHOD FOR MAKING POLYAMIDE ANION SOLUTIONS abstract of the Disclosure Deprotonation of polyamides employing alkoxide and/or alkali amide bases in solution in a liquid sulfoxide, the solutions being useful to make N-alkylated and N-acylated derivatives and to fabricate polyamide films, fibers, coatings, manufactured articles, and the like.

8. 发明申请

WO2006093973A2 BIOMARKERS OF VULNERABLE A THEROSCLEROTIC PLAQUES AND METHODS OF USE 审中-公开
标题翻译：易爆炸药物的生物标志物及其使用方法
公开(公告)号：WO2006093973A2
公开(公告)日：2006-09-08
申请号：PCT/US2006007111
申请日：2006-02-28
申请人： UNIV MASSACHUSETTS , KIM YOUNG H , KIM DUCKSOO , RUSCKOWSKI NANCY
发明人： KIM YOUNG H , KIM DUCKSOO , RUSCKOWSKI NANCY
CPC分类号： C07K14/47 , C07K7/08 , C07K14/001 , G01N33/573 , G01N33/57484 , G01N2333/908
摘要： The present invention provides compositions suitable for use as biomarkers of vulnerable plaques as well as methods for the use of such compositions. In preferred embodiments, specific molecular imaging agents are provided that permit the selective identification of vulnerable plaques in coronary and other arteries using non- invasive imaging methods. Such specific molecular imaging agents comprise a binding partner linked to a detectable label that can be used in vivo to visualize vulnerable plaques. In certain preferred embodiments, the binding partner is a peptide that binds selectively to a component of a vulnerable plaque. In other preferred embodiments, the binding partner is an antibody that binds selectively to a component of a vulnerable plaque. In other preferred embodiments, the binding partner is a portion of a polypeptide displayed by a bacteriophage that binds selectively to a component of a vulnerable plaque. In preferred embodiments, the component of a vulnerable plaque is myeloperoxidase or a portion thereof.
摘要翻译：本发明提供适合用作脆弱斑块生物标志物的组合物以及使用这种组合物的方法。在优选的实施方案中，提供允许使用非侵入性成像方法在冠状动脉和其它动脉中选择性鉴定易受伤害的斑块的特定分子显像剂。这样的特异性分子显像剂包含与可检测标记连接的结合配偶体，其可以在体内用于显现易受侵袭的斑块。在某些优选的实施方案中，结合配偶体是选择性地结合易损斑块的组分的肽。在其它优选的实施方案中，结合配偶体是选择性结合易损斑块组分的抗体。在其它优选实施方案中，结合配偶体是通过噬菌体展示的多肽展示的部分，所述噬菌体选择性地结合易损斑块的成分。在优选的实施方案中，脆性斑块的组分是髓过氧化物酶或其一部分。

9. 发明公开

EP1714189A4 UV RADIATION BLOCKING PROTECTIVE LAYERS COMPATIBLE WITH THICK FILM PASTES 审中-公开
标题翻译： UV辐射阻断与厚膜浆料相容保护层
公开(公告)号：EP1714189A4
公开(公告)日：2009-10-28
申请号：EP05722831
申请日：2005-02-04
申请人： DU PONT
发明人： KIM YOUNG H , XU GANN
IPC分类号： G03C1/492 , G03F7/00 , G03F7/004 , G03F7/039 , G03F7/09 , G03F7/20 , G03F7/40
CPC分类号： G03F7/039 , G03F7/002 , G03F7/0035 , G03F7/0045 , G03F7/0392 , G03F7/091 , G03F7/2022 , G03F7/40

10. 发明专利

AU2003293441A8 Positive imageable thick film compositions 未知
公开(公告)号：AU2003293441A8
公开(公告)日：2004-06-30
申请号：AU2003293441
申请日：2003-12-05
申请人： DU PONT
发明人： CHENG LAP-TAK ANDREW , ROACH DAVID HERBERT , KIM YOUNG H
IPC分类号： G03F7/004 , G03F7/023 , G03F7/039
摘要： This invention provides compositions that can be used as positive imageable photoresists. These compositions include positive imageable photopolymer systems and particulate materials. These compositions can be used in thick film and other processes to make films and patterned structures that are useful in producing electronic devices.

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