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JP2013201433A Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control 审中-公开
标题翻译：多层离子注射器或分子荧光体排放激光器氟注射控制
公开(公告)号：JP2013201433A
公开(公告)日：2013-10-03
申请号：JP2013077923
申请日：2013-04-03
申请人： Cymer LLC , サイマーリミテッドライアビリティカンパニー
发明人： HERVE A BESAUCELE , WAYNE J DUNSTAN , ISHIHARA TOSHIHIKO , ROBERT N JACQUES , TRINTCHAWK FEDO B
IPC分类号： H01S3/225 , H01S3/036 , H01S3/131 , H01S3/134 , H01S3/22 , H01S3/223 , H01S3/23
CPC分类号： H01S3/036 , H01S3/225 , H01S3/2316 , H01S3/2366
摘要： PROBLEM TO BE SOLVED: To provide a multi-chambered excimer or molecular fluorine gas discharge laser system amplified in a master oscillator-power amplifier (MOPA) configuration fluorine injection controller and method.SOLUTION: An embodiment comprises a halogen gas consumption estimator, and a halogen gas injection controller. The halogen gas consumption estimator is configured to: estimate the amount of halogen gas that has been consumed in one of an oscillator chamber and an amplifier chamber on the basis of a first operating parameter of the one of the oscillator chamber and the amplifier chamber and on the basis of the difference in a second operating parameter between the oscillator chamber and the amplifier chamber; estimates the amount of halogen gas that has been consumed in the other of the oscillator chamber and the amplifier chamber on the basis of a third operating parameter of the other of the oscillator chamber and the amplifier chamber; and present the halogen gas consumption amounts. The halogen gas injection controller determines the amount of halogen gas injection for the oscillator chamber and the amplifier chamber on the basis of the output of the estimated fluorine consumption amounts from the fluorine consumption estimator and a cost function including a plurality of weighted injection decision determinations.
摘要翻译：要解决的问题：提供在主振荡器功率放大器（MOPA）配置氟注入控制器和方法中放大的多室准分子或分子氟气放电激光系统。解决方案：一个实施方案包括卤素气体消耗估计器和卤素气体注入控制器。卤素气体消耗估计器被配置为：基于振荡器室和放大器室中的一个的第一操作参数来估计已经在振荡器室和放大器室之一中消耗的卤素气体的量，并且基于振荡器室和放大器室之间的第二操作参数的差异的基础; 基于振荡器室和放大器室中的另一个的第三操作参数来估计在另一个振荡器室和放大器室中消耗的卤素气体的量; 并提供卤素气体消耗量。卤素气体注入控制器基于来自氟消耗量估计器的估计氟消耗量的输出和包括多个加权喷射判定确定的成本函数来确定振荡器室和放大器室的卤素气体注入量。

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