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    • 2. 发明申请
    • Devices for use in medicine
    • 用于医药的设备
    • US20050069426A1
    • 2005-03-31
    • US10508989
    • 2003-03-26
    • Christopher MasonMartin Town
    • Christopher MasonMartin Town
    • C12M3/00F04B17/00F04B35/00
    • C12M29/14C12M23/24C12M29/12
    • Disclosed is an organ culture device for culturing a viable organ. The device provides culture medium for culturing the viable organ using a pump. The pump has a pump chamber located between an inlet and an outlet. The pump provides pulsatile pumping action of the culture medium by repeated deformation of a resilient tubular sidewall of the pump chamber by pressurised gas. The flow path of the culture medium may be circulatory on non-circulatory. The device has a reservoir and a collection vessel for the culture medium. Gas transfer into and out of the culture medium is also provided. Also disclosed is the pump itself and a gas pressure control device for delivering pulsed pressurised gas, e.g. to the pump.
    • 公开了一种用于培养活的器官的器官培养装置。 该装置提供用于使用泵培养活器官的培养基。 泵具有位于入口和出口之间的泵室。 泵通过加压气体的泵室的弹性管状侧壁的重复变形来提供培养基的脉动泵送作用。 培养基的流路可以在不循环的情况下循环。 该装置具有用于培养基的储存器和收集容器。 也提供了进出培养基的气体。 还公开了泵本身和用于输送脉冲加压气体的气体压力控制装置,例如, 到泵。
    • 7. 发明申请
    • System and method for verifying and controlling the performance of a maskless lithography tool
    • 用于验证和控制无掩模光刻工具的性能的系统和方法
    • US20050219532A1
    • 2005-10-06
    • US10812977
    • 2004-03-31
    • Christopher Mason
    • Christopher Mason
    • G03F7/20G01B11/00
    • G03F7/70291G03F7/70058G03F7/70258G03F7/70558G03F7/70616
    • A maskless lithography tool that includes a reference reticle having reference features for tuning and calibrating the tool. The reference reticle is illuminated by a illumination source to form a reference image of the reference features. A signal is applied to an active contrast device of the tool to form a die pattern that includes the reference features. The contrast device is illuminated by the illumination source to form a die image of reference features. An image scanner captures the reference image and the die image. A comparison of the images is used to make tuning and calibrating adjustments to the tool. The reference reticle can be used to debug and characterize the tool even when the operation of the contrast device is not completely understood because the reference features of the reference reticle are independent of the tool's contrast device and pattern generating data stream.
    • 无掩模光刻工具,其包括参考掩模版,其具有用于调谐和校准工具的参考特征。 参考光罩由照明光源照亮,以形成参考特征的参考图像。 将信号施加到工具的主动对比装置,以形成包括参考特征的模具图案。 对比度装置由照明源照亮以形成参考特征的模具图像。 图像扫描仪捕获参考图像和模具图像。 使用图像的比较来对工具进行调整和校准调整。 参考标线片可用于调试和表征该工具,即使对比度装置的操作尚未完全了解,因为参考标线的参考特征与工具的对比度装置和图案生成数据流无关。