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    • 6. 发明授权
    • Process for using a removeable plating bus layer for high density
substrates
    • 使用可移除电镀总线层用于高密度基板的工艺
    • US5981311A
    • 1999-11-09
    • US104838
    • 1998-06-25
    • Chok J. ChiaSeng Sooi LimPatrick Variot
    • Chok J. ChiaSeng Sooi LimPatrick Variot
    • H01L21/48H05K3/24H05K3/42H01L21/58H01L21/28H01L21/304
    • H05K3/242H01L21/4846H05K3/428H01L2224/16225H01L2224/48091H01L2224/48227H05K2203/0191H05K2203/0361H05K2203/1572
    • A method of electroplating a high density integrated circuit (IC) substrate using a removable plating bus including the steps of providing an IC substrate made of nonconductive material having a plurality of conductive traces formed on its surface. Attaching a removable plating bus to the IC substrate, covering the plurality of conductive traces. Forming through holes (or vias) in predetermined locations. The holes going through the removable plating bus and IC substrate, exposing edges of selected conductive traces in the holes. Plating the through holes with a conductive material (such as copper) that electrically connects the removable plating bus to the exposed edges of the traces in the holes. Coating the IC substrate (including the removable plating bus) with plating resist and selectively removing portions of the removable plating bus, along with the plating resist, to expose selected areas of traces on the IC substrate that require plating. Electroplating the exposed trace areas on the IC substrate with conductive material (such as gold or nickel) by using the removable plating bus as the electrical connection to the exposed metal traces and removing the removable plating bus after electroplating is finished.
    • 一种使用可移除电镀母线电镀高密度集成电路(IC)衬底的方法,包括以下步骤:提供由其表面上形成有多个导电迹线的非导电材料制成的IC衬底。 将可移除的电镀母线安装到IC基板上,覆盖多个导电迹线。 在预定位置形成通孔(或通孔)。 穿过可移除电镀总线和IC基板的孔,暴露孔中选定导电迹线的边缘。 用诸如铜的导电材料(例如铜)电镀通孔,其将可移除的电镀总线电连接到孔中的迹线的暴露边缘。 用电镀抗蚀剂涂覆IC基板(包括可移除电镀总线),并与电镀抗蚀剂一起选择性地去除可移除电镀母线的部分,以暴露需要电镀的IC基板上的选定区域的痕迹。 通过使用可移除的电镀母线作为与暴露的金属迹线的电气连接,并且在电镀完成之后移除可移除的电镀母线,用导电材料(例如金或镍)电镀IC衬底上的暴露痕迹区域。