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1. 发明申请

US20130337381A1 NEGATIVE-WORKING THICK FILM PHOTORESIST 有权
标题翻译：负极工作薄膜电影
公开(公告)号：US20130337381A1
公开(公告)日：2013-12-19
申请号：US13524811
申请日：2012-06-15
申请人： Chunwei CHEN , PingHung LU , Weihong LIU , Medhat TOUKHY , SangChul KIM , SookMee LAI
发明人： Chunwei CHEN , PingHung LU , Weihong LIU , Medhat TOUKHY , SangChul KIM , SookMee LAI
IPC分类号： G03F7/028 , G03F7/20 , G03F7/075
CPC分类号： G03F7/028 , C08F220/18 , G03F7/027 , G03F7/033 , G03F7/0755 , G03F7/0757 , G03F7/30 , G03F7/40 , C08F2220/185 , C08F220/20 , C08F2220/281 , C08F220/06 , C08F2220/1825 , C08F212/08
摘要： Disclosed are compositions for negative-working thick film photophotoresists based on acrylic co-polymers. Also included are methods of using the compositions.
摘要翻译：公开了基于丙烯酸共聚物的负性厚膜光致抗蚀剂的组合物。还包括使用组合物的方法。

2. 发明申请

US20130337380A1 POSITIVE PHOTOSENSITIVE MATERIAL 有权
标题翻译：积极的感光材料
公开(公告)号：US20130337380A1
公开(公告)日：2013-12-19
申请号：US13524790
申请日：2012-06-15
申请人： Weihong LIU , PingHung LU , Chunwei CHEN , Stephen MEYER , Medhat TOUKHY , SookMee LAI
发明人： Weihong LIU , PingHung LU , Chunwei CHEN , Stephen MEYER , Medhat TOUKHY , SookMee LAI
IPC分类号： G03F7/004
CPC分类号： G03F7/004 , G03F7/0392 , G03F7/0397
摘要： The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: wherein R1-R5 are, independently, —H or —CH3, A is a linear or branched C1-C10 alkylene group, B is a C1-C12 alkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a —COOCH2— group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2-C10 alkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.
摘要翻译：本发明涉及一种新型的正性光敏组合物，其具有：至少一种光致酸发生剂; 至少一种酚醛清漆聚合物; 至少一种具有聚合物主链的聚合物，所述聚合物包含下式的结构：其中R 1 -R 5独立地是-H或-CH 3，A是直链或支链C 1 -C 10亚烷基，B是C1 -C 12烷基或脂环基，D是可以是化学键的连接基团，其中羰基碳键合到聚合物主链上的羧酸酯基团或-COOCH 2 - 基团，其中羰基碳键合到聚合物上骨架，Ar是取代或未取代的芳基或杂芳基，E是直链或支链C 2 -C 10亚烷基，G是酸可裂解基团。本发明还涉及使用该组合物形成图像的方法。

3. 发明申请

US20140154624A1 POSITIVE WORKING PHOTOSENSITIVE MATERIAL 有权
标题翻译：积极的工作感光材料
公开(公告)号：US20140154624A1
公开(公告)日：2014-06-05
申请号：US13693496
申请日：2012-12-04
申请人： Weihong LIU , Ping-Hung LU , Medhat TOUKHY , SookMee LAI , Yoshiharu SAKURAI , Aritaka HISHIDA
发明人： Weihong LIU , Ping-Hung LU , Medhat TOUKHY , SookMee LAI , Yoshiharu SAKURAI , Aritaka HISHIDA
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397
摘要： Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.
摘要翻译：本文公开了包含杂环硫醇化合物或其互变异构形式的光敏组合物及其在底物上的使用方法，其可以包括亲合性底物。

4. 发明申请

US20220264319A1 METHOD OF MEASURING AAS EMF 有权
公开(公告)号：US20220264319A1
公开(公告)日：2022-08-18
申请号：US17624691
申请日：2020-06-30
申请人： Weihong LIU , Guoqiang LU , Edward MAH , SMITH Daryl , Dimple THOMAS , Guoqiang XUE
发明人： Weihong LIU , Guoqiang LU , Edward MAH , Daryl SMITH , Dimple THOMAS , Guoqiang XUE
IPC分类号： H04W16/28 , H04B7/06 , H04W24/10 , H04B17/318
摘要： Embodiments of a method for measurement of electromagnetic field strength at a point of interest in a coverage area of a 2-dimensional (2D) active antenna system (AAS). The 2D AAS transmits with a load factor of 100 percent. The 2D AAS sweeps a predefined range of azimuth and elevation angles, and azimuth and elevation directions which yield highest EMF at the point of interest are determined. First beamforming weights are determined based on the azimuth and elevation directions and the 2D AAS caused to apply the first beamforming weights. The 2D AAS sweeps a co-phasing angle from 0 to 360 degrees, and a co-phasing angle which yields highest EMF is determined. Second beamforming weights are determined based on azimuth and elevation directions and the co-phasing angle, and the 2D AAS caused to apply the second beamforming weights. The EMF strength at the point of interest is measured.

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