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1. 发明申请

US20130112914A1 Slurry Composition For Polishing And Method Of Manufacturing Phase Change Memory Device Using The Same 审中-公开
标题翻译：用于抛光的浆料组合物及其制造相变存储器件的方法
公开(公告)号：US20130112914A1
公开(公告)日：2013-05-09
申请号：US13617160
申请日：2012-09-14
申请人： Choong-Ho HAN , Sang-Kyun KIM , Ye-Hwan KIM , Joon-Sang PARK , Jin-Woo BAE , Won-Jun LEE , Kyoung-Moon KANG , Jae-Dong LEE
发明人： Choong-Ho HAN , Sang-Kyun KIM , Ye-Hwan KIM , Joon-Sang PARK , Jin-Woo BAE , Won-Jun LEE , Kyoung-Moon KANG , Jae-Dong LEE
IPC分类号： C09K13/00
CPC分类号： C09K3/1463 , C09G1/02 , C09K3/1472 , H01L27/2436 , H01L45/06 , H01L45/1233 , H01L45/143 , H01L45/144 , H01L45/148 , H01L45/1683
摘要： A slurry composition includes an abrasive agent, an oxidizing agent, and a first adsorption inhibitor including a polyethylene oxide copolymer. A method of manufacturing a phase change memory device may include providing a substrate including an interlayer insulating film having a trench and a phase change material layer on the interlayer insulating film filling the trench, and performing chemical mechanical polishing on the phase change material layer using the slurry composition to form a phase change material pattern layer.
摘要翻译：浆料组合物包括研磨剂，氧化剂和包含聚环氧乙烷共聚物的第一吸附抑制剂。制造相变存储器件的方法可以包括在填充沟槽的层间绝缘膜上提供包括具有沟槽和相变材料层的层间绝缘膜的衬底，并且使用相变材料层对相变材料层进行化学机械抛光浆料组成以形成相变材料图案层。

2. 发明申请

US20150021513A1 CMP SLURRY COMPOSITION FOR POLISHING AN ORGANIC LAYER AND METHOD OF FORMING A SEMICONDUCTOR DEVICE USING THE SAME 审中-公开
公开(公告)号：US20150021513A1
公开(公告)日：2015-01-22
申请号：US14311857
申请日：2014-06-23
申请人： Yun-Jeong KIM , Sang-Kyun KIM , Kwang-Bok KIM , Ye-Hwan KIM , Jung-Sik CHOI , Choong-Ho HAN , Gi-Sik HONG
发明人： Yun-Jeong KIM , Sang-Kyun KIM , Kwang-Bok KIM , Ye-Hwan KIM , Jung-Sik CHOI , Choong-Ho HAN , Gi-Sik HONG
IPC分类号： C09K13/06 , C09K13/00
CPC分类号： H01L21/31058 , C09G1/02 , C09K3/1463 , H01L21/0337 , H01L21/0338 , H01L21/31055 , H01L21/31144 , H01L21/32139 , H01L27/11582
摘要： A chemical mechanical polishing (CMP) slurry composition for polishing an organic layer and a method of forming a semiconductor device using the same are disclosed. The CMP slurry composition may include from 0.001% to 5% by weight of oxide-polishing particles; from 0.1% to 5% by weight of an oxidant; from 0% to 5% by weight of a polishing regulator; from 0% to 3% by weight of a surfactant; from 0% to 3% by weight of a pH regulator; and from 79% to 99.889% by weight of deionized water. The use of the CMP slurry composition makes it possible to allow a silicon-free organic layer to be polished with a selectivity higher than 6:1 with respect to an oxide layer.

3. 发明申请

US20130171564A1 Positive Photosensitive Resin Composition, and Display Device and Organic Light Emitting Device Using the Same 有权
标题翻译：正型感光树脂组合物，以及使用其的显示装置和有机发光装置
公开(公告)号：US20130171564A1
公开(公告)日：2013-07-04
申请号：US13603491
申请日：2012-09-05
申请人： Eun-Kyung YOON , Eun-Ha HWANG , Jong-Hwa LEE , Ji-Yun KWON , Dae-Yun KIM , Sang-Kyeon KIM , Sang-Kyun KIM , Sang-Soo KIM , Kun-Bae NOH , Jun-Ho LEE , Jin-Young LEE , Hyun-Yong CHO , Chung-Beom HONG
发明人： Eun-Kyung YOON , Eun-Ha HWANG , Jong-Hwa LEE , Ji-Yun KWON , Dae-Yun KIM , Sang-Kyeon KIM , Sang-Kyun KIM , Sang-Soo KIM , Kun-Bae NOH , Jun-Ho LEE , Jin-Young LEE , Hyun-Yong CHO , Chung-Beom HONG
IPC分类号： G03F7/022 , G03F7/075
CPC分类号： G03F7/0226 , G03F7/0233 , G03F7/0236 , G03F7/0755 , G03F7/085 , Y10S430/107
摘要： Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. The Chemical Formula 1 is the same as defined in the detailed description.
摘要翻译：公开了包含（A）包含聚苯并恶唑前体，聚酰亚胺前体或其组合的碱溶性树脂的正性感光性树脂组合物，（B）感光性重氮醌化合物，（C）由以下化学式1表示的化合物，和（D）溶剂，以及显示装置和使用其的有机发光装置。化学式1与详细描述中所定义的相同。

4. 发明申请

US20120270143A1 RESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES USING THE SAME 审中-公开
标题翻译：耐蚀组合物及使用其制造半导体集成电路器件的方法
公开(公告)号：US20120270143A1
公开(公告)日：2012-10-25
申请号：US13539894
申请日：2012-07-02
申请人： Hui-Chan YUN , Sang-Kyun KIM , Hyeon-Mo CHO , Mi-Young KIM , Sang-Ran KOH , Yong-Jin CHUNG , Jong-Seob KIM
发明人： Hui-Chan YUN , Sang-Kyun KIM , Hyeon-Mo CHO , Mi-Young KIM , Sang-Ran KOH , Yong-Jin CHUNG , Jong-Seob KIM
IPC分类号： C08L83/04 , G03F7/20 , B32B3/30 , C08K5/3432
CPC分类号： G03F7/0752 , G03F7/094 , G03F7/11
摘要： A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product including about 10 to about 40 mol % of a structural unit represented by Chemical Formula 1:
摘要翻译：包括溶剂的抗蚀剂底层组合物和包含由化学式1表示的结构单元的约10至约40mol％的有机硅烷缩聚产物：

5. 发明申请

US20130171568A1 Positive Photosensitive Resin Composition, and Photosensitive Resin Layer and Display Device Using the Same 有权
标题翻译：正型感光性树脂组合物和感光性树脂层及使用其的显示装置
公开(公告)号：US20130171568A1
公开(公告)日：2013-07-04
申请号：US13603479
申请日：2012-09-05
申请人： Ji-Yun KWON , Jin-Hee KANG , Dae-Yun KIM , Sang-Kyeon KIM , Sang-Kyun KIM , Sang-Soo KIM , Kun-Bae NOH , Eun-Kyung YOON , Jong-Hwa LEE , Jun-Ho LEE , Jin-Young LEE , Hwan-Sung CHEON , Hyun-Yong CHO , Chung-Beom HONG , Eun-Ha HWANG
发明人： Ji-Yun KWON , Jin-Hee KANG , Dae-Yun KIM , Sang-Kyeon KIM , Sang-Kyun KIM , Sang-Soo KIM , Kun-Bae NOH , Eun-Kyung YOON , Jong-Hwa LEE , Jun-Ho LEE , Jin-Young LEE , Hwan-Sung CHEON , Hyun-Yong CHO , Chung-Beom HONG , Eun-Ha HWANG
IPC分类号： G03F7/022 , G03F7/075
CPC分类号： G03F7/105 , G03F7/0233 , G03F7/0757
摘要： Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) at least one organic dye having an absorption wavelength of about 400 nm to about 700 nm, and (E) a solvent, wherein the organic dye (D) is included in an amount of about 1 to about 40 parts by weight based on about 100 parts by weight of the alkali soluble resin (A), and a photosensitive resin layer and a display device using the same.
摘要翻译：公开了一种正型感光性树脂组合物，其包含（A）包含聚苯并恶唑前体，聚酰亚胺前体或其组合的碱溶性树脂，（B）感光性重氮醌化合物，（C）酚化合物，（D）一种有机染料，具有约400nm至约700nm的吸收波长，和（E）溶剂，其中所述有机染料（D）的含量为约1至约40重量份，基于约100重量份碱溶性树脂（A）的重量和感光性树脂层以及使用其的显影装置。

6. 发明申请

US20140315367A1 RINSE LIQUID FOR INSULATING FILM AND METHOD OF RINSING INSULATING FILM 有权
标题翻译：用于绝缘膜的冲洗液和冲压绝缘膜的方法
公开(公告)号：US20140315367A1
公开(公告)日：2014-10-23
申请号：US14090003
申请日：2013-11-26
申请人： Jin-Hee BAE , Han-Song LEE , Wan-Hee LIM , Go-Un KIM , Taek-Soo KWAK , Bo-Sun KIM , Sang-Kyun KIM , Yoong-Hee NA , Eun-Su PARK , Jin-Woo SEO , Hyun-Ji SONG , Youn-Jin CHO , Kwen-Woo HAN , Byeong-Gyu HWANG
发明人： Jin-Hee BAE , Han-Song LEE , Wan-Hee LIM , Go-Un KIM , Taek-Soo KWAK , Bo-Sun KIM , Sang-Kyun KIM , Yoong-Hee NA , Eun-Su PARK , Jin-Woo SEO , Hyun-Ji SONG , Youn-Jin CHO , Kwen-Woo HAN , Byeong-Gyu HWANG
IPC分类号： H01L21/02 , H01L27/108
CPC分类号： H01L21/0206 , C08G77/54 , C08G77/62 , C09D183/14 , C09D183/16 , C11D7/266 , C11D7/5022 , C11D11/0047 , H01L21/02087 , H01L21/0209 , H01L21/02164 , H01L21/02214 , H01L21/02222 , H01L21/02282 , H01L21/02326 , H01L27/1085 , H01L28/40
摘要： A rinse liquid for an insulation layer, the rinse liquid including a solvent represented by the following Chemical Formula 1:
摘要翻译：一种用于绝缘层的冲洗液，所述漂洗液包括由以下化学式1表示的溶剂：

7. 发明申请

US20140187017A1 PROCESS OF PREPARING A GAP FILLER AGENT, A GAP FILLER AGENT PREPARED USING SAME, AND A METHOD FOR MANUFACTURING SEMICONDUCTOR CAPACITOR USING THE GAP FILLER AGENT 有权
标题翻译：制备GAP填料剂的方法，使用其制备的GAP填料剂以及使用GAP填料剂制造半导体电容器的方法
公开(公告)号：US20140187017A1
公开(公告)日：2014-07-03
申请号：US14144738
申请日：2013-12-31
申请人： Jin-Hee BAE , Han-Song LEE , Taek-Soo KWAK , Go-Un KIM , Bo-Sun KIM , Sang-Kyun KIM , Yoong-Hee NA , Eun-Su PARK , Jin-Woo SEO , Hyun-Ji SONG , Sang-Hak LIM , Wan-Hee LIM , Seung-Hee HONG , Byeong-Gyu HWANG
发明人： Jin-Hee BAE , Han-Song LEE , Taek-Soo KWAK , Go-Un KIM , Bo-Sun KIM , Sang-Kyun KIM , Yoong-Hee NA , Eun-Su PARK , Jin-Woo SEO , Hyun-Ji SONG , Sang-Hak LIM , Wan-Hee LIM , Seung-Hee HONG , Byeong-Gyu HWANG
IPC分类号： H01L49/02
CPC分类号： H01L28/92 , C08G77/00 , C08G77/62 , C09D183/16 , H01L21/02222 , H01L21/02282 , H01L21/02326
摘要： A method of preparing a gap filler agent includes adding a halosilane to a basic solvent, and, to the basic solvent and the halosilane, adding ammonia in an amount of about 50 to about 70 parts by weight based on 100 parts by weight of the halosilane at a rate of about 1 g/hr to about 15 g/hr.
摘要翻译：制备间隙填充剂的方法包括向碱性溶剂中加入卤代硅烷，并且向碱性溶剂和卤代硅烷中添加约50至约70重量份的氨，基于100重量份的卤代硅烷以约1g / hr至约15g / hr的速率。

8. 发明申请

US20120270998A1 RESIN COMPOSITION FOR TRANSPARENT ENCAPSULATION MATERIAL AND ELECTRONIC DEVICE FORMED USING THE SAME 有权
标题翻译：用于透明材料的树脂组合物和使用其形成的电子器件
公开(公告)号：US20120270998A1
公开(公告)日：2012-10-25
申请号：US13535673
申请日：2012-06-28
申请人： Sang-Ran KOH , June-Ho SHIN , Hyun-Jung AHN , Sung-Hwan CHA , Young-Eun CHOI , Doo-Young JUNG , Sang-Kyun KIM , Jong-Seob KIM
发明人： Sang-Ran KOH , June-Ho SHIN , Hyun-Jung AHN , Sung-Hwan CHA , Young-Eun CHOI , Doo-Young JUNG , Sang-Kyun KIM , Jong-Seob KIM
IPC分类号： C08L83/06
CPC分类号： C08G77/20 , C08G77/24 , C08G77/80
摘要： A resin composition for a transparent encapsulation material, the resin composition including a polysiloxane obtained by copolymerization of a first silicon compound represented by the following Chemical Formula 1 and a second silicon compound including a compound represented by the following Chemical Formula 2,
摘要翻译：一种透明包封材料用树脂组合物，该树脂组合物含有通过由下述化学式1表示的第一硅化合物的共聚合得到的聚硅氧烷和包含由下述化学式2表示的化合物的第二硅化合物，

9. 发明申请

US20080285215A1 MULTIMEDIA PORTABLE ELECTRONIC DEVICE 失效
标题翻译：多媒体便携式电子设备
公开(公告)号：US20080285215A1
公开(公告)日：2008-11-20
申请号：US12119839
申请日：2008-05-13
申请人： Sang-Kyun KIM , Jong-Kwon KO , Young-Wook SOHN , Sang-Il PARK
发明人： Sang-Kyun KIM , Jong-Kwon KO , Young-Wook SOHN , Sang-Il PARK
IPC分类号： H05K5/02
CPC分类号： G06F1/1666 , G06F1/1616 , G06F1/1624
摘要： Disclosed is a multimedia portable electronic device including a first housing, a second housing coupled to the first housing so as to rotate about a first hinge axis, a third housing adapted to slide while facing the first housing, a fourth housing connected to the third housing so as to rotate about a second hinge axis to be folded/unfolded, a connection device positioned between the first and fourth housings so that the connection device rotates about a third hinge axis to slide the third housing when the fourth housing is folded on or unfolded from the third housing, and a sliding device positioned between the first and third housings so that the third housing can slide.
摘要翻译：公开了一种多媒体便携式电子设备，其包括第一壳体，联接到第一壳体以便围绕第一铰链轴线旋转的第二壳体，适于在面向第一壳体的同时滑动的第三壳体，与第三壳体连接的第四壳体以便围绕第二铰链轴线旋转以被折叠/展开，位于第一和第四壳体之间的连接装置，使得连接装置围绕第三铰链轴线旋转以在第四壳体折叠或展开时滑动第三壳体以及位于第一和第三壳体之间的滑动装置，使得第三壳体能够滑动。

10. 发明申请

US20080180398A1 PORTABLE APPARATUS 审中-公开
标题翻译：便携式设备
公开(公告)号：US20080180398A1
公开(公告)日：2008-07-31
申请号：US12021836
申请日：2008-01-29
申请人： Young-Hun KIM , Jin-Man IM , Sang-Kyun KIM , Young-Wook SOHN
发明人： Young-Hun KIM , Jin-Man IM , Sang-Kyun KIM , Young-Wook SOHN
IPC分类号： G06F1/16
CPC分类号： H04M1/0247 , G06F1/1616 , G06F1/1624 , G06F1/1666 , H04M1/0214 , H04M1/0235 , H04M2250/18
摘要： A portable apparatus includes a first housing, a second housing, a sliding housing, folding housing, and a connecting device. The second housing is coupled to the first housing by a first hinge part, the second housing being rotatable about a first hinge axis to fold onto and unfold from the first housing. The sliding housing faces the first housing and is coupled to the first housing by a sliding device. The sliding housing continues to face the first housing when the sliding housing is moved. The folding housing is coupled to the sliding housing by a second hinge part, the folding housing being rotatable about a second hinge axis, and the connecting device is coupled to the first housing and the folding housing to slide the sliding housing in response to movement of the folding housing.
摘要翻译：便携式设备包括第一壳体，第二壳体，滑动壳体，折叠壳体和连接装置。第二壳体通过第一铰链部分联接到第一壳体，第二壳体可围绕第一铰链轴线旋转以折叠到第一壳体上并且从第一壳体展开。滑动壳体面向第一壳体并且通过滑动装置联接到第一壳体。当滑动壳体移动时，滑动壳体继续面向第一壳体。折叠壳体通过第二铰链部分联接到滑动壳体，折叠壳体可绕第二铰链轴线旋转，并且连接装置联接到第一壳体和折叠壳体，以响应于滑动壳体的移动而滑动滑动壳体折叠式外壳。

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