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1. 发明授权

US6121155A Integrated circuit fabrication critical dimension control using self-limiting resist etch 有权
标题翻译：使用自限制抗蚀剂蚀刻的集成电路制造临界尺寸控制
公开(公告)号：US6121155A
公开(公告)日：2000-09-19
申请号：US205590
申请日：1998-12-04
申请人： Chih-Yuh Yang , Scott Bell , Qi Xiang
发明人： Chih-Yuh Yang , Scott Bell , Qi Xiang
IPC分类号： H01L21/308 , H01L21/311 , H01L21/8238 , H01L21/302
CPC分类号： H01L21/82385 , H01L21/3088 , H01L21/31116
摘要： The present invention provides a process for self-limiting trim etch of patterned photoresist that will allow integrated circuit fabrication to achieve smaller integrated circuit component features and greatly reduce final critical dimension drift or variation. Trim time is set in a plateau region of the critical dimension loss process curve.
摘要翻译：本发明提供了一种用于图案化光致抗蚀剂的自限制微调蚀刻的方法，其将允许集成电路制造实现更小的集成电路组件特征并大大减少最终临界尺寸漂移或变化。修剪时间设置在临界尺寸损失过程曲线的平台区域。

2. 发明授权

US07005386B1 Method for reducing resist height erosion in a gate etch process 有权
标题翻译：在栅极蚀刻工艺中降低抗蚀剂高度腐蚀的方法
公开(公告)号：US07005386B1
公开(公告)日：2006-02-28
申请号：US10656467
申请日：2003-09-05
申请人： Scott Bell , Srikanteswara Dakshina-Murthy , Chih-Yuh Yang , Ashok M. Khathuria
发明人： Scott Bell , Srikanteswara Dakshina-Murthy , Chih-Yuh Yang , Ashok M. Khathuria
IPC分类号： H01L21/302
CPC分类号： H01L21/32139 , H01L21/0274 , H01L21/31058
摘要： According to one exemplary embodiment, a method for reducing resist height erosion in a gate etch process comprises a step of forming a first resist mask on an anti-reflective coating layer situated over a substrate, where the first resist mask has a first width. The anti-reflective coating layer may be, for example, an organic material. The method further comprises a step of trimming the first resist mask to form a second resist mask, where the second resist mask has a second width, and where the second width is less than the first width. The step of trimming the first resist mask may further comprise, for example, etching the anti-reflective coating layer. According to this exemplary embodiment, the method further comprises a step of performing an HBr plasma treatment on the second resist mask, wherein the HBr plasma treatment causes a vertical etch rate of the second resist mask to decrease.
摘要翻译：根据一个示例性实施例，用于降低栅极蚀刻工艺中的抗蚀剂高度腐蚀的方法包括在位于衬底上的抗反射涂层上形成第一抗蚀剂掩模的步骤，其中第一抗蚀剂掩模具有第一宽度。抗反射涂层可以是例如有机材料。该方法还包括修整第一抗蚀剂掩模以形成第二抗蚀剂掩模的步骤，其中第二抗蚀剂掩模具有第二宽度，并且其中第二宽度小于第一宽度。修整第一抗蚀剂掩模的步骤还可以包括例如蚀刻抗反射涂层。根据该示例性实施例，该方法还包括在第二抗蚀剂掩模上执行HBr等离子体处理的步骤，其中HBr等离子体处理导致第二抗蚀剂掩模的垂直蚀刻速率降低。

3. 发明申请

US20060154184A1 METHOD FOR REDUCING FEATURE LINE EDGE ROUGHNESS 审中-公开
标题翻译：减少特征线边缘粗糙度的方法
公开(公告)号：US20060154184A1
公开(公告)日：2006-07-13
申请号：US10905596
申请日：2005-01-12
申请人： Arpan Mahorowala , Scott Bell , S. Dakshina Murthy , Stacy Rasgon , Hongwen Yan , Chih-Yuh Yang
发明人： Arpan Mahorowala , Scott Bell , S. Dakshina Murthy , Stacy Rasgon , Hongwen Yan , Chih-Yuh Yang
IPC分类号： G03F7/00
CPC分类号： G03F7/40 , H01L21/0274 , H01L21/31058 , H01L21/31144
摘要： A method of patterning a feature in a substrate to reduce edge roughness comprises forming a resist layer overlying a substrate, exposing the resist layer to create an image of a feature, and developing the exposed resist layer to leave a portion of the resist layer that creates the image of the feature. The method then includes treating the exposed resist layer with a plasma to cure the portion of the resist layer creating the feature image. The plasma treatment has an ion bombardment level insufficient to substantially etch the underlying substrate. The method then includes etching the underlying substrate to create the feature.
摘要翻译：图案化衬底中的特征以减少边缘粗糙度的方法包括形成覆盖衬底的抗蚀剂层，暴露抗蚀剂层以产生特征的图像，以及显影曝光的抗蚀剂层以留下产生的抗蚀剂层的一部分功能的图像。该方法然后包括用等离子体处理曝光的抗蚀剂层以固化形成特征图像的抗蚀剂层的部分。等离子体处理具有不足以基本上蚀刻下面的衬底的离子轰击水平。该方法然后包括蚀刻下面的基底以产生特征。

4. 发明授权

US06606738B1 Analytical model for predicting the operating process window for lithographic patterning techniques based on photoresist trim technology 失效
标题翻译：基于光刻胶修剪技术的光刻图案化技术预测工作过程窗口分析模型
公开(公告)号：US06606738B1
公开(公告)日：2003-08-12
申请号：US09822993
申请日：2001-03-30
申请人： Scott Bell , Marina Plat , Amada Wilkison , Chih-Yuh Yang
发明人： Scott Bell , Marina Plat , Amada Wilkison , Chih-Yuh Yang
IPC分类号： G06F1750
CPC分类号： G03F7/40 , H01L21/31138 , H01L21/32139
摘要： In the present method of trimming photoresist to form a mask for a layer of a semiconductor device, which layer may include polysilicon and/or nitride, the method is practiced substantially in accordance with: wmin=(h0−Rvtmax)/ARmax where w1=minimum width of trimmed photoresist; h0=height of photoresist prior to trim; Rv=resist vertical etch rate; tmax=maximum etch time to reach resist vertical etch limit; ARmax=maximum allowable aspect ratio of trimmed photoresist. The present invention is further a method of trimming photoresist to form a mask for a layer of a semiconductor device, which layer may include polysilicon and/or nitride, and which method is practiced substantially in accordance with: w0=(h0−Rvtmax)/ARmax+Rhtmax where w0=width of photoresist prior to trim; h0=height of photoresist prior to trim; Rv=resist vertical etch rate; tmax=maximum etch time to reach resist vertical etch limit; ARmax=maximum allowable aspect ratio of trimmed photoresist; Rh=horizontal resist etch rate.
摘要翻译：在本发明的光刻胶修整方法中，为了形成半导体器件层的掩模，该层可以包括多晶硅和/或氮化物，该方法基本上按以下方式实施：其中w1 =修整的光致抗蚀剂的最小宽度; h0 = 光刻胶在修剪之前; Rv =抗蚀剂垂直蚀刻速率; tmax =达到抗蚀剂垂直蚀刻极限的最大蚀刻时间; ARmax =修剪光致抗蚀剂的最大允许纵横比。本发明还涉及一种修整光致抗蚀剂以形成半导体器件层的掩模的方法，该层可包括多晶硅和/或氮化物，并且该方法基本上按照其中：w0 =修剪之前的光致抗蚀剂的宽度; h0 =修剪前光致抗蚀剂的高度; Rv =抗蚀剂垂直蚀刻速率; tmax =达到抗蚀剂垂直蚀刻极限的最大蚀刻时间; ARmax =修剪光致抗蚀剂的最大允许纵横比; Rh =水平抗蚀剂蚀刻速率。

5. 发明授权

US09955766B2 Roll-on liquid applicator 有权
公开(公告)号：US09955766B2
公开(公告)日：2018-05-01
申请号：US15542900
申请日：2016-06-10
申请人： James Bell , Scott Bell
发明人： James Bell , Scott Bell
IPC分类号： A45D34/04
CPC分类号： A45D34/041 , A45D2200/054
摘要： A roll-on liquid applicator having an applicator ball disposed within a dispensing chamber and a spring element with a valve head portion. The spring element effects a distally-directed force to press the valve head against the valve opening to maintain a sealing closure of the valve opening against flow of the liquid from the feed chamber into the dispensing chamber. The valve head has a ball support structure which extends distally through the valve opening to contact with the applicator ball so that when the ball is inwardly displaced by force applied thereto, the valve head moves axially inward from the closed-valve position to the open-valve position, thereby moving the valve head from the closed-valve position in contact with the valve opening toward the open-valve position which allows liquid from the feed chamber to enter the dispensing chamber.

6. 发明授权

US09332791B1 Multipurpose positioning device for infants 有权
公开(公告)号：US09332791B1
公开(公告)日：2016-05-10
申请号：US12878400
申请日：2010-09-09
申请人： Cathy Bush , Scott Bell , Lou Casella , John Chappel , Sandy Conner , George Quattropani , Mary Raney , Chrysty Sturdivant
发明人： Cathy Bush , Scott Bell , Lou Casella , John Chappel , Sandy Conner , George Quattropani , Mary Raney , Chrysty Sturdivant
IPC分类号： A41D11/00
CPC分类号： A61G11/00 , A41B13/065 , A41D11/00 , A47D5/00 , A47D13/08 , A47D15/003 , A47D15/008
摘要： A multipurpose infant positioning device that includes a lower pad with front and back surfaces, wings attached to lateral sides of the lower pad and a bottom flap attached to the bottom portion of the lower pad. At least one of the wings and bottom flap have fastening segments attached thereto for adjustably attaching these components to portions of the lower pad. The fastened wing and bottom flap are made of a material having sufficient resiliency to maintain and bring an infant back to flexed midline position within the infant positioning device. These infant positioning devices may further include a headpiece, brim, pocket at the back surface of the lower pad and a detachable readjustable multipurpose pillow for positioning the infant from and between supine, prone and side-lying positions, all while maintaining and reinforcing the flexed midline position of the infant for normal development.

7. 发明授权

US07457952B2 Authentication tag for S/W media 失效
标题翻译： S / W介质的认证标签
公开(公告)号：US07457952B2
公开(公告)日：2008-11-25
申请号：US11012478
申请日：2004-12-16
申请人： Alberto Rogriguez , Heiko Rommelmann , Scott Bell , Will Phipps , Ron Boucher
发明人： Alberto Rogriguez , Heiko Rommelmann , Scott Bell , Will Phipps , Ron Boucher
IPC分类号： H04L9/00 , H04K1/00
CPC分类号： G11B20/00275 , G06F2221/2121 , G11B20/00086 , G11B20/00876
摘要： An authentication apparatus includes a reading or recording medium equipped with an authentication tag, and a reading and recording drive that includes a transmitter and a coupler chip, wherein the authentication tag and the transmitter are capable of communicating with each other when the reading medium or the recording medium is coupled to the reading and recording drive. An authentication method includes providing a reading medium or a recording medium with an authentication tag, providing a reading and/or recording drive with a transmitter and a communication interface wherein the authentication tag and the transmitter are capable of communicating with each other when the reading medium or recording medium is coupled to the reading and/or recording drive, and authenticating the reading medium or recording medium via a communication between the authentication tag and the transmitter.
摘要翻译：认证装置包括配备有认证标签的读取或记录介质以及包括发送器和耦合器芯片的读取和记录驱动器，其中当读取介质或者读取介质时，认证标签和发送器能够彼此通信记录介质耦合到读取和记录驱动器。认证方法包括向读取介质或记录介质提供认证标签，向发送器和通信接口提供读取和/或记录驱动器，其中认证标签和发送器能够在读取介质或记录介质耦合到读取和/或记录驱动器，并且经由认证标签和发送器之间的通信来认证读取介质或记录介质。

8. 发明申请

US20070058991A1 Apparatus and method for adapting a machine to communicate with customer replaceable unit monitors having different interface formats 有权
标题翻译：用于使机器与具有不同接口格式的客户可更换单元监视器通信的装置和方法
公开(公告)号：US20070058991A1
公开(公告)日：2007-03-15
申请号：US11227042
申请日：2005-09-15
申请人： Heiko Rommelmann , Jerry Money , Scott Bell , Alberto Rodriguez
发明人： Heiko Rommelmann , Jerry Money , Scott Bell , Alberto Rodriguez
IPC分类号： G03G15/00
CPC分类号： G03G21/1652 , G03G2221/166
摘要： An adapter suitable for installation in a machine in place of a customer replaceable unit monitor having a first interface format is described herein. Upon installation of the adapter in the machine, the adapter enables data communication between the machine and a customer replaceable unit monitor having a second interface format that is different than the first interface format. The first and second interface formats may include one or more of: configuration of an electrical interface of the customer replaceable unit monitor, configuration of a mechanical interface of the customer replaceable unit monitor, and configuration of data input to and output from the customer replaceable unit monitor. The adapter may be attached to a module before the module is installed in the machine to simplify installation of the adapter. The adapter may remain attached to the machine when the module is removed from the machine to allow the machine to communicate with other customer replaceable unit monitors having the second interface format. The second customer replaceable unit monitor may include a microprocessor and non-volatile memory disposed in a common package.
摘要翻译：这里描述了适于安装在机器中的替代具有第一接口格式的客户可更换单元监视器的适配器。在将适配器安装在机器中时，适配器使得机器与具有不同于第一接口格式的第二接口格式的客户可更换单元监视器之间的数据通信。第一和第二接口格式可以包括以下中的一个或多个：客户可更换单元监视器的电接口的配置，客户可更换单元监视器的机械接口的配置，以及输入到客户可更换单元和从客户可更换单元输出的数据的配置监控。在将模块安装在机器中之前，适配器可以连接到模块，以简化适配器的安装。当模块从机器移除时，适配器可以保持连接到机器，以允许机器与具有第二接口格式的其他客户可更换单元监视器通信。第二客户可更换单元监视器可以包括布置在公共封装中的微处理器和非易失性存储器。

9. 发明申请

US20060153579A1 REPLACEABLE UNIT MONITOR READER WITH AUTO POLLING CAPABILITIES 有权
标题翻译：具有自动检测功能的可更换单元监视器读取器
公开(公告)号：US20060153579A1
公开(公告)日：2006-07-13
申请号：US11034249
申请日：2005-01-13
申请人： Will Phipps , Scott Bell , Alberto Rodriguez , Heiko Rommelmann , Ron Boucher
发明人： Will Phipps , Scott Bell , Alberto Rodriguez , Heiko Rommelmann , Ron Boucher
IPC分类号： G03G15/00
CPC分类号： G03G15/0863 , G03G21/1882 , G03G2215/0695 , G03G2215/0697 , G03G2221/1823 , G03G2221/1838 , G03G2221/1892
摘要： A replaceable unit monitor reader system includes a host processor and a coupler board. The coupler board had a detection circuitry that provides an auto-detect, auto-initiate and/or auto-select ability. After receiving command from the host processor, the coupler board enables communication with a CRUM without requiring a further command from the host processor.
摘要翻译：可替换的单元监视器读取器系统包括主处理器和耦合器板。耦合器板具有检测电路，其提供自动检测，自动启动和/或自动选择能力。在从主处理器接收到命令之后，耦合器板能够与CRUM进行通信，而不需要来自主处理器的另外的命令。

10. 发明申请

US20060136989A1 Method of authentication of memory device and device therefor 有权
标题翻译：存储器件及其装置的认证方法
公开(公告)号：US20060136989A1
公开(公告)日：2006-06-22
申请号：US11012479
申请日：2004-12-16
申请人： Alberto Rodriguez , Scott Bell , Heiko Rommelmann , Edwin Kuyt
发明人： Alberto Rodriguez , Scott Bell , Heiko Rommelmann , Edwin Kuyt
IPC分类号： H04L9/32
CPC分类号： G06F21/445 , G06F21/79 , G06F2221/2129 , H04L9/3271 , H04L2209/80
摘要： A memory device authentication method that includes providing a memory device in a host device, and providing both an encryption algorithm, triggering the encryption algorithm during writing of data in the memory device, wherein the encryption algorithm during writing of data and generates a device altered data, then sorting the written data in the memory disk, running the encryption algorithm in the host device on the data written in the memory device and generating a host altered data, the verifying authenticity of the memory device by comparing the device altered data and the host alerted data. An authentication device and associated system that includes a host device that comprises a unit, a first encryption algorithm that is stored in the host device, and a second encryption algorithm, identical to the first encryption algorithm, that is permanently stored in a memory of the unit.
摘要翻译：一种存储器设备认证方法，包括在主机设备中提供存储器设备，并提供加密算法，在所述存储器设备中写入数据期间触发所述加密算法，其中所述加密算法在写入数据期间并产生设备改变的数据，然后对存储盘中的写入数据进行排序，在主机设备中对写在存储器件中的数据运行加密算法并生成主机改变的数据，通过比较设备改变的数据和主机来验证存储设备的真实性提醒数据。一种认证设备和相关系统，其包括主机设备，其包括单元，存储在所述主机设备中的第一加密算法和与所述第一加密算法相同的第二加密算法，所述第二加密算法被永久存储在所述主机设备的存储器中单元。

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