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1. 发明申请

WO2005022900A2 INFRARED CAMERA SYSTEM 审中-公开
标题翻译：红外摄像机系统
公开(公告)号：WO2005022900A2
公开(公告)日：2005-03-10
申请号：PCT/US2004/027551
申请日：2004-08-25
申请人： AEGIS SEMICONDUCTOR, INC. , WAGNER, Matthias , WU, Ming , NEMCHUK, Nikolay , COOK, Julie , DEVITO, Richard , MURANO, Robert , DOMASH, Lawrence
发明人： WAGNER, Matthias , WU, Ming , NEMCHUK, Nikolay , COOK, Julie , DEVITO, Richard , MURANO, Robert , DOMASH, Lawrence
IPC分类号： H04N5/00
CPC分类号： G01J5/60 , G02B5/201 , G02B5/208 , G02B5/281 , G02B23/12 , G02F1/0147 , G02F2/02 , H04N5/33
摘要： An IR camera system includes an array of thermally-tunable optical filter pixels, an NIR source and an NIR detector array. The IR camera system further includes IR optics for directing IR radiation from a scene to be imaged onto the array of thermallytunable optical filter pixels and NIR optics for directing NIR light from the NIR source, to the filter pixels and to the NIR detector arrays. The NIR source directs NIR light onto the array of thermally-tunable optical filter pixels. The NIR detector array receives NIR light modified by the array of thermally-tunable optical filter pixels and for produces an electrical signal corresponding to the NIR light the NIR detector array receives.
摘要翻译： IR摄像机系统包括热可调光学滤光器像素阵列，NIR光源和NIR探测器阵列。红外相机系统还包括IR光学器件，用于将来自要成像的场景的IR辐射引导到热能滤光器像素阵列和NIR光学器件上，用于将来自NIR源的NIR光引导到滤光片像素和NIR检测器阵列。 NIR光源将NIR光引导到热可调光学滤光器像素阵列上。近红外探测器阵列接收由热可调光学滤光器像素阵列修改的NIR光，并产生对应于NIR探测器阵列所接收的NIR光的电信号。

2. 发明申请

WO2021188754A8 DEPOSITION SYSTEM WITH INTEGRATED COOLING ON A ROTATING DRUM 审中-公开
公开(公告)号：WO2021188754A8
公开(公告)日：2021-09-23
申请号：PCT/US2021/022882
申请日：2021-03-18
申请人： DEVITO, Richard
发明人： DEVITO, Richard
IPC分类号： C23C14/00 , C23C14/50 , C23C14/54 , C23C14/56 , C03C17/245 , C03C2217/21 , C03C2218/156 , C23C14/0068 , C23C14/0078 , C23C14/505 , C23C14/541 , C23C14/564
摘要： In one aspect, a system for depositing a film on a substrate is disclosed, which comprises at least one metallization source for generating metal atoms, and at least one reactive source for generating at least one reactive species. The system further includes an inner cooling cylinder and a substrate cylinder, where the inner cooling cylinder is fixedly positioned relative to the substrate cylinder, and the substrate cylinder at least partially surrounds the inner cooling cylinder. At least one mount is coupled to the substrate cylinder for mounting one or more substrates to the substrate cylinder.

3. 发明申请

WO2007075435A3 APPARATUS FOR REACTIVE SPUTTERING 审中-公开
公开(公告)号：WO2007075435A3
公开(公告)日：2007-07-05
申请号：PCT/US2006/047945
申请日：2006-12-14
申请人： FLUENS CORPORATION , DEVITO, Richard , KLEIN, Martin , SFERLAZZO, Piero
发明人： DEVITO, Richard , KLEIN, Martin , SFERLAZZO, Piero
IPC分类号： C23C14/00 , C23C14/32
摘要： A reactive sputtering system includes a vacuum chamber and a reactive ion source that is positioned inside the vacuum chamber. The reactive ion source generates a reactive ion beam from a reactant gas. A sputtering chamber is positioned in the vacuum chamber. The sputtering chamber includes a sputter source having a sputtering target that generates sputtering flux, walls that contain an inert gas, and a seal that impedes the reactant gas from entering into the sputtering chamber and that impedes inert gas and sputtered material from escaping into the vacuum chamber. A transport mechanism transports a substrate under the reactive ion source and through the sputtering chamber. The substrate is exposed to the reactive ion beam while passing under the reactive ion source and then is exposed to sputtering flux while passing through the sputtering chamber.

4. 发明申请

WO2021188754A1 DEPOSITION SYSTEM WITH INTEGRATED COOLING ON A ROTATING DRUM 审中-公开
公开(公告)号：WO2021188754A1
公开(公告)日：2021-09-23
申请号：PCT/US2021/022882
申请日：2021-03-18
申请人： DEVITO, Richard
发明人： DEVITO, Richard
IPC分类号： C23C14/00 , C23C14/50 , C23C14/54 , C23C14/56 , C03C17/245
摘要： In one aspect, a system for depositing a film on a substrate is disclosed, which comprises at least one metallization source for generating metal atoms, and at least one reactive source for generating at least one reactive species. The system further includes an inner cooling cylinder and a substrate cylinder, where the inner cooling cylinder is fixedly positioned relative to the substrate cylinder, and the substrate cylinder at least partially surrounds the inner cooling cylinder. At least one mount is coupled to the substrate cylinder for mounting one or more substrates to the substrate cylinder.

5. 发明申请

WO2017070488A1 DEPOSITION SYSTEM WITH INTEGRATED COOLING ON A ROTATING DRUM 审中-公开
标题翻译：在旋转鼓上集成冷却的沉积系统
公开(公告)号：WO2017070488A1
公开(公告)日：2017-04-27
申请号：PCT/US2016/058147
申请日：2016-10-21
申请人： DEVITO, Richard
发明人： DEVITO, Richard
IPC分类号： C23C14/00 , C23C14/54
CPC分类号： H01J37/32458 , C23C14/0047 , C23C14/0063 , C23C14/0078 , C23C14/12 , C23C14/14 , C23C14/50 , C23C14/541 , H01J37/321 , H01J37/32192 , H01J37/32733 , H01J37/3405 , H01J2237/20214 , H01J2237/3321
摘要： In one aspect, a system of depositing a film on a substrate is disclosed, which includes at least one metallization source for generating metal atoms, and at least one reactive source for generating at least one reactive ionic species. The system further includes a pair of inner and outer concentric cylinders, where the outer cylinder has first and second openings positioned relative to the metallization source and the reactive source to allow entry of the metal atoms and the reactive ionic species into a metallization region and a reaction region, respectively, between the two cylinders. At least one mount is coupled to the inner cylinder for mounting the substrate thereto such that said substrate is in radiative thermal communication with the inner surface of the outer cylinder, said inner cylinder being rotatable for moving the substrate between the two regions so as to expose the substrate alternatingly to said metal atoms and said reactive ionic species. Further, the outer cylinder includes at least one cooling channel through which a cooling fluid can flow for maintaining the inner surface of the outer cylinder at a temperature suitable for radiative cooling of the substrate.
摘要翻译：在一个方面，公开了一种在基底上沉积膜的系统，其包括至少一个用于产生金属原子的金属化源和至少一个用于产生至少一种反应性离子物质。该系统还包括一对内部和外部同心圆柱体，其中外部圆柱体具有相对于金属化源和反应性源设置的第一和第二开口，以允许金属原子和反应性离子物质进入金属化区域和反应区域，分别在两个气缸之间。至少一个安装件联接到内圆筒上，用于将衬底安装到其上，使得所述衬底与外圆筒的内表面进行辐射热连通，所述内圆筒可旋转以便在两个区域之间移动衬底以便曝光衬底交替地与所述金属原子和所述反应性离子物质反应。此外，外圆筒包括至少一个冷却通道，冷却流体可通过该冷却通道流动，以将外圆筒的内表面保持在适合于衬底的辐射冷却的温度。

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