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1. 发明申请

WO2005071134A1 METHOD AND APPARATUS FOR MONITORING OPTICAL CHARACTERISTICS OF THIN FILMS IN A DEPOSITION PROCESS 审中-公开
标题翻译：用于监测沉积过程中薄膜光学特性的方法和装置
公开(公告)号：WO2005071134A1
公开(公告)日：2005-08-04
申请号：PCT/US2005/001666
申请日：2005-01-18
申请人： DEPOSITION SCIENCES, INC. , STERNBERGH, James , KRISL, Eric, M. , BOLING, Norm
发明人： STERNBERGH, James , KRISL, Eric, M. , BOLING, Norm
IPC分类号： C23C14/34
CPC分类号： H01J37/32935 , C23C14/547 , G01B11/0625 , G01B11/0683
摘要： The present invention is directed to methods and apparatus for optically monitoring selected optical characteristics of coatings formed on substrates (72) during the deposition process and controlling the deposition process responsive thereto. In one aspect, the system includes substrate carrier (70), monitoring station (71), detector (76), a retroreflector (50) for reflecting an electromagnetic beam (75) transmitted by the coating and substrate back through the substrate and coating before selected properties of the retroreflected beam are measured. The system and method improve signal to noise properties of the measured beam. The present invention may be used in systems for coating one or an array of substrates, and is particularly suitable for deposition processes where the substrates are translated past the sources (74) of material to be deposited, and wherein the angle of the incidence of a monitor beam on the substrate changes as the substrate translates past the beam source.
摘要翻译：本发明涉及用于光学监测在沉积工艺期间在衬底（72）上形成的涂层的选择的光学特性的方法和装置，并且响应于此控制沉积工艺。在一个方面，该系统包括基板载体（70），监测站（71），检测器（76），后向反射器（50），用于将由涂层和基板传送的电磁束（75）反射回基板并在之前涂覆测量回射光束的选定性质。该系统和方法提高测量光束的信噪比。本发明可以用于涂覆一个或一组衬底的系统中，并且特别适用于沉积工艺，其中衬底被平移通过待沉积材料的源（74），并且其中发射角衬底上的监测光束随着衬底转过光束源而变化。

2. 发明授权

EP1711645B1 METHOD AND APPARATUS FOR MONITORING OPTICAL CHARACTERISTICS OF THIN FILMS IN A DEPOSITION PROCESS 有权
标题翻译：方法和设备的薄膜光学特性的分离方法控制
公开(公告)号：EP1711645B1
公开(公告)日：2013-12-25
申请号：EP05722465.1
申请日：2005-01-18
申请人： DEPOSITION SCIENCES, INC.
发明人： STERNBERGH, James , KRISL, Eric, M. , BOLING, Norm
IPC分类号： C23C14/34 , G01N33/00 , B05C11/00
CPC分类号： H01J37/32935 , C23C14/547 , G01B11/0625 , G01B11/0683

3. 发明公开

EP1711645A1 METHOD AND APPARATUS FOR MONITORING OPTICAL CHARACTERISTICS OF THIN FILMS IN A DEPOSITION PROCESS 有权
标题翻译：方法和设备的薄膜光学特性的分离方法控制
公开(公告)号：EP1711645A1
公开(公告)日：2006-10-18
申请号：EP05722465.1
申请日：2005-01-18
申请人： DEPOSITION SCIENCES, INC.
发明人： STERNBERGH, James , KRISL, Eric, M. , BOLING, Norm
IPC分类号： C23C14/34 , G01N33/00 , B05C11/00
CPC分类号： H01J37/32935 , C23C14/547 , G01B11/0625 , G01B11/0683
摘要： The present invention is directed to methods and apparatus for optically monitoring selected optical characteristics of coatings formed on substrates (72) during the deposition process and controlling the deposition process responsive thereto. In one aspect, the system includes substrate carrier (70), monitoring station (71), detector (76), a retroreflector (50) for reflecting an electromagnetic beam (75) transmitted by the coating and substrate back through the substrate and coating before selected properties of the retroreflected beam are measured. The system and method improve signal to noise properties of the measured beam. The present invention may be used in systems for coating one or an array of substrates, and is particularly suitable for deposition processes where the substrates are translated past the sources (74) of material to be deposited, and wherein the angle of the incidence of a monitor beam on the substrate changes as the substrate translates past the beam source.

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