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    • 1. 发明申请
    • Production method of optical waveguide device and optical waveguide device
    • 光波导器件和光波导器件的制造方法
    • US20060088267A1
    • 2006-04-27
    • US11242063
    • 2005-10-04
    • Chie FukudaKatsuyoshi AkibaKouji Shiotsuka
    • Chie FukudaKatsuyoshi AkibaKouji Shiotsuka
    • G02B6/10
    • G02B6/132
    • An optical waveguide device and a method of making the same that render excellent transmission loss characteristics and allow a large degree of freedom in circuit design are provided. The method has the steps of forming a fluorine-added silica glass first cladding layer on a substrate, forming a silica glass protective layer on the first cladding layer, annealing, forming a groove that penetrates through the protective layer and reaches the first cladding layer, forming a silica glass core in the groove, and forming a fluorine-added silica glass second cladding layer on the protective layer and the core. The device has a substrate, a first cladding layer formed on the substrate, a protective layer formed on the first cladding layer, a core formed in a groove that penetrates through the protective layer and reaches the first cladding layer, and a second cladding layer formed on the protective layer and the core.
    • 提供一种光波导器件及其制造方法,其具有优异的传输损耗特性并且允许电路设计中的大自由度。 该方法具有以下步骤:在基板上形成氟化石英玻璃第一包层,在第一包层上形成石英玻璃保护层,退火,形成穿过保护层并到达第一包层的沟槽, 在所述槽中形成石英玻璃芯,并在所述保护层和所述芯上形成氟化石英玻璃第二包覆层。 该器件具有基板,形成在基板上的第一包覆层,形成在第一包层上的保护层,形成在贯穿保护层并到达第一包层的槽的芯部,以及形成第二包层 在保护层和芯上。