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    • 3. 发明授权
    • Holding device for a substrate
    • 用于衬底的保持装置
    • US06426860B1
    • 2002-07-30
    • US09600630
    • 2000-09-19
    • Gerhard SchubertUlf-Carsten KirschsteinStefan RisseGerd HarnischGerhard KalkowskiVolker Guyenot
    • Gerhard SchubertUlf-Carsten KirschsteinStefan RisseGerd HarnischGerhard KalkowskiVolker Guyenot
    • H01G2300
    • G03F7/707G03F7/70708H01L21/6831
    • The present invention provides for a device for holding a substrate in an exposure system. In the exposure system, the substrate is positioned on a table movable in the X and Y coordinates of an X, Y plane, and the exposure system provides a metering assembly between a table surface and the substrate to adjust the distance and to align the substrate in relation to an exposure optics, from where a corpuscular radiation is directed right-angled onto a substrate surface, corresponding to the Z coordinate. The device for holding the substrate includes two mounting plates aligned parallel to the X, Y plane, adjusted upon the table in a direction to the exposure optics and with different distances to the table surface, the first mounting plate of which being directly connected to the table. The second mounting plate is connected with the first mounting plate through at least one holding device, and has a bearing plane for the substrate being designed on that side of the second mounting plate turned to the exposure optics.
    • 本发明提供一种用于在曝光系统中保持基板的装置。 在曝光系统中,基板位于可在X,Y平面的X和Y坐标上移动的工作台上,并且曝光系统在台面和基板之间提供计量组件,以调整距离并对齐基板 相对于曝光光学元件,从其中红色辐射被直接定向到基板表面上,对应于Z坐标。 用于保持基板的装置包括两个平行于X,Y平面排列的安装板,该安装板沿着与曝光光学元件相反的方向在台面上调整,并且与台面的距离不同,其第一安装板直接连接到 表。 第二安装板通过至少一个保持装置与第一安装板连接,并且具有用于基板的支承平面设计在转向曝光光学元件的第二安装板的该侧。