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JP2011088815A Synthetic silica glass with uniform fictive temperature 有权
标题翻译：合成二氧化硅玻璃具有均匀的温度
公开(公告)号：JP2011088815A
公开(公告)日：2011-05-06
申请号：JP2010236245
申请日：2010-10-21
申请人： Corning Inc , コーニングインコーポレイテッド
发明人： DURAN CARLOS , HRDINA KENNETH E , NEUKIRCH ULRICH WILHELM HEINZ
IPC分类号： C03B20/00 , C03B25/02 , C03B32/00
CPC分类号： C03B25/02 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/22 , C03B2201/23
摘要： PROBLEM TO BE SOLVED: To provide a method for making silica glass with a uniform fictive temperature which makes glass in which variation in a refractive index and birefringence is reduced.
SOLUTION: The silica glass has a strain point T
s , a fictive temperature and a relaxation rate at the fictive temperature, and also has hydroxy group concentration of less than 800 mass ppm. The hydroxy group concentration varies only at least by 0.5 ppm. The silica glass is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3°C of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3°C after the annealing step.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有均匀的假想温度的制造石英玻璃的方法，其使得折射率和双折射率的变化减小的玻璃。
解决方案：二氧化硅玻璃具有应变点T S S S / SB，假想温度和假想温度下的松弛率，并且还具有小于800质量ppm的羟基浓度。羟基浓度至少仅改变0.5ppm。将石英玻璃在目标假想温度下加热，或以低于假想温度变化率的速率加热或冷却一段足以使玻璃的假想温度达到3°的时间 C的目标虚构温度。然后将二氧化硅玻璃从目标假想温度冷却至低于玻璃应变点的温度，该冷却速率大于目标假想温度下玻璃的松弛率。二氧化硅玻璃具有在退火步骤之后变化小于3℃的假想温度。版权所有（C）2011，JPO＆INPIT

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