会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明专利
    • MAGNETRON CATHODE STRUCTURE
    • JPH02205673A
    • 1990-08-15
    • JP2285289
    • 1989-01-31
    • DAIDO STEEL CO LTD
    • KANEDA YASUSHISAITO AKIHIKOYAHAGI SHINICHIRO
    • C23C14/35
    • PURPOSE:To form a strong leakage magnetic field and to guarantee high speed sputtering by embedding a soft magnetic yoke of a specified shape in a backing plate and a target. CONSTITUTION:A cylindrical center magnet 3 and an annular peripheral magnet 4 are supported on the yoke 2 to form a magnetron, and the target 1 fixed to the backing plate 5 with a low melting point solder is laid over the magnets 3 and 4. The conical yoke 6A with the diameter decreasing upward is embedded in the contact part of the backing plate 5 with the magnet 3, and an annular yoke 7A with the inner surface inclining outward in the upward direction is embedded in the contact part of the magnet 4. Furthermore, a conical yoke 6B is embedded in the target 1 in connection with the yoke 6A, and an annular yoke 7B with the inner surface inclining outward in the upward direction is embedded in the target 1 in connection with the yoke 7A. As a result, the intensity of the leakage magnetic field is increased, and the magnetic field distribution is flattened and uniformized.