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1. 发明专利

JP2002249682A CURING TYPE COLORING COMPOSITION FOR INK JET RECORDING AND COLOR FILTER 失效
公开(公告)号：JP2002249682A
公开(公告)日：2002-09-06
申请号：JP2001046497
申请日：2001-02-22
申请人： DAINIPPON INK & CHEMICALS
发明人： KOBAYASHI NOBUO , TOKUDA HIROYUKI , ISHIKAWA HIDENORI
IPC分类号： G02B5/20 , B41M5/00 , C09D11/00 , C09D11/322 , C09D11/324 , C09D11/328 , C09D11/38
摘要： PROBLEM TO BE SOLVED: To provide a curing type coloring composition for ink jet recording which has an extremely good stability during its production process and whose coating film obtained by an ink jet method is highly practical due to the excel lence in transparency, heat resistance and chemical resistance, especially due to the excellent heat resistance, and to provide a color filter using the same. SOLUTION: The curing type coloring composition for ink jet recording uses a resin including carboxysilane group and epoxy group as a binder resin, and the color filter using the same is provided.

2. 发明专利

JP2002249681A CURING TYPE COLORING COMPOSITION FOR INK JET RECORDING AND COLOR FILTER 失效
公开(公告)号：JP2002249681A
公开(公告)日：2002-09-06
申请号：JP2001046496
申请日：2001-02-22
申请人： DAINIPPON INK & CHEMICALS
发明人： KOBAYASHI NOBUO , TOKUDA HIROYUKI , ISHIKAWA HIDENORI
IPC分类号： B41J2/01 , B41M5/00 , C09D11/00 , C09D11/322 , C09D11/38 , G02B5/20
摘要： PROBLEM TO BE SOLVED: To obtain a curing type coloring composition for ink jet recording which has an extremely good stability during its production process and during preservation and whose coating film obtained by an ink jet method is highly practical due to the excellent transparency and heat resistance, and to provide a color filter using the same. SOLUTION: The curing type coloring composition for ink jet recording has a good stability during the production process and during the preservation by using a resin with 1,3-dioxolane group and carboxyl group as a binder resin and the coating film obtained therefrom produces the color filter with excellent heat resistance, chemical resistance, and transparency.

3. 发明专利

JP2002173518A METHOD FOR MANUFACTURING ACTINIC RAY-CURABLE RESIN AND ACTINIC RAY-CURABLE RESIN COMPOSITION 审中-公开
公开(公告)号：JP2002173518A
公开(公告)日：2002-06-21
申请号：JP2001281040
申请日：2001-09-17
申请人： DAINIPPON INK & CHEMICALS
发明人： ICHINOSE EIJU , YAMASHINA YOZO , ISHIKAWA HIDENORI
IPC分类号： C08G59/17 , C08G59/58 , C08G59/68
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing an actinic ray-curable resin capable of producing the resin with a reduced amount of a halogen catalyst or the like, or even with a non-halogen catalyst, and capable of producing the resin suitable for a resist, excellent in basic properties and having widely improved properties such as tenacity, and to provide an actinic ray-curable resin composition. SOLUTION: The method for manufacturing an actinic ray-curable resin comprises reacting a hydroxy-containing modified epoxyacrylate compound (A) with an acid anhydride (B). The compound (A) is obtained by reacting a bifunctional epoxy resin (a1), a monocarboxylic acid (a2) having a (meth) acryloyl group and a dicarboxylic acid (a3) including a dicarboxylic acid having a (meth)acryloyl group with each other at specific ratios in the presence of a catalyst. Further, a resin composition containing the actinic ray-curable resin (I) and an epoxy compound (II).

4. 发明专利

JP2001264976A FLAME-RETARDANT ENERGY BEAM-CURABLE RESIN COMPOSITION FOR RESIST AND RESIST COMPOSITION 失效
公开(公告)号：JP2001264976A
公开(公告)日：2001-09-28
申请号：JP2000072131
申请日：2000-03-15
申请人： DAINIPPON INK & CHEMICALS
发明人： SEKIGUCHI HISAFUMI , ICHINOSE EIJU , ISHIKAWA HIDENORI
IPC分类号： G03F7/027 , C08F2/46 , C08F30/02 , C08F299/02 , C08G59/42 , G03F7/004
摘要： PROBLEM TO BE SOLVED: To provide an energy beam-curable resin composition of a resist excellent in flame retarding performance without using a halogen-containing flame retarder. SOLUTION: The flame-retardant energy beam-curable resin composition contains a compound containing an ethylenic double bond, a phosphorus atom and a carboxyl group in one molecule and is obtained by reacting a compound having an ethylenically unsaturated double bond and a carboxyl group in one molecule with a phosphorus compound containing a functional group having reactivity with the ehylenically unsaturated double bond of the above compound.

5. 发明专利

JP2001081153A THERMOSETTING RESIN COMPOSITION 失效
公开(公告)号：JP2001081153A
公开(公告)日：2001-03-27
申请号：JP25717399
申请日：1999-09-10
申请人： DAINIPPON INK & CHEMICALS
发明人： SEIKE NAOYUKI , KONNO EIJU , ISHIKAWA HIDENORI
IPC分类号： C08G18/58 , C08G18/80 , C09D175/04
摘要： PROBLEM TO BE SOLVED: To obtain a thermosetting resin composition useful as a protection membrane or the like for a liquid crystal display equipment, a color filter for photograph element or the like by compounding a polymer containing blocked carboxyl groups and glycidyl groups, and a block isocyanate compound. SOLUTION: This thermosetting resin composition comprises (A) a polymer containing blocked carboxyl groups (e.g. carboxysilane groups) and glycidyl groups, for example, a polymer obtained by copolymerizing an ethylenic unsaturated compound having a blocked carboxyl group and an ethylenic unsaturated monomer having a glycidyl group, (B) a block isocyanate compound and preferably (C) a coupling agent (e.g. γ-mercaptopropyltrimethoxysilane). In the above composition, the component B and the component C are compounded preferably in an amount of 0.1-50 pts.wt. and I an amount of 0.1-30 pts.wt., respectively, based on 100 pts.wt. of the component A.

6. 发明专利

JPH10175979A EPOXY COMPOUND AND POLYMERIZABLE COMPOSITION CONTAINING THE SAME 失效
公开(公告)号：JPH10175979A
公开(公告)日：1998-06-30
申请号：JP33961596
申请日：1996-12-19
申请人： DAINIPPON INK & CHEMICALS
发明人： RI SHIYOUTAKU , HAYASHI MASANAO , ISHIKAWA HIDENORI
IPC分类号： C07D493/04 , C08G59/02
摘要： PROBLEM TO BE SOLVED: To obtain a new epoxy compound highly curable by a catalyst capable of cationic polymerization, and useful for coating materials, inks, adhesives, optical materials, etc. SOLUTION: This new epoxy compound is shown by formula I (R1 to R4 are each H or an alkyl, at least one of them being an alkyl), e.g. a compound of formula II. The compound of formula I is obtained, for example, by epoxidizing a methylcyclopentadiene dimer using a catalyst such as hydrogen peroxide.

7. 发明专利

JPH10130368A THERMOSETTING RESIN COMPOSITION 失效
公开(公告)号：JPH10130368A
公开(公告)日：1998-05-19
申请号：JP28384396
申请日：1996-10-25
申请人： DAINIPPON INK & CHEMICALS
发明人： KONNO EIJU , SEIKE NAOYUKI , ISHIKAWA HIDENORI
IPC分类号： C08K5/54 , C08G59/20 , C08G59/42 , C08K5/541 , C08L63/00 , G02B5/20
摘要： PROBLEM TO BE SOLVED: To obtain the subject new composition capable of readily providing a cured coated firm excellent in storage stability, coating performance, luster, adhesiveness to substrate, sputtering resistance, etc., by using a polymer comprising a specific epoxy-containing monomer as a polymerization component. SOLUTION: This composition comprises (A) a polymer composed of a monomer (e.g. acrylic acid 3,4-epoxycyclohexyl) containing a polymerizable unsaturated double bond and an alicyclic epoxy group and (B) a compound (preferably an aromatic polyfunctional carboxylic acid anhydride) selected from a polyfunctional carboxylic acid and its anhydride. When a monomer of the formula (R1 is H or a lower alkyl; R2 is a lower alkyl; (n) is 1-5) is introduced into the component A, adhesiveness and storage stability are preferably improved. Preferably, the objective composition is further mixed with a coupling agent. An epoxy-containing silane coupling agent such as γ- glycidoxypropyltrimethoxysilane is preferable as the coupling agent. Preferably, the components are blended by a solvent blending method for dissolving the components in a solvent and mixing.

8. 发明专利

JPH05341508A 失效
公开(公告)号：JPH05341508A
公开(公告)日：1993-12-24
申请号：JP14722492
申请日：1992-06-08
申请人： DAINIPPON INK & CHEMICALS
发明人： KINOSHITA MASAYUKI , ISHIKAWA HIDENORI
IPC分类号： C08F261/04 , C08F261/00 , C08F290/00 , C08F299/02 , G03F7/021 , G03F7/027 , G03F7/032 , H01L21/027
摘要： PURPOSE:To provide an energy beam setting resin composition capable of diluting with water, redissolving an unexposing part with water, obtaining a fine image with high sensitivity and a coating film having excellent water resistance, solvent resistance and plate wear. CONSTITUTION:The photosensitive resin composition is made by mixing a water soluble compound having one or two or more unsaturated double bond, a photopolymerization initiator and furthermore a photocrosslinking agent with a partially saponified vinyl acetate polymer solution. The photosensitive resin composition is excellent in stability and various performance and capable of obtaining the fine image with high sensitivity and the coating film having excellent water resistance, solvent resistance and plate wear.

9. 发明专利

JPH05339330A 失效
公开(公告)号：JPH05339330A
公开(公告)日：1993-12-21
申请号：JP16998692
申请日：1992-06-05
申请人： DAINIPPON INK & CHEMICALS , TAIYO INK MFG CO LTD
发明人： KINOSHITA MASAYUKI , ISHIKAWA HIDENORI , SAKAKIBARA SHIGERU , SAITO TERUO , SUZUKI MORIO , SAWAZAKI KENJI
IPC分类号： C08F299/02 , C08F290/00 , C08G59/14 , C09D11/033 , C09D11/10 , C09D11/101 , C09D11/102 , C09D163/10 , G03F7/027
摘要： PURPOSE:To provide the title composition which can freely be diluted with water or an organic solvent, can form a coating film excellent in adhesion to substrate and chemical resistance, can be redissolved in water or a dilute aqueous acid solution when it is in the form of uncured film and can be suitably and extensively used for inks, coating materials, etc. CONSTITUTION:The title composition consists of an actinic-radiation-curing resin as an essential component and a photopolymerization initiator as an optional component. The above resin is prepared by reacting a compound containing an amino group containing active hydrogen atoms with part of the unsaturated bonds of a compound obtained by reacting an epoxy compound with a compound containing an epoxy-reactive group and a double bond and a compound containing a group reactive with the hydroxyl group (if present) of the epoxy compound and a double bond, and neutralizing the obtained compound with an acid.

10. 发明专利

JPH05310859A 失效
公开(公告)号：JPH05310859A
公开(公告)日：1993-11-22
申请号：JP12053092
申请日：1992-05-13
申请人： DAINIPPON INK & CHEMICALS
发明人： KINOSHITA MASAYUKI , ISHIKAWA HIDENORI
IPC分类号： C08F261/04 , C08F261/00 , C08L29/02 , C08L29/04 , G03F7/027 , G03F7/028 , G03F7/033
摘要： PURPOSE:To provide a photosensitive resin composition which can be diluted with water, can be redissolved in water when it remains unexposed, is sensitive enough to give a fine image and can give a coating film having water resistance, solvent resistance and plate wear resistance. CONSTITUTION:An aqueous solution of a partially saponified vinyl acetate polymer is mixed with a water-soluble compound containing at least one double bond and a photo-cross-linking agent and optionally a photopolymerization initiator.

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