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1. 发明专利

JP2008137871A Apparatus and method for manufacturing synthetic silica glass 有权
标题翻译：用于制造合成二氧化硅玻璃的装置和方法
公开(公告)号：JP2008137871A
公开(公告)日：2008-06-19
申请号：JP2006328125
申请日：2006-12-05
申请人： Covalent Materials Tokuyama Corp , Toshiba Ceramics Co Ltd , コバレントマテリアル徳山株式会社 , 東芝セラミックス株式会社
发明人： YAMAKADO MAMORU , CHIJIMATSU TAKASHI , HAYAKAWA AKI , ADACHI SADAHIRO , NAKAJIMA TOSHIO , IWAI SEIJI
IPC分类号： C03B8/04 , C03B20/00
CPC分类号： C03B19/1407 , C03B19/1446
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing synthetic silica glass with which high quality synthetic silica glass can be manufactured.
SOLUTION: The apparatus for manufacturing the synthetic silica glass is equipped with: an exhaust chamber which communicates with a furnace body having a target, a burner or the like therein and is provided at a lower part of the furnace body; an exhaust flow passage provided so as to communicate with the exhaust chamber; an exhaust device provided so as to communicate with the exhaust flow passage; a pressure detection means for detecting the pressure in the exhaust chamber and atmospheric pressure; and an outside air intake mechanism which is provided in the exhaust flow passage and is capable of controlling the amount of outside air taken into the exhaust flow passage. The intake amount of outside air of the outside air intake mechanism is controlled by the differential pressure between the pressure in the exhaust chamber and atmospheric pressure, detected by the pressure detection means.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种可以制造高品质合成石英玻璃的合成石英玻璃的制造装置。＆lt; P＆gt;解决方案：合成石英玻璃的制造装置具备：排气室，其与炉体，燃烧器等连通，设置在炉体的下部; 排气流路，设置成与排气室连通; 设置成与排气流路连通的排气装置; 用于检测排气室中的压力和大气压力的压力检测装置; 以及外部进气机构，其设置在所述排气流路中，并且能够控制进入所述排气流路的外部空气量。外部空气吸入机构的外部空气的吸入量由压力检测单元检测到的排气室内的压力与大气压之间的差压来控制。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2009132551A Manufacturing apparatus of synthetic silica glass 有权
标题翻译：合成二氧化硅玻璃的制造装置
公开(公告)号：JP2009132551A
公开(公告)日：2009-06-18
申请号：JP2007309148
申请日：2007-11-29
申请人： Covalent Materials Corp , Covalent Materials Tokuyama Corp , コバレントマテリアル徳山株式会社 , コバレントマテリアル株式会社
发明人： CHIJIMATSU TAKASHI , YAMAKADO MAMORU , HAYAKAWA AKI , IWAI SEIJI , NAKAJIMA TOSHIO , IKUNO HIROTO
IPC分类号： C03B8/04 , C03B20/00
CPC分类号： C03B19/1407 , C03B19/1446 , C03B19/1484
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing apparatus of synthetic silica glass which can manufacture synthetic silica glass without containing striae and without the internal defect. SOLUTION: The manufacturing apparatus of synthetic silica glass is one that is provided with a furnace body 2, a discharge port 5a located in the furnace body 2, a discharge means 9 connected to the discharge port, a target 6 for forming an ingot and rotatably installed within the furnace body, and a burner 7 for synthesizing silica glass that is located so that the tip of it is facing to the target 6, wherein the furnace body 2 is provided with a muffle 3 made of a refractory at the top of which the burner 7 for synthesizing silica glass is installed, a first furnace part 4 located below the muffle 3 and having a diameter larger than the inner diameter of the muffle 3, and a second furnace part 5 located below the first furnace part 4 and having a diameter larger than the inner diameter of the first furnace part 4. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种合成石英玻璃的制造装置，其可以制造不含条纹并且没有内部缺陷的合成石英玻璃。解决方案：合成石英玻璃的制造装置是设置有炉体2，位于炉体2中的排出口5a，与排出口连接的排出装置9，用于形成并且可旋转地安装在炉体内，以及用于合成二氧化硅玻璃的燃烧器7，其位于使其尖端面向靶6，其中炉体2在炉体2处设置有由耐火材料制成的马弗管3 其顶部安装有用于合成石英玻璃的燃烧器7，位于马弗管3下方并且具有大于马弗管3的内径的直径的第一炉部分4和位于第一炉部分4下方的第二炉部分5 并且其直径大于第一炉部分4的内径。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2012158516A Device for producing synthetic silica glass 有权
标题翻译：生产合成硅胶玻璃的装置
公开(公告)号：JP2012158516A
公开(公告)日：2012-08-23
申请号：JP2012073599
申请日：2012-03-28
申请人： Covalent Materials Corp , Covalent Materials Tokuyama Corp , コバレントマテリアル徳山株式会社 , コバレントマテリアル株式会社
发明人： CHIJIMATSU TAKASHI , YAMAKADO MAMORU , HAYAKAWA AKI , IWAI SEIJI , NAKAJIMA TOSHIO , IKUNO HIROTO
IPC分类号： C03B8/04 , C03B20/00 , G02B1/00
CPC分类号： C03B19/1407 , C03B19/1484
摘要： PROBLEM TO BE SOLVED: To provide a device for producing synthetic silica glass, the device producible of synthetic silica glass which does not have striae and defects in its inside.SOLUTION: The device 1 for producing synthetic silica glass includes: a furnace body 2; an exhaust port 5a provided in the furnace body 2; a gas-discharging means 9 which is connected to the exhaust port; a target 6 for forming ingots which is rotatably installed inside the furnace body; and a burner 7 for synthesizing silica glass, the front end of the burner being provided opposite to the target 6. In addition, the furnace body 2 includes: a refractory-made muffle 3 on whose top part the burner 7 for synthesizing silica glass is installed; a first furnace part 4 which is provided below the muffle 3, the inner diameter of the first furnace part 4 being larger than that of the muffle 3; and a second furnace part 5 which is provided below the first furnace part 4, the inner diameter of the second furnace part 5 being larger than that of the first furnace part 4. The sidewall of the second furnace part 5 is provided with the exhaust port 5a.
摘要翻译：要解决的问题：为了提供合成石英玻璃的制造装置，可以制造合成石英玻璃的装置，其内部没有条纹和缺陷。解决方案：用于生产合成石英玻璃的装置1包括：炉体2; 设置在炉体2内的排气口5a; 与排气口连接的气体排出装置9; 用于形成锭子的靶6，其可旋转地安装在炉体内; 以及用于合成石英玻璃的燃烧器7，燃烧器的前端设置在靶6的相对侧。另外，炉体2包括：耐火材料制的马弗3，其顶部用于合成石英玻璃的燃烧器7 安装; 设置在马弗管3下方的第一炉部4，第一炉部4的内径大于马弗管3的内径; 第二炉部5设置在第一炉部4的下方，第二炉部5的内径大于第一炉部4的内径。第二炉部5的侧壁设有排气口 5A。版权所有（C）2012，JPO＆INPIT

4. 发明专利

JP2009132550A Manufacturing apparatus of synthetic silica glass, and manufacturing method of synthetic silica glass 有权
标题翻译：合成二氧化硅玻璃的制造装置及合成二氧化硅玻璃的制造方法
公开(公告)号：JP2009132550A
公开(公告)日：2009-06-18
申请号：JP2007309145
申请日：2007-11-29
申请人： Covalent Materials Corp , Covalent Materials Tokuyama Corp , コバレントマテリアル徳山株式会社 , コバレントマテリアル株式会社
发明人： CHIJIMATSU TAKASHI , YAMAKADO MAMORU , HAYAKAWA AKI , IWAI SEIJI , NAKAJIMA TOSHIO , IKUNO HIROTO
IPC分类号： C03B20/00 , C03B8/04
CPC分类号： C03B19/1446 , C03B19/1407 , C03B19/1484
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing apparatus of synthetic silica glass and a manufacturing method of synthetic silica glass which can produce synthetic silica glass without containing striae and without the internal defect.
SOLUTION: The manufacturing apparatus of synthetic silica glass is one that is provided with a closed furnace body 2, a plurality of air inlets 4a located in an upper part of the furnace body, discharge ports 5a located in a lower part of the furnace body, a target 6 for forming an ingot and rotatably installed within the furnace body, and a burner 7 for synthesizing silica glass, and further the air inlets 4a are always located in a lower position than the adhering surface of the molten silica of the ingot, and are installed in a direction such that the gas supplied from the air inlets 4a does not directly strike the ingot and diagonally downward against the horizontal direction, wherein the gas supplied from the air inlets 4a is formed as a swiveling downward flow swiveling in the same direction as the rotating direction of the target 6 for forming the ingot.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供合成石英玻璃的制造装置和合成石英玻璃的制造方法，其可以生产不含条纹并且没有内部缺陷的合成石英玻璃。解决方案：合成石英玻璃的制造装置是设置有封闭炉体2，位于炉体上部的多个空气入口4a，位于炉体下部的排出口5a 炉体，用于形成锭子并可旋转地安装在炉体内的靶材6和用于合成石英玻璃的燃烧器7，并且进一步的空气入口4a总是位于比熔融二氧化硅的熔融二氧化硅的粘合表面更低的位置并且安装在使得从空气入口4a供应的气体不直接撞击铸锭并相对于水平方向倾斜向下的方向上安装，其中从空气入口4a供应的气体形成为向下旋转的旋转向下流动与用于形成锭的靶6的旋转方向相同的方向。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2003023058A Wafer transfer apparatus 审中-公开
标题翻译：转移装置
公开(公告)号：JP2003023058A
公开(公告)日：2003-01-24
申请号：JP2001207994
申请日：2001-07-09
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： IWAI SEIJI , MIURA HIROYUKI , YOOKAICHIYA MOTOO
IPC分类号： B65G49/07 , H01L21/22 , H01L21/677 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To enhance reliability in wafer quality by preventing a crystal disloca tion from occurring at the wafer during heat treatment or the like after the wafer has been transferred. SOLUTION: A wafer transfer apparatus comprises a stage 10 arranged in the moving region of a grasping means 4 for holding and superposing a wafer holder H and a semiconductor wafer W in such a manner that the wafer W is disposed at a position separated apart above from the wafer superposing surface of the wafer W on the holder H in the wafer and the holder holding state in the superposition stage 10.
摘要翻译：要解决的问题：通过在晶片转移之后的热处理等期间防止在晶片处发生晶体错位，提高晶片质量的可靠性。解决方案：晶片传送装置包括布置在抓握装置4的移动区域中的台架10，用于保持和叠放晶片保持器H和半导体晶片W，使得晶片W布置在从晶片W的晶片叠置表面在晶片中的保持器H上，并且在叠置台10中保持器保持状态。

6. 发明专利

JP2005001897A Apparatus for bending flat plate glass 有权
标题翻译：弯曲平板玻璃的装置
公开(公告)号：JP2005001897A
公开(公告)日：2005-01-06
申请号：JP2003163721
申请日：2003-06-09
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： ENDO MASAHITO , IWAI SEIJI
IPC分类号： C03B23/023 , C03C3/06
CPC分类号： C03B23/023 , C03B23/0256
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for bending a flat plate glass which can bend a wide glass plate highly precisely into a large radius of curvature without necessitating large scaled equipment such as a heating furnace. SOLUTION: The apparatus for bending the flat plate glass has a glass sending mechanism 2 for continuously sending the flat plate glass G held at one end part Ga of the flat plate glass G, a heating apparatus 3 provided throughout the whole length in the width direction of the flat plate glass G sent from the glass sending mechanism 2 and for heating the flat plate glass G uniformly in the width direction, a supporting member 4 provided between the heating apparatus 3 and a glass sending mechanism 2 and for supporting the glass plate G, a chuck mechanism 5 for holding another end part of the glass plate G and a rotating mechanism 6 for rotating the chuck mechanism 5. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于弯曲平板玻璃的装置，其可以将玻璃板高度精确地弯曲成大的曲率半径，而不需要诸如加热炉的大型设备。解决方案：用于弯曲平板玻璃的设备具有用于连续地发送保持在平板玻璃G的一个端部Ga处的平板玻璃G的玻璃送出机构2，整个长度设置的加热装置3 从玻璃送出机构2送出的平板玻璃G的宽度方向和宽度方向均匀地加热平板玻璃G的宽度方向;设置在加热装置3和玻璃送出机构2之间的支撑部件4，玻璃板G，用于保持玻璃板G的另一端部的卡盘机构5和用于使卡盘机构5旋转的旋转机构6.版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2004257876A Visualizing method for airborne particles 审中-公开
公开(公告)号：JP2004257876A
公开(公告)日：2004-09-16
申请号：JP2003049374
申请日：2003-02-26
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： IWAI SEIJI
IPC分类号： G01N21/53 , G01N21/17
摘要： PROBLEM TO BE SOLVED: To provide a visualizing method for particles, which has an adequate ability to observe airborne particles in its observation range, can make the size of adopted equipment minimum, and can get the adequate observation ability even in a place with a small space such as the inside of a clean apparatus.
SOLUTION: In the visualizing method for airborne particles, a mirror 2a is reciprocatingly vibrated by using a mirror-type deflector 2, laser light entering the mirror 2a is deflected so as to irradiate the particles, and scattered light is received by using a camera 3. In the visualizing method for airborne particles, the absolute positions of the mirror 2a are correlated to voltage values applied to the mirror-type deflector 2, and the laser light is scanned at a uniform velocity by varying the voltage value.
COPYRIGHT: (C)2004,JPO&NCIPI

8. 发明专利

JP2007190624A Plate material machining surface plate 审中-公开
标题翻译：板材加工面板
公开(公告)号：JP2007190624A
公开(公告)日：2007-08-02
申请号：JP2006008760
申请日：2006-01-17
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： IWAI SEIJI , YAMAZAKI KEISUKE
IPC分类号： B23Q3/06 , B28D7/04
摘要： PROBLEM TO BE SOLVED: To provide a plate material machining surface plate which can improve the flatness of a plate material surface, eliminate a level difference in a scanning line, and cope with various kinds of material qualities.
SOLUTION: This plate material machining surface plate includes: a flexible variable plate body 2 supporting a plate-like workpiece W on one face; and a copying support means 3 supporting the other face of the variable plate body 2 and deforming the variable plate body 2 to be rugged according to the back rugged part of the plate-like workpiece W, wherein when a machining tool is pressed to the surface of the plate-like workpiece to perform flattening, the copying support means 3 is moved forward and backward according to the back rugged part of the plate-like workpiece W to prevent the back rugged part of the plate-like workpiece W from being transferred to the surface of the machined plate-like workpiece W.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种可以提高板材表面的平坦度的板材加工面板，消除扫描线的水平差，并且应对各种材料质量。解决方案：该板材加工面板包括：在一个面上支撑板状工件W的柔性可变板体2; 以及复印支撑装置3，其支撑可变板体2的另一面，并根据板状工件W的后部凹凸部使可变板体2变形成凹凸形状，其中当将加工工具压到表面的板状工件进行平坦化，复制支撑装置3根据板状工件W的后部凹凸部分向前和向后移动，以防止板状工件W的后部粗糙部分转移到加工板状工件的表面。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2003338531A Carrier and thermal treatment device of semiconductor wafer 审中-公开
标题翻译：半导体波导的加热器和热处理装置
公开(公告)号：JP2003338531A
公开(公告)日：2003-11-28
申请号：JP2002144564
申请日：2002-05-20
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： IWAI SEIJI
IPC分类号： B65G49/07 , H01L21/22 , H01L21/677 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a thermal treatment device capable of effectively suppressing the occurrence of crystal dislocation to a wafer at the time of thermal treatment.
SOLUTION: A wafer carrier 21 is provided with a plurality of engagement members 36 to 39 which are engaged with a lower side face in the periphery of a wafer W to be carried and support the wafer in a suspended condition. The plurality of the members 36 to 39 are constituted so as to be able to reciprocate between a wafer support position where the wafer is supported in a suspended state and a wafer release position where the engagement members move up to the outside of the external periphery of the wafer and release the supported state of the wafer by driving an actuator 26. Therefore, by utilizing the carrier 21, a transferred wafer can be registered on a wafer holder with the same shape as of a wafer loaded beforehand on a wafer board, and the occurrence of the crystal dislocation to the wafer can be effectively suppressed at the time of the thermal treatment.
COPYRIGHT: (C)2004,JPO
摘要翻译：解决的问题：提供能够有效地抑制在热处理时晶片发生晶片错位的热处理装置。解决方案：晶片载体21设置有多个接合构件36至39，其接合待承载的晶片W的周边中的下侧面并且在悬挂状态下支撑晶片。多个构件36至39被构造成能够在悬挂状态下支撑晶片的晶片支撑位置和接合构件向上移动到外部外部的晶片释放位置之间往复运动通过驱动致动器26来释放晶片的支撑状态。因此，通过利用载体21，转印的晶片可以以与预先装载在晶片板上的晶片相同的形状在晶片保持器上配准，以及在热处理时可以有效地抑制晶片的晶体位错的发生。版权所有（C）2004，JPO

10. 发明专利

JP2004014682A Wafer conveyer 审中-公开
标题翻译： WAFER输送机
公开(公告)号：JP2004014682A
公开(公告)日：2004-01-15
申请号：JP2002164066
申请日：2002-06-05
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： IWAI SEIJI
IPC分类号： B25J15/08 , H01L21/67 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a wafer conveyer in which presence/non-presence of a wafer is surely detected without being affected by a state of the wafer, costs are reduced by eliminating the need for mounting a sensor on a holding member even when the holding member is made of ceramics and further, replacement work is facilitated. SOLUTION: A wafer conveyer 1 has a holding member 2 for holding a wafer W, a hand substrate 3 on which the holding member 2 is mounted, a light shielding detection means 4 mounted on the hand substrate 3 with the holding member 2 in between to form a wafer housing space (s) and composed of a flood means 4a and a light receiving means 4b, and a hand substrate moving means 5 for moving the hand substrate 3. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：为了提供晶片输送机，其中可靠地检测晶片的存在/不存在而不受晶片的状态的影响，通过消除将传感器安装在保持件上的需要而降低成本即使保持构件由陶瓷制成，并且进一步地，替换工作便利。解决方案：晶片输送机1具有用于保持晶片W的保持构件2，安装有保持构件2的手基板3，在保持构件2上安装在手基板3上的遮光检测单元4 形成晶片容纳空间，并由淹水装置4a和光接收装置4b构成，以及用于移动手持基板3的手基板移动装置5.版权所有（C）2004，JPO

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